Dr. Soichi Owa
Nikon Fellow
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (40)

Proceedings Article | 10 April 2024 Presentation + Paper
Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12953, 129530R (2024) https://doi.org/10.1117/12.3010082
KEYWORDS: Spatial light modulators, Micromirrors, Optical lithography, Maskless lithography, Phase shifting

Proceedings Article | 29 September 2023 Paper
Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546
KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

SPIE Journal Paper | 5 June 2023
JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403
KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

SPIE Journal Paper | 5 June 2023 Open Access
JM3, Vol. 22, Issue 04, 041402, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041402
KEYWORDS: Spatial light modulators, Semiconducting wafers, Micromirrors, Optics manufacturing, Semiconductor manufacturing, Silicon, Digital micromirror devices, Wafer-level optics, Pulsed laser operation, Projection systems

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730
KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

Showing 5 of 40 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 14 April 2021

SPIE Conference Volume | 13 April 2020

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 23 May 2018

Conference Committee Involvement (16)
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Showing 5 of 16 Conference Committees
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