Dr. Takashi Saitou Profile

Dr. Takashi Saitou

Director and Senior Executive Officer at Gigaphoton Inc

SPIE Involvement:

Author

Publications (48)

Proceedings Article | 12 November 2024 Poster + Paper

Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Atsushi Ueda, Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 13215, 132150X (2024) https://doi.org/10.1117/12.3034058

KEYWORDS: Extreme ultraviolet, Light sources, Tin, Collector mirrors, Plasma, Plasma generation, Reflectivity, Laser irradiation

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Proceedings Article | 10 April 2024 Poster

Enhancing wafer productivity through increased repetition rate to 6.75khz with gt80a as ArF immersion light source

Natsuhiko Kouno, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Proceedings Volume PC12953, PC129530T (2024) https://doi.org/10.1117/12.3009787

KEYWORDS: Light sources, Semiconducting wafers, Vacuum chambers, Laser stabilization, Design and modelling, Acoustic waves, Power supplies, Power consumption, Optical components, Dose control

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Proceedings Article | 10 April 2024 Presentation

Improved ArFi scanner throughput and process yield through a next generation DUV light source featuring high-repetition rate and enhanced speckle contrast

Toshihiro Oga, Takamitsu Komaki, Takeshi Ohta, Shinichi Matsumoto, Katsuhiko Wakana, Kouji Kakizaki, Takashi Saitou

Proceedings Volume PC12953, PC129530C (2024) https://doi.org/10.1117/12.3009784

KEYWORDS: Scanners, Speckle, Deep ultraviolet, Yield improvement, Optical components, Semiconductors, Semiconducting wafers, Pulsed laser operation, Lithography, Line edge roughness

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Proceedings Article | 10 April 2024 Poster + Paper

Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito

Proceedings Volume 12953, 1295313 (2024) https://doi.org/10.1117/12.3010135

KEYWORDS: Extreme ultraviolet, Tin, Light sources, Inspection, Plasma, Collector mirrors, Plasma generation, Control systems, Laser irradiation, Reliability

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Proceedings Article | 10 April 2024 Poster

Analyzing line width roughness (LWR) sensitivity to resist and laser-induced speckle for enhanced PSD-based quantification

Takamitsu Komaki, Tomohiro Iwaki, Yuichi Mukai, Kouichi Fujii, Toshihiro Kobayashi, Toshihiro Ohga, Kouji Kakizaki, Takashi Saito, Risa Yasue, Natsuki Okada, Katsunori Otsuki, Tomonori Okada, Kanji Sugino, Takahito Kumazaki

Proceedings Volume PC12953, PC129530S (2024) https://doi.org/10.1117/12.3008944

KEYWORDS: Speckle, Line width roughness, Semiconductors, Scanners, Lithography, Light sources, Chromatic aberrations

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Proceedings Article | 10 April 2024 Poster

Maximizing availability by enhancing operational efficiency and implementing sophisticated maintenance strategies in complex ArFi light source

Shinichi Matsumoto, Satoshi Tanaka, Toshihiro Oga, Takamitsu Komaki, Katsuhiko Wakana, Takeshi Ohta, Takashi Saitou

Proceedings Volume PC12953, PC129530U (2024) https://doi.org/10.1117/12.3009846

KEYWORDS: Telecommunications, Standards development, Machine learning, Light sources, Data analysis, Speckle, Semiconductor manufacturing, Optics manufacturing, Instrument modeling, Immersion lithography

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Proceedings Article | 21 November 2023 Poster + Paper

Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 12750, 127500V (2023) https://doi.org/10.1117/12.2686618

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Laser irradiation, Collector mirrors, Tin, Laser applications, Semiconductors, Reliability, Plasma

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Proceedings Article | 30 April 2023 Presentation

To enhance EPE through PSD based quantification analysis of resist impact and lightsource induced LWR/LER

Toshihiro Oga, Takamitsu Komaki, Takeshi Ohta, Shinichi Matsumoto, Takashi Saitou, Tomohiro Iwaki, Kanji Sugino, Katsunori Otsuki

Proceedings Volume PC12494, PC124940C (2023) https://doi.org/10.1117/12.2658142

KEYWORDS: Semiconductors, Line edge roughness, Lithography, Line width roughness, Speckle, Manufacturing, Logic devices, Immersion lithography, Error analysis, Artificial intelligence

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Proceedings Article | 28 April 2023 Poster + Paper

Development progress of key components for LPP-EUV light sources

Hiroaki Tomuro, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 12494, 1249411 (2023) https://doi.org/10.1117/12.2657640

KEYWORDS: Extreme ultraviolet, Tin, Collector mirrors, Laser irradiation, Light sources, Plasma, Ions, Gas lasers, Hydrogen, Control systems

