Tomoharu Fujiwara
at Nikon Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 13 March 2012 Paper
L. Lattard, M. McCallum, R. Morton, T. Fujiwara, K. Makino, A. Tokui, N. Takahashi, S. Sasamoto
Proceedings Volume 8326, 832604 (2012) https://doi.org/10.1117/12.916362
KEYWORDS: Optical alignment, System on a chip, Lithography, Semiconducting wafers, Image processing, Optical lithography, Scanning electron microscopy, Scanners, Signal processing, Photoresist processing

Proceedings Article | 13 March 2012 Paper
Tomoharu Fujiwara, Tsuyoshi Toki, Daishi Tanaka, Maki Sato, Junichi Kosugi, Rika Tanaka, Naruo Sakasai, Toshio Ohashi, Ryoko Nakasone, Akira Tokui
Proceedings Volume 8326, 83260Q (2012) https://doi.org/10.1117/12.916227
KEYWORDS: Semiconducting wafers, Reticles, Diffraction, Lithography, Inspection, Process control, Data corrections, Optical lithography, Scanners, Time metrology

Proceedings Article | 23 March 2011 Paper
Tomoharu Fujiwara, Tsuyoshi Toki, Daishi Tanaka, Junichi Kosugi, Tomohiko Susa, Naruo Sakasai, Akira Tokui
Proceedings Volume 7973, 797310 (2011) https://doi.org/10.1117/12.879348
KEYWORDS: Semiconducting wafers, Reticles, Error analysis, Scatterometry, Critical dimension metrology, Scanners, Data corrections, Lithography, Immersion lithography, Process control

Proceedings Article | 23 March 2011 Paper
L. Lattard, M. McCallum, R. Morton, C. Lapeyre, K. Makino, A. Tokui, N. Takahashi, T. Fujiwara
Proceedings Volume 7973, 79730I (2011) https://doi.org/10.1117/12.878953
KEYWORDS: Optical alignment, Double patterning technology, Scanners, Lithography, Overlay metrology, Optical lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium, Etching

Proceedings Article | 10 March 2010 Paper
Katsushi Nakano, Rei Seki, Tadamasa Kawakubo, Yoshihiro Maruta, Toshiyuki Sekito, Kenichi Shiraishi, Toshihiko Sei, Tomoharu Fujiwara, Tsunehito Hayashi, Yasuhiro Iriuchijima, Soichi Owa
Proceedings Volume 7640, 76400X (2010) https://doi.org/10.1117/12.846520
KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Double patterning technology, Atrial fibrillation, Polymers, Particles, Inspection, Printing, Scanning electron microscopy

Proceedings Article | 1 April 2009 Paper
Koutaro Sho, Hirokazu Kato, Katsutoshi Kobayashi, Kazunori Iida, Tomoya Ori, Daizo Muto, Tsukasa Azuma, Shinichi Ito, Tomoharu Fujiwara, Yuuki Ishii, Yukio Nishimura, Takanori Kawakami, Motoyuki Shima
Proceedings Volume 7273, 72733B (2009) https://doi.org/10.1117/12.812475
KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Line width roughness, Thin film coatings, Lithography, Scanners, Chemical species, Defect inspection, Immersion lithography

Proceedings Article | 1 April 2009 Paper
Hamid Khorram, Katsushi Nakanob, Tomoharu Fujiwara, Yasuhiro Iriuchijima, Y. Ishii, Natsuko Sagawa, Tadamasa Kawakubo, Shirou Nagaoka
Proceedings Volume 7273, 72732V (2009) https://doi.org/10.1117/12.814946
KEYWORDS: Semiconducting wafers, Scanners, Photoresist processing, Manufacturing, Immersion lithography, Lithography, Liquids, Particles, Inspection, Materials processing

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72743M (2009) https://doi.org/10.1117/12.814112
KEYWORDS: Contamination, Semiconducting wafers, Particles, Bridges, Thin film coatings, High volume manufacturing, Coating, Immersion lithography, Process control, Image filtering

