Dr. Tatsuhiko Higashiki
Senior Expert
SPIE Involvement:
Conference Program Committee | Author
Publications (22)

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10584, 105840T (2018) https://doi.org/10.1117/12.2297274
KEYWORDS: Nanoimprint lithography, Lithography, Particle filters, Optical lithography, Etching, Semiconductor materials, Semiconductors, Photomasks, High volume manufacturing, Extreme ultraviolet lithography

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90501A (2014) https://doi.org/10.1117/12.2046326
KEYWORDS: Optical inspection, Inspection, Defect detection, Nanotechnology, Lithography, Semiconductors, Ultraviolet radiation, Semiconducting wafers, Organic materials, Optical resolution

SPIE Journal Paper | 1 October 2011
JM3, Vol. 10, Issue 04, 043008, (October 2011) https://doi.org/10.1117/12.10.1117/1.3658024
KEYWORDS: Nanoimprint lithography, Photomasks, Semiconductors, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Electron beams

Proceedings Article | 17 March 2011 Open Access Paper
Proceedings Volume 7970, 797003 (2011) https://doi.org/10.1117/12.882940
KEYWORDS: Nanoimprint lithography, Lithography, Semiconducting wafers, Optical lithography, Semiconductors, Extreme ultraviolet lithography, Photomasks, Ultraviolet radiation, Defect inspection, Critical dimension metrology

SPIE Journal Paper | 1 April 2010
JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948
KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72720J (2009) https://doi.org/10.1117/12.813490
KEYWORDS: Semiconducting wafers, Overlay metrology, Data corrections, Immersion lithography, Process control, Control systems, Source mask optimization, Distortion, Osmium, Radon

Proceedings Article | 18 March 2009 Paper
Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, Hiroshi Tokue, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Koji Hashimoto, Tetsuro Nakasugi, Tatsuhiko Higashiki
Proceedings Volume 7271, 72712A (2009) https://doi.org/10.1117/12.813654
KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photoresist processing, Capillaries, Lithography, Diffusion, Nitrogen, Semiconductors, Line edge roughness, Ranging

Proceedings Article | 1 December 2008 Paper
Proceedings Volume 7140, 71400A (2008) https://doi.org/10.1117/12.810264
KEYWORDS: Lithography, Nanoimprint lithography, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Double patterning technology, Photomasks, Manufacturing, Signal processing, Optical lithography

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602
KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

Proceedings Article | 14 March 2008 Paper
Proceedings Volume 6921, 692104 (2008) https://doi.org/10.1117/12.771149
KEYWORDS: Nanoimprint lithography, Optical alignment, Multilayers, Line edge roughness, Lithography, CMOS devices, Metals, Inspection, Overlay metrology, Semiconducting wafers

Proceedings Article | 26 March 2007 Paper
Paul Hinnen, Jerome Depre, Shinichi Tanaka, Ser-Yong Lim, Omar Brioso, Mir Shahrjerdy, Kazutaka Ishigo, Takuya Kono, Tatsuhiko Higashiki
Proceedings Volume 6520, 652023 (2007) https://doi.org/10.1117/12.712084
KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Overlay metrology, Manufacturing, Signal processing, Calibration, Lithography, Infrared sensors, Algorithm development

Proceedings Article | 20 October 2006 Paper
Kaustuve Bhattacharyya, Viral Hazari, Doug Sutherland, Tatsuhiko Higashiki
Proceedings Volume 6349, 63493N (2006) https://doi.org/10.1117/12.692948
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Wafer testing, Reticles, Scanners, Wafer inspection, Image processing, Silicon, Thin film coatings

Proceedings Article | 20 March 2006 Paper
Proceedings Volume 6154, 61540Q (2006) https://doi.org/10.1117/12.656306
KEYWORDS: Semiconducting wafers, Resonance energy transfer, Temperature metrology, Optical alignment, Overlay metrology, Immersion lithography, Photoresist developing, Photoresist materials, Scanners, Humidity

Proceedings Article | 10 May 2005 Paper
Paul Hinnen, Hyun-Woo Lee, Stefan Keij, Hiroaki Takikawa, Keita Asanuma, Kazutaka Ishigo, Tatsuhiko Higashiki
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599494
KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Overlay metrology, Signal processing, Metrology, Optical design, Neodymium, Diffraction, Diffraction gratings

SPIE Journal Paper | 1 April 2005
Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka
JM3, Vol. 4, Issue 02, 023002, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898603
KEYWORDS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection

Proceedings Article | 28 May 2004 Paper
Ryo Tanaka, Mitsuru Kobayashi, Masahiko Yasuda, Nobutaka Magome, Kazuhiko Ishigo, Hiroshi Ikegami, Tatsuhiko Higashiki
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544231
KEYWORDS: Optical alignment, Semiconducting wafers, Laser ablation, Reticles, Opacity, Signal detection, Absorption, Silicon, Q switching, YAG lasers

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536244
KEYWORDS: Diffraction, SRAF, Lens design, Critical dimension metrology, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Light sources, Scanning electron microscopy, Image acquisition

Proceedings Article | 28 May 2004 Paper
Hiroshi Ikegami, Kenji Kawano, Kazuhiko Ishigo, Tatsuhiko Higashiki, Nobuo Hayasaka, Naoto Yoshitaka, Hideaki Kashiwagi , Masayoshi Kobayashi, Yoichi Ogawa, Shinichi Ito
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534907
KEYWORDS: Aluminum, Laser irradiation, Laser ablation, Optical alignment, Semiconducting wafers, Thin films, Plasma, Metals, Tin, Laser applications

Proceedings Article | 24 May 2004 Paper
Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.532808
KEYWORDS: Signal processing, Optical alignment, TCAD, Semiconducting wafers, Photomasks, Computer aided design, Metals, Optical simulations, Inspection, Chemical mechanical planarization

Proceedings Article | 29 April 2004 Paper
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.535097
KEYWORDS: Distortion, Scanners, Overlay metrology, Data modeling, Control systems, Error analysis, Databases, Semiconducting wafers, Systems modeling, Semiconductors

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485453
KEYWORDS: Transmittance, Imaging devices, Critical dimension metrology, Photomasks, Zernike polynomials, Lenses, Wavefront aberrations, Lithography, Diffraction, Optical proximity correction

Showing 5 of 22 publications
Conference Committee Involvement (22)
Novel Patterning Technologies 2025
24 February 2025 | San Jose, California, United States
Novel Patterning Technologies 2024
26 February 2024 | San Jose, California, United States
Novel Patterning Technologies 2023
27 February 2023 | San Jose, California, United States
Novel Patterning Technologies 2022
25 April 2022 | San Jose, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Alternative Lithographic Technologies VI
24 February 2014 | San Jose, California, United States
Alternative Lithographic Technologies V
25 February 2013 | San Jose, California, United States
Alternative Lithographic Technologies IV
13 February 2012 | San Jose, California, United States
Alternative Lithographic Technologies III
1 March 2011 | San Jose, California, United States
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies II
23 February 2010 | San Jose, California, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
Optical Microlithography XIX
21 February 2006 | San Jose, California, United States
Showing 5 of 22 Conference Committees
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