Dr. Stefan M. Weber Profile

Dr. Stefan M. Weber

at Phaseform GmbH

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Author

Publications (4)

Proceedings Article | 14 February 2011 Paper

Shaping light with MOEMS

W. Noell, S. Weber, J. Masson, J. Extermann, L. Bonacina, A. Bich, R. Bitterli, H. P. Herzig, D. Kiselev, T. Scharf, R. Voelkel, K. Weible, J.-P. Wolf, N. de Rooij

Proceedings Volume 7930, 79300P (2011) https://doi.org/10.1117/12.873051

KEYWORDS: Mirrors, Diffusers, Microopto electromechanical systems, Actuators, Micromirrors, Silicon, Ultraviolet radiation, Beam shaping, Pulse shaping, Magnetism

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Proceedings Article | 17 February 2010 Paper

High aspect ratio micromirror array with two degrees of freedom for femtosecond pulse shaping

Stefan Weber, Wilfried Noell, Sébastien Lani, Fabio Jutzi, Peter Brühlmeier, Denis Kiselev, Jérôme Extermann, Luigi Bonacina, Jean-Pierre Wolf, Nico de Rooij

Proceedings Volume 7594, 75940J (2010) https://doi.org/10.1117/12.840847

KEYWORDS: Mirrors, Actuators, Gold, Microelectromechanical systems, Micromirrors, Femtosecond phenomena, Packaging, Femtosecond pulse shaping, Reflectivity, Microopto electromechanical systems

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Proceedings Article | 24 February 2009 Paper

MEMS for femtosecond pulse shaping applications

Ariana Rondi, Jérôme Extermann, Stefan Weber, Luigi Bonacina, Jonathan Roslund, Matthias Roth, Herschel Rabitz, Jean-Pierre Wolf

Proceedings Volume 7209, 72090A (2009) https://doi.org/10.1117/12.812102

KEYWORDS: Ultraviolet radiation, Microelectromechanical systems, Design for manufacturing, Femtosecond pulse shaping, Crystals, Signal detection, Micromirrors, Nonlinear crystals, Liquid crystals, Reflectivity

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Proceedings Article | 19 February 2009 Paper

Linear micromirror array for broadband femtosecond pulse shaping in phase and amplitude

Stefan Weber, Severin Waldis, Wilfried Noell, Denis Kiselev, Jérôme Extermann, Luigi Bonacina, Jean-Pierre Wolf, Nico de Rooij

Proceedings Volume 7208, 720805 (2009) https://doi.org/10.1117/12.808162

KEYWORDS: Mirrors, Micromirrors, Femtosecond phenomena, Phase shift keying, Ultraviolet radiation, Femtosecond pulse shaping, Amplitude modulation, Pulse shaping, Deep reactive ion etching, Microelectromechanical systems

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