Dr. Teng-Yen Huang Profile

Dr. Teng-Yen Huang

at Nanya Technology Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 12 November 2024 Presentation + Paper

Assessing need and methodology for mask constraints in ILT applications

Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao

Proceedings Volume 13216, 132161Q (2024) https://doi.org/10.1117/12.3042434

KEYWORDS: Semiconducting wafers, Printing, Vestigial sideband modulation, Photoresist processing, Simulations, Design rules, Chip manufacturing, SRAF, Optical proximity correction, Lithography

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Proceedings Article | 10 April 2024 Presentation + Paper

Synthesizing ILT MB-SRAF using machine learning

Ferhat Turker Celepcikay, Chun-Cheng Liao, Teng-Yen Huang, Szu-Ping Chen, Chi Neng Lin, Alan Zhu, Hung Yu Lin

Proceedings Volume 12954, 129540H (2024) https://doi.org/10.1117/12.3010902

KEYWORDS: SRAF, Machine learning, Resolution enhancement technologies, Lithography, Image quality, Optical proximity correction

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Proceedings Article | 20 October 2020 Presentation + Paper

Patterning solutions for NTD contact hole levels in advanced DRAM nodes

Michael Green, Tsu-Wen Huang, Mohamed Ramadan, Hung-Chang Szu, Yeu Dong Gau, Chih-Ying Tsai, Young Ham, Chun-Cheng Liao, Lucien Bouchard, Eric Huang, Wei-Cheng Shiu, Chris Progler

Proceedings Volume 11518, 115180N (2020) https://doi.org/10.1117/12.2574713

KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Lithography, Optical proximity correction, Immersion lithography, 193nm lithography, Critical dimension metrology

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Proceedings Article | 23 March 2020 Paper

EUV OPC methodology for beyond 20nm memory cell by simulation data

Jiunhau Fu, Chiang Lin Shih, Chun Cheng Liao, Eric Huang, Elsley Tan, John Tsai, Ming Yun Chen, Yuan Pin Liao, Seung Hee Baek

Proceedings Volume 11323, 113232H (2020) https://doi.org/10.1117/12.2551669

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Molybdenum, Photomasks, Data modeling, Critical dimension metrology, Source mask optimization, Semiconducting wafers, EUV optics, Array processing

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Proceedings Article | 23 March 2020 Presentation + Paper

Integrating enhanced hotspot library into manufacturing OPC correction flow

Bradley Falch, Linghui Wu, John Tsai, Elsley Tan, Jiunhau Fu, Tengyen Huang, Chuncheng Liao

Proceedings Volume 11328, 113280E (2020) https://doi.org/10.1117/12.2552110

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Associative arrays, Manufacturing, Metals, Semiconductors

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Proceedings Article | 24 March 2008 Paper

A novel methodology for model-based OPC verification

Tengyen Huang, ChunCheng Liao, Ryan Chou, Hung-Yueh Liao, Jochen Schacht

Proceedings Volume 6922, 69222F (2008) https://doi.org/10.1117/12.772522

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Process modeling, Data modeling, Semiconducting wafers, Lithography, Optical lithography, Calibration, Finite element methods, Model-based design

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Proceedings Article | 28 June 2005 Paper

Simulation based OPC for contact pattern using 193 nm lithography

Martin Keck, Christof Bodendorf, Jorg Thiele, Alberto Gomez, Ying-Chung Tseng, Teng-Yen Huang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617215

KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Semiconducting wafers, Lithography, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Phase shifts

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Showing 5 of 7 publications

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