Dr. Shih-Chi Fu Profile

Dr. Shih-Chi Fu

Deputy Director at Taiwan Semiconductor Mfg

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Author

Publications (4)

Proceedings Article | 4 May 2005 Paper

Effects of wet-cleans and surface treatments on the adhesion of a photoresist to HDP-oxide substrate

Shih-Chi Fu, Jieh-Jang Chen, Feng-Jia Shiu, Ching-Sen Kuo, Gwo-Yun Shiau, Chia-Shiung Tsia, Chung Wang

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601435

KEYWORDS: Oxides, High power microwaves, Photoresist materials, Semiconducting wafers, Contamination, Surface roughness, Atomic force microscopy, Liquids, Safety, Polymers

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Proceedings Article | 26 June 2003 Paper

Maximization of process window for low-k1 spaces using KrF lithography

Shih-Chi Fu, Ching-Sen Kuo, Feng-Jia Shiu, Jieh-Jang Chen, Chia-Shiung Tsia, Chia-Tong Ho, Chung Wang

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485360

KEYWORDS: SRAF, Photomasks, Nanoimprint lithography, Lithography, Photoresist materials, Optical lithography, Image processing, Resolution enhancement technologies, Diffraction, Manufacturing

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Proceedings Article | 16 July 2002 Paper

Influence of coma effect on scanner overlay

Jieh-Jang Chen, Chen-Ming Huang, Fan-Jia Shiu, Ching-Sen Kuo, S. Fu, C. Ho, Chung Wang, J. Tsai

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473467

KEYWORDS: Monochromatic aberrations, Overlay metrology, Scanners, Critical dimension metrology, Optical alignment, Distortion, Optical proximity correction, Image quality, Metrology, Instrument modeling

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Proceedings Article | 24 August 2001 Paper

Negative-tone cycloolefin photoresist for 193-nm lithography

ShihChi Fu, Kuo-Huang Hsieh, Lon Wang

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436906

KEYWORDS: Lithography, Polymers, Photoresist materials, Etching, Resistance, FT-IR spectroscopy, Semiconducting wafers, 193nm lithography, Polymerization, Palladium

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