Mr. Shuo-Yen Chou Profile

Shuo-Yen Chou

at National Yang Ming Chiao Tung Univ.

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 October 2002

Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing

Shuo-Yen Chou, Jen-Chung Lou, Fu-Jye Liang, Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502261

KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 14 September 2001 Paper

Lithography challenges of dual-damascence process in 0.13 um era

Li-Jui Chen, Lin-Hung Shiu, Chern-Shyan Tsai, Ching-Hsu Chang, Tsung-Kuei Kang, Shuo-Yen Chou

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435791

KEYWORDS: Reflectivity, Etching, Image processing, Lithography, Photoresist processing, Optical lithography, Critical dimension metrology, Coating, Polymers, Dielectrics

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Proceedings Article | 14 September 2001 Paper

Evaluating the impact of spherical aberration on sub-0.2-um contact/via hole patterning

Shuo-Yen Chou, Jen-Chung Lou, Chih-Ming Lai, Fu-Jye Liang, Li-Jui Chen

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435668

KEYWORDS: Monochromatic aberrations, Photomasks, Lithography, Phase shifts, Lithographic illumination, Optical lithography, Critical dimension metrology, Electroluminescence, Printing, Diffraction

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Proceedings Article | 14 September 2001 Paper

Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, Lin-Hung Shiu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435683

KEYWORDS: Antimony, Scattering, Critical dimension metrology, Double sideband modulation, Resolution enhancement technologies, Modulation, Superposition, Light scattering, Chromium, Photoresist processing

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Proceedings Article | 24 August 2001 Paper

Novel negative photoresist process for 0.18 um dual damascene

Lin-Hung Shiu, Chih-Ming Lai, Fu-Jye Liang, Hung-Chun Chen, Li-Jui Chen, Shuo-Yen Chou

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436891

KEYWORDS: Photoresist processing, Scanning electron microscopy, Etching, Copper, Resolution enhancement technologies, Bottom antireflective coatings, Photomasks, Photoresist materials, Phase shifts, Aluminum

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Proceedings Article | 30 December 1999 Paper

High-transmission PSM inspection sensitivity

Chunhung Wu, David Wang, Chien-Ming Wang, Li-Jui Chen, Shuo-Yen Chou, Clare Wu, Nathan Schumann, Reuven Falah, Wolfgang Staud

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373307

KEYWORDS: Inspection, Scattering, Optical proximity correction, Photomasks, Transmittance, Reticles, Glasses, Binary data, Critical dimension metrology, Phase shifts

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Proceedings Article | 26 July 1999 Paper

Antireflection strategies for sub-0.18-um dual-damascene structure patterning in KrF 248-nm lithography

Shuo-Yen Chou, Chien-Ming Wang, Chin Hsia, Li-Jui Chen, Gue-Wuu Hwang, Shyh-Dar Lee, Jen-Chung Lou

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354410

KEYWORDS: Reflectivity, Critical dimension metrology, Oxides, Semiconducting wafers, Refractive index, Optical lithography, Lithography, Photoresist materials, Dielectrics, Silicon

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Showing 5 of 7 publications

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