Proceedings Article | 16 March 2009 Paper
Katsushi Nakano, Rei Seki, Toshiyuki Sekito, Masato Yoshida, Tomoharu Fujiwara, Yasuhiro Iriuchijima, Soichi Owa
Proceedings Volume 7274, 72741P (2009) https://doi.org/10.1117/12.814238
KEYWORDS: Semiconducting wafers, Particles, Head-mounted displays, Inspection, Silicon, Contamination, Immersion lithography, Scanning electron microscopy, Photoresist processing, Manufacturing

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714039 (2008) https://doi.org/10.1117/12.804675
KEYWORDS: Immersion lithography, Semiconducting wafers, Particles, Coating, Lithography, Photoresist processing, Thin film coatings, Scanners, Scanning electron microscopy, Semiconductors

Proceedings Article | 4 April 2008 Paper
Nobuji Matsumura, Norihiko Sugie, Kentaro Goto, Koichi Fujiwara, Yoshikazu Yamaguchi, Hirokazu Tanizaki, Katsushi Nakano, Tomoharu Fujiwara, Shinya Wakamizu, Hirofumi Takeguchi, Hiroshi Arima, Hideharu Kyoda, Kosuke Yoshihara, Junichi Kitano
Proceedings Volume 6923, 69230D (2008) https://doi.org/10.1117/12.771795
KEYWORDS: Lithography, Immersion lithography, Thin film coatings, 193nm lithography, Semiconducting wafers, Bridges, Defect inspection, Photoresist processing, Line width roughness, Semiconductors

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794
KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

Proceedings Article | 17 March 2008 Paper
Katsushi Nakano, Shiro Nagaoka, Masato Yoshida, Yasuhiro Iriuchijima, Tomoharu Fujiwara, Kenichi Shiraishi, Soichi Owa
Proceedings Volume 6924, 692418 (2008) https://doi.org/10.1117/12.772270
KEYWORDS: Particles, Semiconducting wafers, Photoresist processing, Inspection, Bridges, Coating, Printing, Photomasks, Immersion lithography, Materials processing

Proceedings Article | 2 April 2007 Paper
Proceedings Volume 6519, 65190C (2007) https://doi.org/10.1117/12.711853
KEYWORDS: Thin film coatings, Immersion lithography, Semiconducting wafers, Photoresist processing, Silicon, Scanning electron microscopy, Lithography, Image processing, Semiconductors, Data processing

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65201W (2007) https://doi.org/10.1117/12.712042
KEYWORDS: Semiconducting wafers, Calibration, Particles, Scanners, Immersion lithography, Bridges, Polarization, Lithographic illumination, Scanning electron microscopy, Wavefront aberrations

Proceedings Article | 26 March 2007 Paper
Katsushi Nakano, Hiroshi Kato, Tomoharu Fujiwara, K. Shiraishi, Yasuhiro Iriuchijima, Soichi Owa, Irfan Malik, Steve Woodman, Prasad Terala, Christine Pelissier, Haiping Zhang
Proceedings Volume 6520, 652016 (2007) https://doi.org/10.1117/12.711464
KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Inspection, Wafer inspection, Bridges, Photoresist processing, Optical lithography, Calibration, Defect inspection

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 652116 (2007) https://doi.org/10.1117/12.711356
KEYWORDS: Optical proximity correction, Scanners, Apodization, Reticles, Polarization, Error analysis, Resolution enhancement technologies, Lithography, Lenses, SRAF

Proceedings Article | 11 April 2006 Paper
Nobuo Ando, Youngjoon Lee, Takayuki Miyagawa, Kunishige Edamatsu, Ichiki Takemoto, Satoshi Yamamoto, Yoshinobu Tsuchida, Keiko Yamamoto, Shinji Konishi, Katsushi Nakano, Fujiwara Tomoharu
Proceedings Volume 6153, 615322 (2006) https://doi.org/10.1117/12.655586
KEYWORDS: Line width roughness, Polymers, Diffusion, Semiconducting wafers, Immersion lithography, Photoresist materials, Lithography, Photoresist developing, Scanners, Molecules

Proceedings Article | 11 April 2006 Paper
Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori, Toshikazu Takayama, Keita Ishizuka, Masaaki Yoshida, Tomoyuki Hirano, Jiro Yokoya, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa
Proceedings Volume 6153, 615309 (2006) https://doi.org/10.1117/12.656164
KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Resonance energy transfer, Lithography, Materials processing, Bridges, 193nm lithography, Molecular bridges, Lens design

