Ms. Tal Itzkovich Profile

Tal Itzkovich

Application Development Engineer at Applied Materials Israel Ltd

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 30 April 2023 Poster

SEM overlay target design using e-beam simulation

Kevin Houchens, Yaniv Abramovitz, Shay Attal, Ofer Adan, Nahum Bomshtein, Itai Buks, Ryan Hsieh, Tal Itzkovich, Jenny Perry

Proceedings Volume 12496, 1249623 (2023) https://doi.org/10.1117/12.2669984

KEYWORDS: Overlay metrology, Scanning electron microscopy, Design and modelling, Metrology, Semiconducting wafers, Visibility, Shrinkage, Optical metrology, Design rules, Calibration

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Proceedings Article | 7 May 2019 Presentation + Paper

SEM inspection and review method for addressing EUV stochastic defects

Tal Itzkovich, Aner Avakrat, Shimon Levi, Omri Baum, Noam Amit, Kevin Houchens

Proceedings Volume 10959, 109591S (2019) https://doi.org/10.1117/12.2514877

KEYWORDS: Stochastic processes, Metrology, Inspection, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet, Error analysis, Defect inspection, Defect detection, Lithography

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Proceedings Article | 22 March 2018 Presentation + Paper

Overlay and stitching metrology for massively parallel electron-beam lithography

Guido Rademaker, Jonathan Pradelles, Stéfan Landis, Stephane Rey, Anna Golotsvan, Anat Marchelli, Tal Itzkovich, Tetyana Shapoval, Ronny Haupt, Erwin Slot, Guido de Boer, Dhara Dave, Marco Wieland, Laurent Pain

Proceedings Volume 10585, 105850U (2018) https://doi.org/10.1117/12.2297535

KEYWORDS: Overlay metrology, Metrology, Electron beam lithography, Lenses, Distance measurement, Electron beams, Raster graphics, Semiconducting wafers, Time metrology, Process control

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Proceedings Article | 30 March 2017 Paper

Process resilient overlay target designs for advanced memory manufacture

Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu

Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376

KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

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Proceedings Article | 28 March 2017 Presentation + Paper

Image based overlay measurement improvements of 28nm FD-SOI CMOS front-end critical steps

F. Dettoni, T. Shapoval, R. Bouyssou, T. Itzkovich, R. Haupt, C. Dezauzier

Proceedings Volume 10145, 101450C (2017) https://doi.org/10.1117/12.2257883

KEYWORDS: Semiconductor manufacturing, Manufacturing, Overlay metrology, Metrology, Semiconductors, Process control, CMOS technology, Lithography, Yield improvement, Chemical mechanical planarization, Semiconducting wafers, Etching, Optical filters, Optical properties, Opacity, Critical dimension metrology

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Proceedings Article | 24 March 2016 Paper

Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL)

Karsten Gutjahr, Dongsuk Park, Yue Zhou, Winston Cho, Ki Cheol Ahn, Patrick Snow, Richard McGowan, Tal Marciano, Vidya Ramanathan, Pedro Herrera, Tal Itzkovich, Janay Camp, Michael Adel

Proceedings Volume 9778, 97781M (2016) https://doi.org/10.1117/12.2219668

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Diffractive optical elements, Metrology, Photovoltaics, Etching, Detection and tracking algorithms, Signal processing, Optical properties

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Proceedings Article | 24 March 2016 Paper

Lithography aware overlay metrology target design method

Myungjun Lee, Mark Smith, Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Kangsan Lee, Dohwa Lee, Dongsub Choi, Zephyr Liu, Tal Itzkovich, Vladimir Levinski, Ady Levy

Proceedings Volume 9778, 97781L (2016) https://doi.org/10.1117/12.2218653

KEYWORDS: Overlay metrology, Metrology, Lithography, Scanners, Lithographic illumination, Personal protective equipment, Optical lithography, Resolution enhancement technologies, Optical proximity correction, Photomasks, SRAF

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Proceedings Article | 8 March 2016 Paper

Metrology target design (MTD) solution for diagonally orientated DRAM layer

Myungjun Lee, Mark Smith, Michael Adel, Chia-Hung Chen, Chin-Chang Huang, Hao-Lun Huang, Hsueh-Jen Tsai, I-Lin Wang, Jen-Chou Huang, Jo-Lan Chin, Kuo-Yao Chou, Yuan-Ku Lan, Hsien-Yen Lung, Jui-Chin Yang, Tal Itzkovich, Healthy Huang, Yaniv Abramovitz, Jinyan Song, Chen Dror, Harvey Cheng, Ady Levy

