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Takeshi Yamamoto
Student at Univ of Tokyo
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Publications (1)
Proceedings Article | 18 March 2009 Paper
Analysis of a relation between the spatial frequency of electrostatic chuck and induced mask inplane distortion (IPD)
Takeshi Yamamoto, Kazuya Ota, Naosuke Nishimura, Shin'ichi Warisawa, Sunao Ishihara
Proceedings Volume 7271, 72713K (2009) https://doi.org/10.1117/12.814451
KEYWORDS: Spatial frequencies, Photomasks, Extreme ultraviolet lithography, Surface roughness, Distortion, Standards development, 3D modeling, Surface finishing, Lithography, Glasses
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