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Proceedings Article | 14 April 2023 Poster

Contributing to sustainability delivers maximizing availability by the latest light source for the ArF immersion lithography and KrF lithography

Takeda Yuuki, Takamitsu Komaki, Hirotaka Miyamoto, Tsukasa Hori, Katsuhiko Wakana, Takeshi Ohta, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume PC12494, PC124940J (2023) https://doi.org/10.1117/12.2658263

KEYWORDS: Light sources, Immersion lithography, Semiconductors, Optical components, Manufacturing, Electrodes

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Proceedings Article | 1 December 2022 Paper

High-power LPP-EUV source for semiconductor HVM: lithography and other applications

Hakaru Mizoguchi, Hiroaki Nakarai, Yasutsugu Usami, Kouji Kakizaki, Junichi Fujimoto, Takashi Saitou

Proceedings Volume 12292, 122920X (2022) https://doi.org/10.1117/12.2657787

KEYWORDS: Extreme ultraviolet, Mirrors, Deep ultraviolet, Lithography, Light sources, Carbon dioxide lasers, Laser systems engineering, Semiconductors, Photomasks, Inspection

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Proceedings Article | 13 October 2021 Presentation + Paper

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11854, 118540K (2021) https://doi.org/10.1117/12.2600714

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Plasma, Laser systems engineering, Extreme ultraviolet lithography, Light sources, Reflectivity, Laser development

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Proceedings Article | 23 February 2021 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long mirror lifetime-III for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanak, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, George Sumangne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11609, 1160919 (2021) https://doi.org/10.1117/12.2581910

KEYWORDS: Mirrors, Semiconductors, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Magnetism, Light sources, Tin, Reflectivity

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Proceedings Article | 22 February 2021 Presentation

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

Hirotaka Miyamoto, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki, Tsukasa Hori, Masato Moriya, Hiroshi Tanaka, Takuya Ishii, Akihiko Kurosu, Katsuhiko Wakana, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281

KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

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Proceedings Article | 20 September 2020 Presentation

Update of >300W high power LPP-EUV source challenge for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Yoshifumi Ueno, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou, Hirokazu Hosoda, Hiroaki Tomuro, Shinji Nagai, Gouta Niimi, Takashi Suganuma

Proceedings Volume 11517, 115170Q (2020) https://doi.org/10.1117/12.2574707

KEYWORDS: Mirrors, Semiconductors, Extreme ultraviolet, Carbon dioxide lasers, Extreme ultraviolet lithography, Light sources, Magnetism, Magnetic semiconductors, Tin, Pulsed laser operation

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Proceedings Article | 23 March 2020 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11323, 113230X (2020) https://doi.org/10.1117/12.2549905

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Mirrors, Tin, Plasma, Light sources, Extreme ultraviolet lithography, Reflectivity, Magnetism, Laser development

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Proceedings Article | 23 March 2020 Paper

Update of development progress of the high power LPP-EUV light source using a magnetic field

Gouta Niimi, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11323, 1132328 (2020) https://doi.org/10.1117/12.2544051

KEYWORDS: Gas lasers, Carbon monoxide, Extreme ultraviolet, Tin, Mirrors, Magnetism, Plasma, Light sources, Control systems, Pulsed laser operation

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Proceedings Article | 23 March 2020 Paper

Imaging performance enhancement by improvements of spectral performance stability and controllability on the cutting-edge

Miwa Igarashi, Hirotaka Miyamoto, Masahide Katou, Hiroaki Tsushima, Masato Moriya, Akihiko Kurosu, Hiroshi Tanaka, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 11327, 1132717 (2020) https://doi.org/10.1117/12.2551845

KEYWORDS: Diffraction gratings, Prisms, Diffraction, Actuators, Light sources, Control systems, Oscillators, Wavefronts, Beam expanders, Excimer lasers