Proceedings Volume 9778, 97782R (2016) https://doi.org/10.1117/12.2218659

KEYWORDS: Personal protective equipment, Metrology, Lithography, Overlay metrology, Photomasks, Scanners, Lithographic illumination, SRAF, Neodymium, Optical proximity correction

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Proceedings Article | 19 March 2015 Paper

Influence of the process-induced asymmetry on the accuracy of overlay measurements

Tetyana Shapoval, Bernd Schulz, Tal Itzkovich, Sean Durran, Ronny Haupt, Agostino Cangiano, Barak Bringoltz, Matthias Ruhm, Eric Cotte, Rolf Seltmann, Tino Hertzsch, Eitan Hajaj, Carsten Hartig, Boris Efraty, Daniel Fischer

Proceedings Volume 9424, 94240B (2015) https://doi.org/10.1117/12.2085788

KEYWORDS: Optical filters, Overlay metrology, Semiconducting wafers, Data modeling, Metrology, Optical properties, Optical simulations, Signal processing, Etching, Image segmentation

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Proceedings Article | 19 March 2015 Paper

Overlay accuracy investigation for advanced memory device

Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Roie Volkovich, Tal Itzkovich, Eitan Herzel, Mark Wagner, Mohamed Elkodadi

Proceedings Volume 9424, 94240C (2015) https://doi.org/10.1117/12.2085270

KEYWORDS: Overlay metrology, Metrology, Quality measurement, Signal processing, Image quality, Lithography, Target detection, Semiconducting wafers, Sensors, Etching

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Proceedings Article | 19 March 2015 Paper

Overlay measurement accuracy enhancement by design and algorithm

Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Tal Itzkovich, Nuriel Amir, Roie Volkovich, Eitan Herzel, Mark Wagner, Mohamed El Kodadi

Proceedings Volume 9424, 94242B (2015) https://doi.org/10.1117/12.2085272

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Signal processing, Process control, Quality measurement, Lithography, Double patterning technology, Photomasks, Uncertainty analysis

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Proceedings Article | 19 March 2015 Paper

Overlay target selection for 20-nm process on A500 LCM

Vidya Ramanathan, Lokesh Subramany, Tal Itzkovich, Karsten Gutjhar, Patrick Snow, Chanseob Cho, Lipkong Yap

Proceedings Volume 9424, 942424 (2015) https://doi.org/10.1117/12.2086016

KEYWORDS: Overlay metrology, Semiconducting wafers, Back end of line, Etching, Scatterometry, Metrology, Diffractive optical elements, Front end of line, Optical properties, Inspection

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SPIE Journal Paper | 2 December 2014 Open Access

Techniques for improving overlay accuracy by using device correlated metrology targets as reference

Wei Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir

JM3, Vol. 13, Issue 04, 041412, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041412

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization

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SPIE Journal Paper | 6 October 2014 Open Access

DongSub Choi, Tal Itzkovich, Inna Tarshish-Shapir, Eros Huang, Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, David Tien, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su

JM3, Vol. 13, Issue 04, 041404, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041404

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

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Proceedings Article | 21 April 2014 Paper

Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)

Simon C. Hsu, Charlie Chen, Chun Chi Yu, Yuan Chi Pai, Eran Amit, Lipkong Yap, Tal Itzkovich, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir

Proceedings Volume 9050, 90501N (2014) https://doi.org/10.1117/12.2046670

KEYWORDS: Overlay metrology, Calibration, Metrology, Optical filters, Lithography, Semiconducting wafers, Quality measurement, Analytical research, Microelectronics, Inspection

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Proceedings Article | 21 April 2014 Paper

Innovative techniques for improving overlay accuracy by using DCM (device correlated metrology) targets as reference

Wei-Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir

Proceedings Volume 9050, 90501R (2014) https://doi.org/10.1117/12.2046671

KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Chemical mechanical planarization, Detection and tracking algorithms, Polishing, Computer simulations

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Proceedings Article | 18 April 2013 Paper

DCM: device correlated metrology for overlay measurements

Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, Dongsub Choi, Tal Itzkovich, Inna Tarshish-Shapir, David Tien, Eros Huang, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su

Proceedings Volume 8681, 86812R (2013) https://doi.org/10.1117/12.2011363

KEYWORDS: Overlay metrology, Metrology, Calibration, Optical testing, Etching, Measurement devices, Scanning electron microscopy, Inspection, Lithography, Scanners

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Showing 5 of 17 publications

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