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Tao Wang
at Univ of Wisconsin Madison
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Publications (1)
Proceedings Article | 16 March 2009 Paper
Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography
Tao Wang, Marzia Quaglio, Fabrizio Pirri, Yang-Chun Cheng, David Busacker, Franco Cerrina
Proceedings Volume 7274, 72742O (2009) https://doi.org/10.1117/12.814831
KEYWORDS: Glasses, Photomasks, Microfluidics, Maskless lithography, Ultraviolet radiation, Digital micromirror devices, Optical lithography, Semiconducting wafers, Lithography, Linear filtering
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