Dr. Shahin Zangooie Profile

Dr. Shahin Zangooie

Principal Development Engineer at Western Digital Corp

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Publications (8)

SPIE Journal Paper | 16 October 2014

Scatterometry performance enhancement by holistic approach

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot

JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

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Proceedings Article | 2 April 2014 Paper

Scatterometry performance improvement by parameter and spectrum feed-forward

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour

Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639

KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Enhanced optical CD metrology by hybridization and azimuthal scatterometry

Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu

Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165

KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

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Proceedings Article | 10 April 2013 Paper

Scatterometry accuracy improvement using 3D shapes

Shahin Zangooie, Satyanarayana Myneni, Peter Wilkens, Nicholas Keller, Thankasala Sarathy, Milad Tabet

Proceedings Volume 8681, 86811S (2013) https://doi.org/10.1117/12.2011616

KEYWORDS: Scatterometry, Reactive ion etching, 3D metrology, Semiconducting wafers, 3D acquisition, Ions, Metrology, Critical dimension metrology, Scatter measurement, 3D modeling

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Proceedings Article | 22 March 2008 Paper

Characterization of 32nm node BEOL grating structures using scatterometry

Shahin Zangooie, Matthew Sendelbach, Matthew Angyal, Charles Archie, Alok Vaid, Itty Matthew, Pedro Herrera

Proceedings Volume 6922, 69220S (2008) https://doi.org/10.1117/12.773088

KEYWORDS: Copper, Scatterometry, Back end of line, Metals, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization, Metrology, Inspection, Dielectrics

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Proceedings Article | 22 March 2008 Paper

Scatterometry as technology enabler for embedded SiGe process

Alok Vaid, Rohit Pal, Matthew Sendelbach, Shahin Zangooie, Kevin Lensing, Carsten Hartig

Proceedings Volume 6922, 69220U (2008) https://doi.org/10.1117/12.774564

KEYWORDS: Scatterometry, Metrology, Semiconducting wafers, Transmission electron microscopy, Scatter measurement, Etching, Diffractive optical elements, Silicon, Process control, Germanium

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Proceedings Article | 22 March 2008 Paper

Assessing scatterometry for measuring advanced spacer structures with embedded SiGe

Matthew Sendelbach, Shahin Zangooie, Alok Vaid, Pedro Herrera, Jingmin Leng, InKyo Kim

Proceedings Volume 6922, 69220R (2008) https://doi.org/10.1117/12.774823

KEYWORDS: Transmission electron microscopy, Semiconducting wafers, Deep ultraviolet, Single crystal X-ray diffraction, Ultraviolet radiation, Oxides, Scatterometry, UV optics, Metrology, Scatter measurement

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Proceedings Article | 5 April 2007 Paper

Characterization of capacitive 3D deep trench mask open structures using scatterometry

Shahin Zangooie, Pedro Herrera, Abebe Mesfin, Chas Archie, Matthew Sendelbach

Proceedings Volume 6518, 651827 (2007) https://doi.org/10.1117/12.712763

KEYWORDS: Scatterometry, Silicon, Metrology, Semiconducting wafers, Critical dimension metrology, Photomasks, 3D metrology, Scatter measurement, Scanning electron microscopy, Etching

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Showing 5 of 8 publications

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