The purpose of this paper was investigating the effect of volume nanosecond discharge in air at atmospheric pressure on the electro-physical properties of the HgCdTe (MCT) epitaxial films grown by molecular beam epitaxy. Hall measurements of electro-physical parameters of MCT samples after irradiation have shown that there is a layer of epitaxial films exhibiting n-type conductivity that is formed in the near-surface area. After more than 600 pulses of influence parameters and thickness of the resulting n-layer is such that the measured field dependence of Hall coefficient corresponds to the material of n-type conductivity. Also it is shown that the impact of the discharge leads to significant changes in electro-physical characteristics of MIS structures. This fact is demonstrated by increase in density of positive fixed charge, change in the hysteresis type of the capacitance-voltage characteristic, an increase in density of surface states. The preliminary results show that it is possible to use such actions in the development of technologies of the controlled change in the properties of MCT.
The electro-physical and photo-electrical properties of the HgCdTe/SiO2/Si3N4 and HgCdTe/anodic-oxide film MIS structures is experimentally studied. The heteroepitaxial graded-band films Hg0.78Cd0.22Te were produced on the GaAs substrates by molecular-beam epitaxy. It was established of features of electrical properties were related with conduction type of the semiconductor and to the presence of near-surface graded-band layers. The test measurements of the electro-physical and photoelectric performances of MIS-structures in base of graded-band HgCdTe are held and the following parameters are found: resistances of volume, voltage of flat bands, densities of mobile and fixed charges, spectrums of surface states. It is shown that low-temperature double insulator SiO2/Si3N4 is perspective for passivation of surface of focal plane arrays in base of HgCdTe-photodiodes.
Platinum silicide Schottky barrier detectors (SBD) and HIP-detectors GeSi/Si-based are widely used for application in the infrared spectral range. The increase in cutoff wavelength and responsivity of PtSi-Si photodevices is possible by formation of heavily-doped thin layer near to the semiconductor surface. The cutoff wavelength of HIP-detectors GexSi1-x/Si-based depends on x and concentration of boron in GeSi. In this report, the threshold properties of these detectors are considered. The dependencies of spectral detectivities and NETD from cutoff wavelength are calculated for various parameters of SBD and HIP-detectors. It is shown that optimal NETD of a SBD and HIP-detectors is possible for certain cutoff wavelength and temperature of detectors and depends on storage capacity. Also opportunity of formation of heavily-doped nanolayer in SBD detectors used by short-pulse recoil implanation of boron was studied.
Platinum silicide Schottky barrier detectors are widely used for application in the medium infrared wavelength region. The increase of cutoff wavelength and responsivity of PtSi-Si photodevices is possible by formation of highly-doped thin layer near to the semiconductor surface. We propose for this aim to form highly-doped nanolayer in p-Si by recoil implantation of boron. It is experimental established that profile of impirity distribution in surface layer is exponential. The doping concentration at the silicide/silicon interface is 1018 - 1020 cm-3 and thickness of surface layer is 8 - 12 nm. We have calculated the spectral, threshold, and noise characteristics of p-Si-PtSi photodetectors with highly-doped surface layers produced by molecular-beam epitaxy and short-pulse dopant implantation by a recoil method.
The development of Schottky barrier technology for creation of IR-photodetectors is caused by reduction of a potential barrier height used by formation of heavily-doped thin layer near to the semiconductor surface. We propose for this aim to form heavily-doped nanolayer in p-Si by recoil implantation of boron. Boron nm-thick film was deposited on the Si sample surfaces by cathode sputtering. After that the samples were irradiated by high intensity Al+ beams extracted from pregenerated explosion-emission plasma. The samples are examined by secondary ion mass-spectrometry (SIMS). It is experimental established that profile of impurity distribution in surface layer is exponential. The doping concentration at the silicide/silicon interface is 1018-1020 cm-3 and thickness of surface layer is 8 - 12 nm. The energy band diagrams of a PtSi - p- Si Schottky barrier with high-doped surface layer formed by recoil implantation were calculated for different parameters of barrier. It is shown, that effective barrier heights in PtSi-Si with recoil implantation formed surface 10 nm layer at surface concentration order 1020 cm-3 is reduced to 0.13 eV, corresponding to a cutoff wavelength of 9.5 micrometers . Thus, the cutoff wavelength of the PtSi Schottky infrared detectors has been extended to the long wavelength infrared region by incorporating a p+ doping layer with exponential profile of impurity distribution at the silicide/silicon interface.
The photo electric characteristics of Schottky barriers, created by recoil implantation in silicon, are analyzed. Implantation of boron atoms in silicon samples was made by recoil method, inducing Al ion beams bombardment, with current density 4-10 A/cm2 and 30-150keV energy. A SIMS analysis of obtained structures and calculation of their electric parameters show the opportunity of conducting layers formation, with a thickness of 10 nm and carrier concentration higher than 1018 cm-3.
The abnormal photo electric properties of MIS structures in base of Si and HgCdTe, such as a significant photo-emf signal in enhancement and drop of the local photo-emf in inversion, were experimentally investigated. It has been established that the reason for the significant photo-emf signal in the state of enhancement and the related features of the photo electric properties of the Si-MIS-structure, is the photosensitivity in the region far from the electrode, associated with non-uniform distribution of electrically active defects in this region. It has also been established that the non-uniformity in surface potential (between the sub-electrode region and the region away from the electrode or between different points in sub-electrode region) may result in a drop of the local photo-emf in the state of inversion. A conclusion has been made that the redistribution of non-equilibrium carriers along the boundary must be taken into account in constructing equivalent circuits of the MIS structures.
The abnormal photoelectric properties of MIS structures, such as a significant photo-emf signal in the state of enhancement and a drop of the local photo-emf in inversion, were investigated with integrated and local photoelectric measurements. It has been established that the reason for the significant photo-emf signal in enhancement and the related features of the photoelectric properties of the structure is the photosensitivity in the region away from the electrode associated with a nonuniform distribution of electrically active defects. It has been demonstrated that the nonuniformity in surface potential (between the subelectrode region and the region away from the electrode (after-electrode region) or between different points in subelectrode region) may result in a drop of the local photo-emf in inversion. A conclusion has been made that the redistribution of nonequilibrium carriers along the boundary must be taken into account in constructing equivalent circuits of actual MIS structures.
The abnormal photoelectric properties of Si-MIS structures, such as a significant photo-emf signal in the state of enhancement and a drop of the local photo-emf in inversion, were investigated with integrate and local photoelectric measurements. It has been established that the reason for the significant photo-emf signal in enhancement and the related features of the photoelectric properties of the structure is the photosensitivity in the region away from the electrode associated with a nonuniform distribution of electrically active defects. It has been demonstrated that the nonuniformity in surface potential may result in a drop of the local photo-emf in inversion. A conclusion has been made that the redistribution of nonequilibrium carriers along the boundary must be taken into account in constructing equivalent circuits of actual MIS structures.
Influence of a weak magnetic field on photo-electric, electrophysical characteristics of MIS - structures is experimentally investigated.Long-term changes of a spectrum of surface states of Si-SiO2-structures, caused by a magnetic field are considered. It is supposed that the reason of a long-term relaxation in Si-SiO2 - structures are a diffusion and reactions of nonequilibrium defects, arising at relaxations of polarization of nuclear spin system, in InSb, InAs the diffusion passes on mechanism of transfer of defect of a type 'broken off connection'.
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