Mr. Tomohiro Takayama Profile

Tomohiro Takayama

at Yamaguchi Univ

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Author

Publications (4)

Proceedings Article | 13 July 2017 Paper

Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

Shunsuke Ochiai, Tomohiro Takayama, Yukiko Kishimura, Hironori Asada, Manae Sonoda, Minako Iwakuma, Ryoichi Hoshino

Proceedings Volume 10454, 1045414 (2017) https://doi.org/10.1117/12.2279079

KEYWORDS: Dry etching, Resistance, Chlorine, Chemical species, Scanning electron microscopy, Argon, Photomasks, Polymethylmethacrylate, Photoresist processing, Electron beam lithography

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Proceedings Article | 4 October 2016 Paper

Investigation of fabrication process for sub 20-nm dense pattern of non-chemically amplified electron beam resist based on acrylic polymers

Shunsuke Ochiai, Tomohiro Takayama, Yukiko Kishimura, Hironori Asada, Manae Sonoda, Minako Iwakuma, Ryoichi Hoshino

Proceedings Volume 9985, 99851L (2016) https://doi.org/10.1117/12.2242986

KEYWORDS: Electron beams, Photoresist processing, Polymers, Photomasks, Electron beam lithography, Resistance, Polymethylmethacrylate, Halogens, Scanning electron microscopy, Photomask technology

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Proceedings Article | 10 May 2016 Paper

Developer molecular size dependence of pattern formation of polymer type electron beam resists with various molecular weights

Tomohiro Takayama, Hironori Asada, Yukiko Kishimura, Shunsuke Ochiai, Ryoichi Hoshino, Atsushi Kawata

Proceedings Volume 9984, 99840L (2016) https://doi.org/10.1117/12.2240296

KEYWORDS: Electron beams, Line width roughness, Polymers, Scanning electron microscopy, Photoresist processing, Photomasks, Line edge roughness, Electron beam lithography, Nanoimprint lithography, Dry etching

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Proceedings Article | 23 October 2015 Paper

Exposure characterizations of polymer type electron beam resists with various molecular weights for next-generation photomask

Tomohiro Takayama, Hironori Asada, Yukiko Kishimura, Ryoichi Hoshino, Atsushi Kawata

Proceedings Volume 9635, 96351K (2015) https://doi.org/10.1117/12.2196942

KEYWORDS: Polymers, Line width roughness, Scanning electron microscopy, Electron beams, Photomasks, Dry etching, Resistance, Plasma, Line edge roughness, Etching

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