Dr. Shinji Kishimura
Chief Engineer at Panasonic Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 4 April 2007 Paper
Proceedings Volume 6519, 65190E (2007) https://doi.org/10.1117/12.713150
KEYWORDS: Digital watermarking, Thin film coatings, Water, Semiconducting wafers, Crystals, Quartz, Silicon, Immersion lithography, Inspection, Polymers

Proceedings Article | 29 March 2006 Paper
N. Stepanenko, Hyun-Woo Kim, S. Kishimura, D. Van Den Heuvel, N. Vandenbroeck, M. Kocsis, P. Foubert, M. Maenhoudt, M. Ercken, F. Van Roey, R. Gronheid, I. Pollentier, D. Vangoidsenhoven, C. Delvaux, C. Baerts, S. O'Brien, W. Fyen, G. Wells
Proceedings Volume 6153, 615304 (2006) https://doi.org/10.1117/12.660158
KEYWORDS: Thin film coatings, Digital watermarking, Particles, Semiconducting wafers, Immersion lithography, Scanners, Water, Critical dimension metrology, Photomasks, Scatterometry

Proceedings Article | 20 March 2006 Paper
Michael Kocsis, Dieter Van Den Heuvel, Roel Gronheid, Mireille Maenhoudt, Dizana Vangoidsenhoven, Greg Wells, Nickolay Stepanenko, Michael Benndorf, Hyun Woo Kim, Shinji Kishimura, Monique Ercken, Frieda Van Roey, S. O'Brien, Wim Fyen, Philippe Foubert, Richard Moerman, Bob Streefkerk
Proceedings Volume 6154, 615409 (2006) https://doi.org/10.1117/12.660432
KEYWORDS: Semiconducting wafers, Thin film coatings, Water, Particles, Scanners, Immersion lithography, Manufacturing, Scanning electron microscopy, Space operations, Distortion

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598532
KEYWORDS: Ions, Immersion lithography, Water, Lithography, Optical lithography, Analytical research, Quartz, Crystals, Semiconducting wafers, Surface roughness

Proceedings Article | 14 May 2004 Paper
Shinji Kishimura, Masayuki Endo, Masaru Sasago
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534759
KEYWORDS: Water, Immersion lithography, Monochromatic aberrations, Polymers, Ions, Photoresist processing, FT-IR spectroscopy, Semiconducting wafers, Silicon, Metals

Proceedings Article | 24 July 2002 Paper
Shinji Kishimura, Masayuki Endo, Masaru Sasago
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474219
KEYWORDS: Etching, Polymers, Resistance, Chemical species, Oxides, Fluorine, Oxygen, Transparency, Carbon, Absorbance

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472272
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Wafer-level optics, Chemically amplified resists, Mirrors, Chromium, Edge roughness, Silicon, Scanning electron microscopy

Proceedings Article | 23 June 2000 Paper
Shinji Kishimura, Akiko Katsuyama, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388318
KEYWORDS: Polymers, Vacuum ultraviolet, Excimer lasers, Lithography, Transparency, Photoresist processing, Transmittance, FT-IR spectroscopy, Imaging systems, Absorption

Proceedings Article | 29 June 1998 Paper
Shinji Kishimura, Makoto Takahashi, Keisuke Nakazawa, Takeshi Ohfuji, Masaru Sasago, Masaya Uematsu, Tohru Ogawa, Hiroshi Ohtsuka
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310760
KEYWORDS: Lithography, Reflectivity, Excimer lasers, Etching, Refractive index, Silicon, Dry etching, Bottom antireflective coatings, Antireflective coatings, Spectroscopy

Proceedings Article | 29 June 1998 Paper
Atsuko Yamaguchi, Shinji Kishimura, Nobuyuki Matsuzawa, Takeshi Ohfuji, Tomoaki Tanaka, Seiichi Tagawa, Masaru Sasago
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312365
KEYWORDS: Diffusion, Particles, Polymers, Platinum, Molecules, Chemical analysis, Monte Carlo methods, Electronics, Polymerization, 3D modeling

Proceedings Article | 29 June 1998 Paper
Makoto Takahashi, Shinji Kishimura, Takuya Naito, Takeshi Ohfuji, Masaru Sasago
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312409
KEYWORDS: Lithography, Resolution enhancement technologies, Photoresist processing, Polymers, Phase shifts, Photomasks, Optical lithography, Solids, Lithographic illumination, Transparency

Proceedings Article | 7 July 1997 Paper
Shinji Kishimura, Yoshika Kimura, Junjiro Sakai, Kouichirou Tsujita, Yasuji Matsui
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275894
KEYWORDS: Polymers, Resistance, Etching, Dry etching, Deep ultraviolet, Chlorine, Plasma, Temperature metrology, Molecules, Absorbance

Proceedings Article | 1 June 1990 Paper
Hirofumi Fujioka, Hiroyuki Nakajima, Shinji Kishimura, Hitoshi Nagata
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20108
KEYWORDS: Reactive ion etching, Polymers, Germanium, Silicon, Photoresist processing, Deep ultraviolet, Electron beams, Etching, Semiconducting wafers, Oxides

Showing 5 of 13 publications
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