Due to higher integration of optical functionality into compact products like augmented reality into Head-Up-Displays (HUD), there is an increasing demand for very thin and large micro-optical films. Classical production techniques like injection molding are not able to deliver the requested quality or part dimensions. Nano-Imprint-Lithography (NIL) can close this gap and provide very thin and at the same time very large micro-optical products. We will show the general approach and examples for different markets with all necessary steps (origination, tooling and NIL-replication) on substrates from 6” x 6” up to max. size of Gen5-Display-Size (1100 x 1300 mm²).
There is a substantial demand for micro- and nanostructured surfaces in a large variety of industrial applications. Structured films in displays or light guiding plates for new types of luminaires are only a small but significant selection of potential fields of applications. To finally succeed in integrating a structured surface into a device, ideally the complete process chain is under control, starting with optical design, followed by origination and tooling and finally ending in mass replication technologies. In this work, the origination of micro- and nanostructures with interference lithography on very large formats is described. Also tooling and mass replication processes will be discussed within this paper in order to point out the closed process chain. However, all flat surface processes consequently result in structured films with at least one seamline. In terms of economic efficiency, many industrial sectors using micro- and nano-patterns wish to get rid of any kinds of seams in order to reduce the offcut in film production. We have developed an approach to transfer flat surface processes onto curved, convex surfaces without any seamlines, and to copy those structures into durable nickel sleeves for film production. Both technologies, seamless origination of patterns directly on cylindrical drums as well as cylindrical tooling capabilities are essential to fabricate films without any seamline. All new approaches will be presented within this paper.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.