Dr. Tatiana Kovalevich Profile

Dr. Tatiana Kovalevich

Researcher at imec

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 13 November 2024 Presentation

Presentation

High-NA stitching: how to evaluate performance?

Natalia Davydova, Airat Galiullin, Cyrus Tabery, Bram Slachter, Adam Lyons, Jeremy Chen, Nick Pellens, Vincent Wiaux, Tatiana Kovalevich, Lieve van Look, Ataklti Weldeslassie, Joost Bekaert

Proceedings Volume PC13215, PC132150A (2024) https://doi.org/10.1117/12.3038962

KEYWORDS: Scanners, Semiconducting wafers, Scanning electron microscopy, Photomasks, Overlay metrology, Optical proximity correction, Metrology, Image processing, Extreme ultraviolet lithography, EUV optics

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SPIE Journal Paper | 16 October 2024

Study of mask error enhancement factor improvement with low-n absorber extreme ultraviolet lithography mask

Yosuke Takahata, Tatiana Kovalevich, Danilo De Simone, Yusuke Tanaka, Vicky Philipsen

JM3, Vol. 23, Issue 04, 044401, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044401

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical properties, Nanoimprint lithography, Light sources and illumination, 3D mask effects, Critical dimension metrology, Semiconducting wafers, Simulations, Refractive index

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Proceedings Article | 26 August 2024 Paper

Paper

High NA EUV stitching: mask performance is a key

Natalia Davydova, Vincent Wiaux, Nick Pellens, Tatiana Kovalevich, Laura Huddleston, Frank Timmermans, Cyrus Tabery, Joost Bekaert, Lieve van Look, Alberto Colina, Bram Slachter, Nitesh Pandey, Stefan Hunsche, Ataklti Weldeslassie, Guillaume Libeert

Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393

KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

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Proceedings Article | 26 August 2024 Paper

Paper

Imaging evaluation of low reflectivity low-n EUV mask for LS at 0.33NA

Tatiana Kovalevich, Nick Pellens, Guillaume Libeert, Lieve Van Look, Vicky Philipsen

Proceedings Volume 13177, 131770O (2024) https://doi.org/10.1117/12.3032310

KEYWORDS: Lithography, Extreme ultraviolet, 3D mask effects, Simulations, Semiconducting wafers

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Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

An experimental stitching study on the eve of high-NA EUV

Vincent Wiaux, Natalia Davydova, Lieve Van Look, Nick Pellens, Ataklti Weldeslassie, Guillaume Libeert, Tatiana Kovalevich, Frank Timmermans, Laura Huddleston

Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895

KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

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Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

High-NA benefit assessment through Zeiss AIMS EUV for tip-to-tip patterning by EUVL

Rik Jonckheere, Tatiana Kovalevich, Vincent Wiaux, Vicky Philipsen, Eric Hendrickx, Andreas Verch, Maximillian Albert, Renzo Capelli

Proceedings Volume 12953, 1295304 (2024) https://doi.org/10.1117/12.3011615

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Optical lithography, Scanners, Semiconducting wafers, Design, Logic

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Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Study of MEEF improvement with low-n absorber EUVL mask

Yosuke Takahata, Tatiana Kovalevich, Danilo De Simone, Yusuke Tanaka, Vicky Philipsen

Proceedings Volume 12953, 1295308 (2024) https://doi.org/10.1117/12.3009968

KEYWORDS: Extreme ultraviolet lithography, Optical properties, Extreme ultraviolet, Light sources and illumination, Refractive index, Semiconducting wafers, Simulations, Critical dimension metrology, 3D mask effects

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Imaging validation for LS of dark field low-n vs. Ta-based absorber masks

Tatiana Kovalevich, Lieve Van Look, Alain Moussa, Joern-Holger Franke, Vicky Philipsen

Proceedings Volume 12750, 1275005 (2023) https://doi.org/10.1117/12.2687549

KEYWORDS: Printing, 3D mask effects, Extreme ultraviolet, Simulations, Reticles, Photomask technology, Optical lithography, Metals, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 26 September 2023 Presentation

Presentation

Spatial frequency breakdown of CD variation

Tatiana Kovalevich

Proceedings Volume PC12915, PC129150D (2023) https://doi.org/10.1117/12.3012441

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Overview of stitching for high NA: imaging and overlay experimental and simulation results

Natalia Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511

KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Mask roughness contribution to wafer edge placement error

Andreas Frommhold, Joern-Holger Franke, Tatiana Kovalevich, Eelco Van Setten, Vidya Vaenkatesan

Proceedings Volume 12494, 1249408 (2023) https://doi.org/10.1117/12.2658332

KEYWORDS: Speckle, Simulations, Extreme ultraviolet, Metrology, Critical dimension metrology, Edge roughness

