Dr. Tom Danielson Profile

Dr. Tom Danielson

at Santa Barbara Infrared

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 3 May 2016 Paper

Achieving ultra-high temperatures with a resistive emitter array

Tom Danielson, Greg Franks, Nicholas Holmes, Joe LaVeigne, Greg Matis, Steve McHugh, Dennis Norton, Tony Vengel, John Lannon, Scott Goodwin

Proceedings Volume 9820, 98200Z (2016) https://doi.org/10.1117/12.2225856

KEYWORDS: Projection systems, Integrated circuits, Infrared radiation, Detector development, Infrared detectors, Sensors, Packaging, Mid-IR, Integrated circuit design, Temperature metrology

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Proceedings Article | 12 May 2015 Paper

Advances in iterative non-uniformity correction techniques for infrared scene projection

Tom Danielson, Greg Franks, Joe LaVeigne, Marcus Prewarski, Brian Nehring

Proceedings Volume 9452, 945210 (2015) https://doi.org/10.1117/12.2177456

KEYWORDS: Nonuniformity corrections, Infrared radiation, Chromium, Mid-IR, Cameras, Calibration, Temperature metrology, Floods, Black bodies, Projection systems

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Proceedings Article | 12 May 2015 Paper

Thermal resolution specification in infrared scene projectors

Joe LaVeigne, Greg Franks, Tom Danielson

Proceedings Volume 9452, 94520Y (2015) https://doi.org/10.1117/12.2177450

KEYWORDS: Electronics, Digital micromirror devices, Thermography, Projection systems, Infrared radiation, Analog electronics, Infrared imaging, Mid-IR, Infrared technology, Light emitting diodes

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Proceedings Article | 12 May 2015 Paper

Development of an ultra-high temperature infrared scene projector at Santa Barbara Infrared Inc.

Greg Franks, Joe Laveigne, Tom Danielson, Steve McHugh, John Lannon, Scott Goodwin

Proceedings Volume 9452, 94520W (2015) https://doi.org/10.1117/12.2177448

KEYWORDS: Infrared radiation, Projection systems, Packaging, Mid-IR, Integrated circuits, Infrared detectors, Detector development, Electronics, Sensors, Silicon

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Proceedings Article | 12 May 2015 Paper

Test pixels for high-temperature infrared scene projection

Christopher Fredricksen, Seth Calhoun, Stephen Trewick, Aubrey Coffey, Edward Dein, Kevin Coffey, Robert Peale, Joseph LaVeigne, Gregory Franks, Tom Danielson, John Lannon, Scott Goodwin

Proceedings Volume 9452, 94520X (2015) https://doi.org/10.1117/12.2177025

KEYWORDS: Etching, Resistance, Infrared radiation, Silicon, Dielectrics, Metals, Semiconducting wafers, Dry etching, Resistors, Mid-IR

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