Mr. Ting-Yu Lee Profile

Ting-Yu Lee

at Industrial Technology Research Institute

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 12 June 2003 Paper

Polymers with well-controlled molecular weight for DUV/VUV lithography

Ting-Yu Lee, Chao-Ying Yu, Meei-Yu Hsu, Jui-Fa Chang, Bing-Ming Cheng, Hsiao-Chi Lu, Hong-Kai Chen, Hok-Sum Fung

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485098

KEYWORDS: Polymers, Polymerization, Photoresist materials, Lithography, Absorbance, Synchrotron radiation, Vacuum ultraviolet, Absorption, Spectrometers, Transparency

Read Abstract +

Polymer resin is a major component of a photoresist formulation. Therefore, the performance of a photoresist strongly depends on the composition and properties of the resin in the formulation. We have developed a polymerization method, which is able to control the molecular weights along with the compositions of copolymers over a wide range of monomer for the end use in 193 nm or 157 nm photoresist applications. The method is called controlled radical polymerization (CRP). In use of this method, we successfully prepared an acrylate-type copolymer with low molecular weight distribution (PDI~1.2). Furthermore, the desired molecular weight of the polymers can be obtained easily altered by mild reaction condition change. Large-scale production has been demonstrated feasible. In the extension of the application of CRP, we also carried out the homopolymerization reaction of fluorinated norbornene-type monomers, and copolymerization of norbornene-type monomers with acrylates to be used in 157 nm photoresists. The results in this study show that this method can improve the molecular weight control on polymer synthesis. Measurement of the absorbance of some monomers and polymers on synchrotron radiation spectrometers will be presented here. Absorbances of our monomers are between 1456 and 5175 (L/mol cm). However, absorbances of our polymers show different data between SR and VASE measurement methods.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years