Dr. Stephanie Reynoso Profile

Dr. Stephanie Reynoso

at IBM Thomas J. Watson Research Ctr.

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Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper

EUV patterned gate variation reduction in next generation transistor architectures

Gopal Sankar Kenath, Martin Burkhardt, Nikhil Jain, Anna Lin, Jennifer Church, Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw, Pietro Montanini, Eric Miller, Indira Seshadri, Luciana Meli, Nelson Felix

Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023

KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

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