Shikhar Arvind
at imec
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | 25 September 2024
JM3, Vol. 23, Issue 04, 041406, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041406
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Reflectivity, Ruthenium, Pellicles, EUV optics, Reflectometry, Optical properties, Systems modeling

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 1249407 (2023) https://doi.org/10.1117/12.2658359
KEYWORDS: Extreme ultraviolet, Photoresist materials, Reflectometry, Extreme ultraviolet lithography, Optical constants, Interfaces

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