Prof. Tariel M. Makhviladze Profile

Prof. Tariel M. Makhviladze

Director at Institute of Physics and Technology of the RAS

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Author

Publications (8)

Proceedings Article | 26 February 2010 Paper

Electromigration theory and its applications to integrated circuit metallization

Tariel Makhviladze, Mikhail Sarychev

Proceedings Volume 7521, 752117 (2010) https://doi.org/10.1117/12.853391

KEYWORDS: Failure analysis, 3D modeling, Reliability, Ions, Diffusion, Data modeling, Interfaces, Systems modeling, Algorithm development, Spherical lenses

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Proceedings Article | 26 February 2010 Paper

Projection photolithography modeling using the finite-difference time-domain approach

Tariel Makhviladze, Mikhail Sarychev

Proceedings Volume 7521, 752103 (2010) https://doi.org/10.1117/12.853420

KEYWORDS: Optical lithography, Binary data, 3D modeling, Electromagnetism, Algorithm development, Finite-difference time-domain method, Maxwell's equations, Photomasks, Lithography, Diffraction

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Proceedings Article | 29 April 2008 Paper

A new model for the copper CMP kinetics

R. Goldstein, T. Makhviladze, M. Sarychev

Proceedings Volume 7025, 70251Q (2008) https://doi.org/10.1117/12.802538

KEYWORDS: Copper, Chemical mechanical planarization, Iron, Polishing, Ions, Electrons, Diffusion, Surface finishing, Chemical reactions, Chemical analysis

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Proceedings Article | 29 April 2008 Paper

Influence of vacancy clusters on the adhesion properties of interfaces

R. Goldstein, T. Makhviladze, M. Sarychev

Proceedings Volume 7025, 70251R (2008) https://doi.org/10.1117/12.802539

KEYWORDS: Interfaces, Thermodynamics, Tantalum, Copper, Chemical species, Solids, Spherical lenses, Nickel, Crystals, Chemical analysis

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Proceedings Article | 5 June 1998 Paper

Extension of the traditional optical model for investigation into EUV projection lithography capabilities

Vladimir Ivin, Kevin Lucas, Tariel Makhviladze, Vadim Manuylov, Marina Medvedeva

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309628

KEYWORDS: Extreme ultraviolet, Objectives, Photomasks, EUV optics, Projection systems, Mirrors, Projection lithography, Reflectivity, Optical lithography, Printing

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Proceedings Article | 7 July 1997 Paper

Fast modeling of 3D planar resist images for high-NA projection lithography

Vladimir Ivin, Dmitry Larin, Kevin Lucas, Tariel Makhviladze, Andrew Rogov, Sergey Verzunov

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276036

KEYWORDS: 3D modeling, Projection lithography, Photomasks, 3D image processing, Performance modeling, Algorithm development, Fourier transforms, Computer simulations

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Proceedings Article | 7 June 1996 Paper

Method of easily extracting resist development parameters for lithography simulation

Kevin Lucas, Vladimir Ivin, Vladislav Kudrya, Dmitry Larin, Tariel Makhviladze, Marina Medvedeva, A. Rogor, Sergey Verzunov, D. Yang

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240987

KEYWORDS: Lithography, Diffusion, Photoresist developing, Photoresist materials, Radon, Software development, Algorithm development, Picture Archiving and Communication System, Scanning electron microscopy, 3D modeling

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Proceedings Article | 1 June 1992 Paper

Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)

Dmitrii Ilkayev, Tariel Makhviladze, Kamil Valiev

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130373

KEYWORDS: Photomasks, Optical lithography, Lithography, Mathematical modeling, Photoresist processing, Software development, Algorithm development, Process modeling, Diffraction, X-ray lithography

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Showing 5 of 8 publications

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