Dr. Stephan Zimmermann
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570K (2019) https://doi.org/10.1117/12.2513666
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Electron beam lithography, Reticles

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