Mr. Steven R. Droes Profile

Steven R. Droes

at SHARP Labs of America Inc

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Author

Publications (3)

Proceedings Article | 16 May 2003 Paper

Low temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications

Pooran Joshi, M. Moriguchi, Mark Crowder, Steven Droes, James Flores, Apostolos Voutsas, John Hartzell

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482597

KEYWORDS: Thin films, Oxides, Dielectrics, Capacitors, Refractive index, Thin film devices, Plasma, Plasma enhanced chemical vapor deposition, Molybdenum, Thin film deposition

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Proceedings Article | 16 May 2003 Paper

TFT threshold voltage adjustment with in-situ doped PVD silicon films

Steven Droes, Mikel Atkinson, Patrick Guthrie, Mark Crowder, Apostolos Voutsas

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482596

KEYWORDS: Plasma enhanced chemical vapor deposition, Doping, Amorphous silicon, Boron, Silicon films, Laser crystals, Silicon, Sputter deposition, Crystals, Semiconducting wafers

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Proceedings Article | 16 May 2003 Paper

Location-controlled crystallization of Si films for TFT circuitapplications

Mark Crowder, Apostolos Voutsas, Steven Droes, M. Moriguchi, Y. Mitani

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482592

KEYWORDS: Crystals, Silicon, Laser sintering, Oscillators, Solids, Surface roughness, Microelectronics, Thin films, Transistors, Integrated circuit design

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