Proceedings Article | 11 April 2006 Paper
Hiroki Nakagawa, Kenji Hoshiko, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa
Proceedings Volume 6153, 61530D (2006) https://doi.org/10.1117/12.655541
KEYWORDS: Semiconducting wafers, Scanners, Water, Lithography, Immersion lithography, Resonance energy transfer, Photoresist processing, Photoresist materials, Silicon, Chemical analysis

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 61544I (2006) https://doi.org/10.1117/12.656130
KEYWORDS: Semiconducting wafers, Resonance energy transfer, Standards development, Immersion lithography, Water, Lithography, Optical lithography, Photoresist processing, Photomasks, Microfluidics

Proceedings Article | 21 March 2006 Paper
Tomoharu Fujiwara, Kenichi Shiraishi, Hirokazu Tanizaki, Yuuki Ishii, Hideharu Kyoda, Taro Yamamoto, Seiki Ishida
Proceedings Volume 6154, 61544L (2006) https://doi.org/10.1117/12.656303
KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Immersion lithography, Particles, Thin film coatings, Contamination, Bridges, Resonance energy transfer, Clouds

Proceedings Article | 20 March 2006 Paper
Proceedings Volume 6154, 61540Q (2006) https://doi.org/10.1117/12.656306
KEYWORDS: Semiconducting wafers, Resonance energy transfer, Temperature metrology, Optical alignment, Overlay metrology, Immersion lithography, Photoresist developing, Photoresist materials, Scanners, Humidity

Proceedings Article | 20 May 2004 Paper
Tomoharu Fujiwara, Noriyuki Hirayanagi, Jin Udagawa, Junji Ikeda, Sumito Shimizu, Hidekazu Takekoshi, Kazuaki Suzuki
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537008
KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Distortion, Electron beam lithography, Optical alignment, Interferometers, Wafer-level optics, Scanning electron microscopy, Projection lithography

Proceedings Article | 16 June 2003 Paper
Noriyuki Hirayanagi, Tomoharu Fujiwara, Kazunari Hada, Toshimasa Shimoda, Kazuaki Suzuki
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484972
KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Sensors, Servomechanisms, Image sensors, Electron beam lithography, Projection lithography, Beam controllers, Photography

Proceedings Article | 20 August 2001 Paper
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436696
KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Projection lithography, Electron beams, Electron beam lithography, Scattering, Optical simulations, Scanning electron microscopy, Laser scattering

Proceedings Article | 20 August 2001 Paper
Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro, Hajime Yamamoto
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436632
KEYWORDS: Reticles, Semiconducting wafers, Electron beams, Silicon, Sensors, Optical alignment, Optical lithography, Photomasks, Wafer-level optics, Image sensors

Proceedings Article | 21 July 2000 Paper
Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada, Noriyuki Hirayanagi, Shintaro Kawata, Kenji Morita, Kazuya Okamoto, Teruaki Okino, Sumito Shimizu, Takehisa Yahiro
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390057
KEYWORDS: Reticles, Semiconducting wafers, Silicon, Electron beams, Critical dimension metrology, Electron beam lithography, Scattering, Wafer-level optics, Sensors, Optical alignment

Proceedings Article | 21 July 2000 Paper
Teruaki Okino, Kazuaki Suzuki, Kazuya Okamoto, Shintaro Kawata, Kiyoshi Uchikawa, Syouhei Suzuki, Sumito Shimizu, Tomoharu Fujiwara, Atsushi Yamada, Koichi Kamijo
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390059
KEYWORDS: Reticles, Semiconducting wafers, Lithography, Electron beam lithography, Projection lithography, Silicon, Scattering, Electron beams, Backscatter, Computer aided design

Proceedings Article | 21 July 2000 Paper
Kenji Morita, Takehisa Yahiro, Sumito Shimizu, Hajime Yamamoto, Noriyuki Hirayanagi, Tomoharu Fujiwara, Syouhei Suzuki, Hiroyasu Shimizu, Shintaro Kawata, Teruaki Okino, Kazuaki Suzuki
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390111
KEYWORDS: Reticles, Scattering, Silicon, Semiconducting wafers, Laser scattering, Electron beams, Monte Carlo methods, Lithography, Calibration, Optical alignment

Showing 5 of 30 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top