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. To enhance the resolution and productivity for multiple-patterning application, key light source performances are spectral bandwidth stability and wavelength stability. The increased spectral bandwidth stability contributes to more precise critical dimension (CD) control and improves device yield. The increased wavelength stability can realize accurate focus and improve overlay accuracy. Our new spectral bandwidth control module improves E95 spectral bandwidth stability. The spectral bandwidth has deviations by thermal history with light source operations. It should be always controlled tightly even after a quiescent interval, such as wafer loading. In our laser system, a spectral bandwidth is controlled by adjusting the wavefront of a laser beam using a two-lens optical system within a resonator. A high speed actuator equipped the movable lens enables E95 spectral bandwidth stability to be less variation. New designs of drive mechanism suppress the lens vibration and spectral bandwidth error. This technology enables 3-sigma of E95 spectral bandwidth field average to be under 5 fm. This large shrinkage for E95 spectral bandwidth stability is the key to improve larger focus budgets for a leading edge processes. A new designed line narrowing module (LNM) improves wavelength stability. The wavelength is controlled by changing the rotation of a beam expander prism using actuator. Wavelength stability is improved further by the anti-vibration structure of the actuated prism in the LNM. The new design prism holding mechanisms reduce the mass of actuator load. This increases the stiffness of the system and suppresses the vibration of the prism rotation. New LNM reduce wavelength stability about 20%. The improvement in wavelength stability contributes to accurate focus and overlay. In addition, the lifetime of LNM is extending to reduce the Cost of Operation (CoO) and the light source downtime. A new ArF excimer laser, GT66A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 26 September 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Yuta Takashima, Yoshifumi Ueno, Takayuki Yabu, Tsukasa Hori, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11147, 111471M (2019) https://doi.org/10.1117/12.2536397

KEYWORDS: Extreme ultraviolet, Light sources

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Proceedings Article | 6 June 2019 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10957, 1095716 (2019) https://doi.org/10.1117/12.2514033

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Mirrors, Tin, Plasma, Light sources, Laser development, Ions, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 27 March 2019 Paper

Extremely long life excimer laser chamber technology for multi-patterning lithography

Hiroaki Tsushima, Yousuke Fujimaki, Yasuaki Kiyota, Makoto Tanaka, Takashi Itou, Takeshi Asayama, Akihiko Kurosu, Satoshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10961, 109610X (2019) https://doi.org/10.1117/12.2515667

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Light sources, Semiconductors, Optical lithography, Semiconductor manufacturing, Semiconductor lasers, Laser development

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Proceedings Article | 26 March 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10957, 109571S (2019) https://doi.org/10.1117/12.2514809

KEYWORDS: Tin, Gas lasers, Extreme ultraviolet, Magnetism, Carbon monoxide, Mirrors, Plasma, Light sources, Pulsed laser operation, Semiconductors

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Proceedings Article | 12 October 2018 Presentation

Long collector mirror lifetime demonstration around 100W average LP-EUV source for semiconductor high volume manufacturing (Conference Presentation)

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodema, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10809, 1080906 (2018) https://doi.org/10.1117/12.2502015

KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

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Proceedings Article | 3 October 2018 Paper

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356

KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

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Proceedings Article | 20 March 2018 Presentation + Paper

Next-generation ArF laser technologies for multiple-patterning immersion lithography supporting leading edge processes

Hirotaka Miyamoto, Hiroshi Furusato, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Hiroshi Tanaka, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10587, 1058710 (2018) https://doi.org/10.1117/12.2297316

KEYWORDS: Diffraction, Actuators, Semiconducting wafers, Diffraction gratings, Laser applications, Electrodes, Oscillators, Immersion lithography, Light sources, Laser stabilization

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter process control requirements. The most important features for the next generation light sources are improvement of chip yield, enhancement of productivity and reduction of operational costs for chipmakers [1][2]. One of key performance for light source is E95 bandwidth, which has become more important parameter for enhancing process margin and improving device productivity. A faster actuator to move a lens improves E95 bandwidth stability [3]. This technology enables 3σ of E95 bandwidth field average to be under 10 fm. This contributes to more precise CD control and improves device yield. Latest LNM enables E95 bandwidth to lower from the standard 300 fm to 200 fm [4]. The large shrinkage for E95 bandwidth is achieved by introducing the ingenious design in LNM. High purity E95 bandwidth improves imaging contrast and therefore increases exposure latitude. A new control algorithm enables E95 bandwidth to vary up to 450 fm, leveraging the movable lens. The combination of the new LNM, the movable lens and the new bandwidth control algorithm enables E95 bandwidth to control between 200 fm and 450 fm [5]. The tunable E95 bandwidth technology can improve process productivity for chip makers by compensating not only machine to machine difference of imaging contrast but also difference of imaging contrast between different generation scanners. The tunable E95 bandwidth technology has no influence on key laser performance indicator, dose stability, wavelength stability, E95 bandwidth stability, etc. On the other hand, to reduce downtime and operational costs for chipmakers, the lifetime of consumable modules such as a chamber and a line narrowing module (LNM) is needed to be extended. New electrodes with chamber enables chamber lifetime to extend from 60 billion pulses (Bpls) to 70 Bpls. Furthermore, new optical design in LNM enables the lifetime to extend from 60 Bpls to 110 Bpls. A new ArF excimer laser, GT65A, maximizes device yield, process productivity and minimizes the operational costs for chipmakers.