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SPIE Journal Paper | 17 April 2023

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Tatiana Kovalevich, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen

JM3, Vol. 22, Issue 02, 024401, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024401

KEYWORDS: Printing, SRAF, Simulations, Nanoimprint lithography, Semiconducting wafers, Extreme ultraviolet, Critical dimension metrology, Metals, Extreme ultraviolet lithography, Electroluminescence

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Proceedings Article | 11 November 2022 Presentation

Presentation

Evaluation of LS printing and general understanding of imaging with DF low-n mask

Tatiana Kovalevich, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen

Proceedings Volume PC12292, PC122920M (2022) https://doi.org/10.1117/12.2644701

KEYWORDS: Photomasks, SRAF, Printing, Metals, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 1 November 2022 Paper

Paper

Spatial frequency breakdown of CD variation

Tatiana Kovalevich, Barbara Witek, Daniel Riggs, Joost Bekaert, Lieve Van Look, Mark John Maslow

Proceedings Volume 12472, 124720H (2022) https://doi.org/10.1117/12.2640808

KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Photomasks, Spatial frequencies, Stochastic processes, Scanning electron microscopy, Scanners, Fourier transforms, Finite element methods

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Proceedings Article | 31 October 2022 Poster

Poster

Stitching for High NA: new insights and path forward

Natalia Davydova, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume PC12292, PC1229210 (2022) https://doi.org/10.1117/12.2653388

KEYWORDS: Tantalum, Image resolution, Source mask optimization, Scanners, Reflectivity, Optical proximity correction, Manufacturing, Extreme ultraviolet lithography, Control systems

Proceedings Article | 13 June 2022 Presentation

Presentation

Resist and reticle activities towards High-NA EUV ecosystem readiness

Jara Santaclara, Weimin Gao, Eric Hendrickx, Vincent Wiaux, Joern-Holger Franke, Emily Gallagher, Kannan Keizer, Tatiana Kovalevich, Jo Finders

Proceedings Volume PC12051, PC1205105 (2022) https://doi.org/10.1117/12.2614162

KEYWORDS: Photomasks, Ecosystems, Optical lithography, Extreme ultraviolet, Reticles, Scanners, Metrology, Extreme ultraviolet lithography, Etching, Thin films

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Proceedings Article | 26 May 2022 Paper

Paper

Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid

Pieter Wöltgens, Alberto Colina, David Rio, Maxence Delorme, Tatiana Kovalevich, Arame Thiam, Frieda van Roey, Odysseas Zografos

Proceedings Volume 12051, 120510I (2022) https://doi.org/10.1117/12.2614260

KEYWORDS: SRAF, Logic, Semiconducting wafers, Lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Printing, Extreme ultraviolet lithography, Statistical analysis

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align

Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Remko Aubert, Vineet Vijayakrishnan Nair, Tatiana Kovalevich, David Rio, Joost Bekaert, Erik Wang, Gijsbert Rispens, Mark Maslow, Eric Hendrickx

Proceedings Volume 11609, 116090R (2021) https://doi.org/10.1117/12.2584733

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Proceedings Article | 30 October 2020 Presentation + Paper

Presentation + Paper

Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

Vincent Wiaux, Joost Bekaert, Tatiana Kovalevich, Julien Ryckaert, Eric Hendrickx, Natalia Davydova, Pieter Woltgens, Ming-Chun Tien, Laurens de Winter, Mark Maslow, Kars Troost

Proceedings Volume 11517, 1151713 (2020) https://doi.org/10.1117/12.2573155

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Imaging systems, Extreme ultraviolet, Optical proximity correction, Image resolution

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Proceedings Article | 14 March 2018 Presentation

Presentation

Photonic crystals for Bloch surface wave propagation based on lithium niobate thin films (Conference Presentation)

Tatiana Kovalevich, Djaffar Belharet, Laurent Robert, Thierry Grosjean, Myun-Sik Kim, Hans Peter Herzig, Maria-Pilar Bernal

Proceedings Volume 10544, 1054418 (2018) https://doi.org/10.1117/12.2309704

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Proceedings Article | 8 November 2016 Presentation

Presentation

Polarization controlled directional excitation of Bloch surface waves (Conference Presentation)

Tatiana Kovalevich, Philippe Boyer, Maria-Pilar Bernal, Myun-Sik Kim, Hans Peter Herzig, Thierry Grosjean

Proceedings Volume 9919, 991907 (2016) https://doi.org/10.1117/12.2248261

KEYWORDS: Dielectric polarization, Dielectrics, Photonic crystals, Electromagnetism, Interfaces, Surface plasmon polaritons, Silica, Integrated optics, Finite-difference time-domain method, Radio propagation

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Showing 5 of 21 publications

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