Mr. Sethi S. Satyendra Profile

Sethi S. Satyendra

Sales Representative at Synopsys Inc

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Author

Publications (13)

Proceedings Article | 15 March 2012 Paper

Computational lithography work flows and design rule exploration automation

S. Sethi, William Stanton, Kevin Lucas, Jay Hiserote, Duck-Hyung Hur, Rooli Choi

Proceedings Volume 8327, 83270O (2012) https://doi.org/10.1117/12.918057

KEYWORDS: Source mask optimization, Optical proximity correction, Optimization (mathematics), Computational lithography, Resolution enhancement technologies, Atrial fibrillation, Lithography, Computing systems, Manufacturing, Process engineering

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Proceedings Article | 4 December 2008 Paper

Optimization of RET flow using test layout

Yunqiang Zhang, Satyendra Sethi, Kevin Lucas

Proceedings Volume 7140, 71402D (2008) https://doi.org/10.1117/12.804621

KEYWORDS: Atrial fibrillation, Optical proximity correction, Resolution enhancement technologies, Lithography, Diffractive optical elements, Accuracy assessment, Lithographic illumination, Argon, Printing, Roads

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Proceedings Article | 17 October 2008 Paper

32nm design rule and process exploration flow

Yunqiang Zhang, Jonathan Cobb, Amy Yang, Ji Li, Kevin Lucas, Satyendra Sethi

Proceedings Volume 7122, 71223Z (2008) https://doi.org/10.1117/12.801593

KEYWORDS: Optical proximity correction, Atrial fibrillation, Lithography, Lithographic illumination, Manufacturing, Resolution enhancement technologies, Optical lithography, Process modeling, Semiconductors, Semiconducting wafers

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Proceedings Article | 11 April 2008 Paper

Analysis of OPC optical model accuracy with detailed scanner information

Lena Zavyalova, Kevin Lucas, Qiaolin Zhang, Yongfa Fan, Satyendra Sethi, Hua Song, Jacek Tyminski

Proceedings Volume 6924, 69241D (2008) https://doi.org/10.1117/12.774116

KEYWORDS: Optical proximity correction, TCAD, Metrology, Lithography, Scanners, Systems modeling, Photomasks, Data modeling, Wafer-level optics, Semiconducting wafers

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Proceedings Article | 23 June 2000 Paper

0.12-um logic process using a 248-nm step-and-scan system

Daniel Baker, Tammy Zheng, Clifford Takemoto, Satyendra Sethi, Calvin Gabriel, Gregory Scott

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388313

KEYWORDS: Etching, Photoresist processing, Photoresist materials, Optical lithography, Printing, Logic, Semiconducting wafers, Image processing, Transistors, Lithography

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Proceedings Article | 26 May 1995 Paper

Improving the backend focus budget for 0.5 um lithography

Satyendra Sethi, Alex Flores, P. McHale, R. Booth, Steve Graca, S. Frezon, C. Fruga

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209290

KEYWORDS: Metals, Semiconducting wafers, Lithography, Manufacturing, Wafer testing, Printing, Resist chemistry, Chemical mechanical planarization, Error analysis, Monochromatic aberrations

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Proceedings Article | 26 May 1995 Paper

Lithography strategy for printing 0.35 um devices

Satyendra Sethi, Mark Barrick, Jason Massey, C. Froelich, Michele Weilemann, F. Garza

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209277

KEYWORDS: Deep ultraviolet, Lithography, Printing, Semiconducting wafers, Chemically amplified resists, Reflectivity, Absorbance, Scanning electron microscopy, Data modeling, Reticles

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Proceedings Article | 1 May 1994 Paper

Advanced photolithographic process modeling and characterization via wafer flatness measurements

Satyendra Sethi, Sagar Pushpala, Terry Von Salza Brown, Clifford Takemoto, Gabriel Li, James Kawski, Randal Goodall, H. Noguchi, David Luo

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174131

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Process modeling

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Proceedings Article | 8 August 1993 Paper

0.35-micron excimer DUV photolithography process

Donald Arugu, Kent Green, Peter Nunan, Marcel Terbeek, Sue Crank, Lam Ta, Elliott Capsuto, Satyendra Sethi

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150433

KEYWORDS: Deep ultraviolet, Optical lithography, Transistors, Semiconducting wafers, Metals, Resistance, Excimers, Excimer lasers, Lithography, Manufacturing

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Proceedings Article | 4 August 1993 Paper

Lithographic effects of metal reflectivity variations

Nathan Thane, Chris Mack, Satyendra Sethi

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148978

KEYWORDS: Reflectivity, Semiconducting wafers, Tin, Aluminum, Lithography, Metals, Photoresist processing, Current controlled current source, Critical dimension metrology, Data modeling

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Proceedings Article | 1 June 1992 Paper

Strategies for deep-UV patterning of half-micron contacts using negative photoresists

Susan Jones, Elliott Capsuto, Bruce Dudley, Satyendra Sethi, Charles Peters

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130333

KEYWORDS: Optical lithography, Deep ultraviolet, Photoresist materials, Oxides, Diffusion, Etching, Scanning electron microscopy, Photoresist processing, Reflectivity, Antireflective coatings

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Proceedings Article | 1 February 1992 Paper

Relationship between DUV lithography and etch for pattern transfer

Joyce Witowski, Elliott Capsuto, Satyendra Sethi, John Kochan

Proceedings Volume 1593, (1992) https://doi.org/10.1117/12.56928

KEYWORDS: Etching, Lithography, Critical dimension metrology, Deep ultraviolet, Semiconducting wafers, Photoresist materials, Plasma, Dry etching, Oxides, Tungsten

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Proceedings Article | 1 July 1991 Paper

Use of antireflective coatings in deep-UV lithography

Satyendra Sethi, Romelia Distasio, David Ziger, James Lamb, Tony Flaim

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44772

KEYWORDS: Antireflective coatings, Reflectivity, Semiconducting wafers, Lithography, Excimer lasers, Oxides, Deep ultraviolet, Etching, Aluminum, Tungsten

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Showing 5 of 13 publications

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