Dr. Thomas J. Dunn Profile

Dr. Thomas J. Dunn

Project Manager at Corning Tropel Corp

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Author

Publications (7)

Proceedings Article | 17 November 2016 Paper

Evaluation of photomask flatness compensation for extreme ultraviolet lithography

Katherine Ballman, Christopher Lee, John Zimmerman, Thomas Dunn, Alexander Bean

Proceedings Volume 9985, 99850N (2016) https://doi.org/10.1117/12.2240956

KEYWORDS: Reticles, Extreme ultraviolet, Photomasks, Overlay metrology, Error analysis, Semiconductors, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Metrology

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Proceedings Article | 10 May 2016 Paper

Error analysis of overlay compensation methodologies and proposed functional tolerances for EUV photomask flatness

Katherine Ballman, Christopher Lee, Thomas Dunn, Alexander Bean

Proceedings Volume 9984, 99840S (2016) https://doi.org/10.1117/12.2242282

KEYWORDS: Tolerancing, Extreme ultraviolet, Error analysis, Photomasks, Reticles, Semiconducting wafers, Scanners, Lithography, Data corrections, Overlay metrology

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Proceedings Article | 3 August 2010 Paper

Frequency stepping interferometry for accurate metrology of rough components and assemblies

Thomas Dunn, Christopher Lee, Mark Tronolone

Proceedings Volume 7790, 77900I (2010) https://doi.org/10.1117/12.862702

KEYWORDS: Interferometry, Modulation, Interferometers, Tunable lasers, Semiconductor lasers, Assembly equipment, Assembly tolerances, Surface finishing, Metrology, Modes of laser operation

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Proceedings Article | 30 April 1999 Paper

Large-area high-throughput high-resolution lithography systems for optoelectronics and microelectronics

Kanti Jain, Thomas Dunn, Nestor Farmiga, Mark Zemel

Proceedings Volume 3631, (1999) https://doi.org/10.1117/12.348304

KEYWORDS: Lithography, Imaging systems, Optical lithography, Photomasks, Dielectrics, Optoelectronics, Excimer lasers, Microelectronics, Printing, Microelectromechanical systems

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Proceedings Article | 5 June 1998 Paper

Large-area high-throughput high-resolution lithography systems for flat-panel displays and microelectronic modules

Kanti Jain, Thomas Dunn, Nestor Farmiga, Mark Zemel, Carl Weisbecker

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309573

KEYWORDS: Lithography, Photomasks, Imaging systems, Optical lithography, Dielectrics, Excimer lasers, Printing, Image segmentation, Light sources, Microelectronics

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Proceedings Article | 5 June 1998 Paper

Lithography on flexible substrates: a roll-to-roll high-throughput high-resolution system for low-cost production of microelectronics

Kanti Jain, Thomas Dunn, Nestor Farmiga, Mark Zemel, Carl Weisbecker, Teik-Meng Lee

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309574

KEYWORDS: Lithography, Imaging systems, Photomasks, Optical lithography, Microelectronics, Dielectrics, Lens design, Telecommunications, Lithographic illumination, Photoresist materials

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Proceedings Article | 19 June 1997 Paper

Low-cost patterning and etching systems for production of microelectronic modules

Kanti Jain, Thomas Dunn

Proceedings Volume 3046, (1997) https://doi.org/10.1117/12.276627

KEYWORDS: Optical lithography, Imaging systems, Printing, Projection systems, Optical scanning systems, Photoresist materials, Photomasks, Image segmentation, Excimer lasers, Microelectronics

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Showing 5 of 7 publications

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