Mr. Shu-Hao Chang Profile

Shu-Hao Chang

at Taiwan Semiconductor Manufacturing Co Ltd

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Author

Publications (6)

Proceedings Article | 19 March 2015 Paper

An accurate method to determine the amount of out-of-band light in an EUV scanner

Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Chia-Chun Chung, Shang-Chieh Chien, Shun-Der Wu, Norman Chen, Shu-Hao Chang, Hsiang-Yu Chou, Jui-Ching Wu, Tao-Ming Huang, Jack J. H. Chen, Anthony Yen

Proceedings Volume 9422, 94221T (2015) https://doi.org/10.1117/12.2085089

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Optical proximity correction, Reflectivity, Aluminum, Line width roughness, Light, Scanners, Light sources

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Proceedings Article | 1 April 2013 Paper

Quencher distribution engineering of out-of-band insensitive EUV resists: experiments and stochastic simulation

Shang-Chieh Chien, Shu-Hao Chang, Jui-Ching Wu, Jack J. Chen, Anthony Yen

Proceedings Volume 8679, 867929 (2013) https://doi.org/10.1117/12.2010658

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Stochastic processes, Lithography, Polymers, Contamination, Scanners, Electroluminescence, Statistical modeling

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Proceedings Article | 1 April 2013 Paper

Balancing lithographic performance and resist outgassing in EUV resists

Shu-Hao Chang, Shu-Fang Chen, Ying-Yu Chen, Ming-Chin Chien, Shang-Chieh Chien, Tzu-Lih Lee, Jack J. Chen, Anthony Yen

Proceedings Volume 8679, 86790O (2013) https://doi.org/10.1117/12.2010794

KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Line width roughness, Semiconducting wafers, Scanners, Ruthenium, Polymers, Carbon

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Proceedings Article | 23 March 2012 Paper

The role resist plays in EUVL extensibility

Shinn-Sheng Yu, Anthony Yen, Chih-T'sung Shih, Yen-Cheng Lu, Shu-Hao Chang, Jui-Ching Wu, Jimmy Hu, Timothy Wu

Proceedings Volume 8322, 83222A (2012) https://doi.org/10.1117/12.916024

KEYWORDS: Extreme ultraviolet lithography, Electroluminescence, Diffusion, Lithography, Extreme ultraviolet, Modulation transfer functions, Nanoimprint lithography, Performance modeling, Photomasks, Image resolution

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Proceedings Article | 8 April 2011 Paper

On the extensibility of extreme UV lithography

Shinn-Sheng Yu, Anthony Yen, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Jimmy Hu, Timothy Wu

Proceedings Volume 7969, 79693A (2011) https://doi.org/10.1117/12.881586

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Electroluminescence, Extreme ultraviolet, Lithography, Phase shifts, Scanners, Optical lithography, Semiconducting wafers, Imaging systems

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Proceedings Article | 7 April 2011 Paper

Printability of buried mask defects in extreme UV lithography

Pei-Cheng Hsu, Ming-Jiun Yao, Wen-Chang Hsueh, Chia-Jen Chen, Shin-Chang Lee, Ching-Fang Yu, Luke Hsu, Sheng-Ji Chin, Jimmy Hu, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Timothy Wu, Shinn-Sheng Yu, Anthony Yen

Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

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Showing 5 of 6 publications

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