Proceedings Article | 19 March 2018 Paper

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10583, 1058328 (2018) https://doi.org/10.1117/12.2283066

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

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Proceedings Article | 19 March 2018 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamatsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10583, 1058318 (2018) https://doi.org/10.1117/12.2299300

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2017 Paper

Key components development progress updates of the 250W high power LPP-EUV light source

Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10450, 104501C (2017) https://doi.org/10.1117/12.2280503

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

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Proceedings Article | 16 October 2017 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10450, 104500Z (2017) https://doi.org/10.1117/12.2281129

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

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Proceedings Article | 24 March 2017 Paper

Key components technology update of the 250W high-power LPP-EUV light source

Yasufumi Kawasuji, Krzysztof Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

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Proceedings Article | 22 February 2017 Open Access

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

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Proceedings Article | 13 January 2017 Paper

LPP-EUV light source for HVM lithography

T. Saito, Y. Ueno, T. Yabu, A. Kurosawa, S. Nagai, T. Yanagida, T. Hori, Y. Kawasuji, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, H. Mizoguchi

Proceedings Volume 10254, 102541A (2017) https://doi.org/10.1117/12.2257464

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Magnetism, Laser applications, Mirrors, Plasma, Ions

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Proceedings Article | 13 January 2017 Paper

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Krzysztof Michał Nowak, Takashi Suganuma, Yoshiaki Kurosawa, Takeshi Ohta, Yasufumi Kawasuji, Hiroaki Nakarai, Takashi Saitou, Junichi Fujimoto, Hakaru Mizoguchi, Akira Sumitani, Akira Endo

Proceedings Volume 10254, 102540W (2017) https://doi.org/10.1117/12.2256003

KEYWORDS: Carbon dioxide lasers, Pulsed laser operation, Oscillators, Gas lasers, Carbon monoxide, Quantum cascade lasers, Extreme ultraviolet, Laser applications, Semiconductor lasers, Optical amplifiers

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Proceedings Article | 18 March 2016 Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

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Proceedings Article | 18 March 2016 Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tamotsu Abe, Takeshi Okamoto, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

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Proceedings Article | 13 March 2015 Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

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Proceedings Article | 13 March 2015 Paper

Performance of one hundred watt HVM LPP-EUV source

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 17 April 2014 Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

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Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

LPP-EUV light source development for high volume manufacturing lithography

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

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Proceedings Article | 15 March 2006 Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 28 May 2004 Paper

Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography

Takashi Saito, Hirotoshi Inoue, Hitoshi Nagano, Masaya Yoshino, Osamu Wakabayashi, Ryoichi Nohdomi, Toshihiro Nishisaka, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534475

KEYWORDS: Excimer lasers, Lithography, Reliability, Data modeling, Optical lithography, High power lasers

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Proceedings Article | 26 June 2003 Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 14 September 2001 Paper

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Takashi Matsunaga, Tatsuo Enami, Kouji Kakizaki, Takashi Saito, Satoshi Tanaka, Hiroaki Nakarai, Toyoharu Inoue, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435703

KEYWORDS: Excimer lasers, Electrodes, Laser scanners, Lithography, 3D scanning, Chromium, Laser development, Pulsed laser operation, Light sources, Molecules

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Proceedings Article | 14 September 2001 Paper

Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Takashi Saito, Takashi Matsunaga, Ken-ichi Mitsuhashi, Katsutomo Terashima, Takeshi Ohta, Akifumi Tada, Takanobu Ishihara, Masaya Yoshino, Hiroaki Tsushima, Tatsuo Enami, Hitoshi Tomaru, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435658

KEYWORDS: Surface plasmons, Photovoltaics, Excimer lasers, Lithography, Optical lithography, Pulsed laser operation, Laser development, Laser scanners, 3D scanning, Performance modeling

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Proceedings Article | 5 July 2000 Paper

High-repetition-rate ArF excimer laser for 193-nm lithography

Kouji Kakizaki, Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Akifumi Tada, Shinji Kasahara, Tatsushi Igarashi, Kazuaki Hotta

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388977

KEYWORDS: Excimer lasers, Pulsed laser operation, Laser development, Lithography, Laser energy, Optical lithography, Prototyping, Gas lasers, Laser stabilization, Light sources

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Proceedings Article | 26 July 1999 Paper

Line-narrowed ArF excimer laser for 193-nm lithography

Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Kyouhei Seki, Akifumi Tada, Tatsushi Igarashi, Kazuaki Hotta

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354312

KEYWORDS: Excimer lasers, Lithography, Pulsed laser operation, Laser development, Prototyping, Laser stabilization, Spectroscopy, Optical lithography, Reliability, Semiconductors

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