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Shunichiro Sato
at Sony Corp
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Publications (4)
Proceedings Article | 10 March 2006 Paper
Dry-etch proximity function for model-based OPC beyond 65-nm node
Proceedings Volume 6155, 615504 (2006) https://doi.org/10.1117/12.657043
KEYWORDS: Etching, Optical proximity correction, Model-based design, Silica, Silicon, Data analysis, Data modeling, Edge detection, Instrument modeling, Process modeling
Proceedings Article | 28 May 2004 Paper
Integrated OPC approach to line-end shortening effects on the photomask and silicon levels for ArF attenuated PSM lithography
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533987
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Cadmium, Silicon, Critical dimension metrology, Wafer-level optics, Optical calibration, Diffractive optical elements
Proceedings Article | 26 June 2003 Paper
Impact of inter-mask CD error on OPC accuracy in resolution of 90 nm and below
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485380
KEYWORDS: Photomasks, Optical proximity correction, Cadmium, Semiconducting wafers, Critical dimension metrology, Scanners, Calibration, Lithography, Phase shifts, Diffusion
Proceedings Article | 1 August 2002 Paper
Advanced pattern correction method for fabricating highly accurate reticles
Shunichiro Sato, Masaaki Koyama, Mikio Katsumata, Ichiro Kagami, Hiroichi Kawahira
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476964
KEYWORDS: Critical dimension metrology, Dry etching, Etching, Cadmium, Modulation, Optical proximity correction, Reticles, Photomasks, Electron beams, Logic
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