Mr. Shangliang Jiang Profile

Shangliang Jiang

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Publications (6)

SPIE Journal Paper | 3 November 2014 Open Access

Fast pixel-based optical proximity correction based on nonparametric kernel regression

Xu Ma, Bingliang Wu, Zhiyang Song, Shangliang Jiang, Yanqiu Li

JM3, Vol. 13, Issue 04, 043007, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043007

KEYWORDS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF

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Proceedings Article | 15 October 2014 Paper

Shot overlap model-based fracturing of curvilinear OPC layouts

Shangliang Jiang, Avideh Zakhor

Proceedings Volume 9235, 92351V (2014) https://doi.org/10.1117/12.2066180

KEYWORDS: Photomasks, Model-based design, Optical proximity correction, Chemical mechanical planarization, Algorithm development, Manufacturing, Associative arrays, Integrated circuits, Data modeling, Machine learning

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Proceedings Article | 31 March 2014 Paper

Shot overlap model-based fracturing for edge-based OPC layouts

Shangliang Jiang, Avideh Zakhor

Proceedings Volume 9052, 90520L (2014) https://doi.org/10.1117/12.2046650

KEYWORDS: Photomasks, Model-based design, Scattering, Optical proximity correction, Algorithm development, Distortion, Semiconducting wafers, Mask making, Data modeling, Electron beams

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Proceedings Article | 14 October 2011 Paper

Application of signal reconstruction techniques to shot count reduction in simulation driven fracturing

Shangliang Jiang, Avideh Zakhor

Proceedings Volume 8166, 81660U (2011) https://doi.org/10.1117/12.897051

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Associative arrays, Detection and tracking algorithms, Logic, Computer simulations, Electron beams, Data modeling

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Proceedings Article | 23 March 2011 Paper

A recursive cost-based approach to fracturing

Shangliang Jiang, Xu Ma, Avideh Zakhor

Proceedings Volume 7973, 79732P (2011) https://doi.org/10.1117/12.879583

KEYWORDS: Optical proximity correction, Photomasks, Metals, Algorithm development, Critical dimension metrology, Vestigial sideband modulation, Computer programming, Optical lithography, Beam shaping, Computer simulations

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Proceedings Article | 23 March 2011 Paper

A cost-driven fracture heuristics to minimize external sliver length

Xu Ma, Shangliang Jiang, Avideh Zakhor

Proceedings Volume 7973, 79732O (2011) https://doi.org/10.1117/12.879276

KEYWORDS: Photomasks, Critical dimension metrology, Computer programming, Optical proximity correction, Resolution enhancement technologies, Vestigial sideband modulation, SRAF, Optical lithography, Beam shaping, Transistors

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