Mr. Tomoyuki Ando Profile

Tomoyuki Ando

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 30 March 2010 Paper

Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, Junichi Onodera

Proceedings Volume 7639, 76390U (2010) https://doi.org/10.1117/12.846391

KEYWORDS: Fullerenes, Etching, Nanolithography, Electron beams, Lithography, Polymers, Reactive ion etching, Ultraviolet radiation, Line edge roughness, Silicon

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Proceedings Article | 1 April 2009 Paper

Topcoat-free ArF negative tone resist

Tomoyuki Ando, Sho Abe, Ryoichi Takasu, Jun Iwashita, Shogo Matsumaru, Ryoji Watanabe, Komei Hirahara, Yujiro Suzuki, Miki Tsukano, Takeshi Iwai

Proceedings Volume 7273, 727308 (2009) https://doi.org/10.1117/12.813787

KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

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SPIE Journal Paper | 1 January 2009

Litho-only double patterning approaches: positive–negative versus positive–positive tone

Michael Crouse, Ryusuke Uchida, Youri van Dommelen, Tomoyuki Ando, Emil Schmitt-Weaver, Masaru Takeshita, Shunder Wu, Robert Routh

JM3, Vol. 8, Issue 01, 011006, (January 2009) https://doi.org/10.1117/12.10.1117/1.3042219

KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

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Proceedings Article | 4 December 2008 Paper

Pattern freezing process free litho-litho-etch double patterning

Tomoyuki Ando, Masaru Takeshita, Ryoich Takasu, Yasuhiro Yoshii, Jun Iwashita, Shogo Matsumaru, Sho Abe, Takeshi Iwai

Proceedings Volume 7140, 71402H (2008) https://doi.org/10.1117/12.804710

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

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Proceedings Article | 26 March 2008 Paper

Chemically amplified molecular resist based on fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Tomoyuki Ando, Katsumi Ohmori, Mitsuru Sato, Junichi Onodera

Proceedings Volume 6923, 69230N (2008) https://doi.org/10.1117/12.771835

KEYWORDS: Fullerenes, Etching, Electron beams, Silicon, Nanolithography, Ultraviolet radiation, Photoresist processing, Line edge roughness, Polymers, Scanning electron microscopy

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Proceedings Article | 2 April 2007 Paper

Mechanism of immersion specific defects with high receding-angle topcoat

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Takuya Hagiwara, Tetsuro Hanawa, Tomoyuki Ando, Takeshi Matsunobe, Kazuyuki Okada, Yuichi Muraji, Kazuhiro Yoshikawa, Naoki Man

Proceedings Volume 6519, 65191S (2007) https://doi.org/10.1117/12.711058

KEYWORDS: Water, Bridges, Immersion lithography, Semiconducting wafers, Digital watermarking, Surface properties, Polymers, Chemical analysis, Defect inspection, Standards development

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Proceedings Article | 11 April 2006 Paper

Progress of topcoat and resist development for 193nm immersion lithography

Katsumi Ohmori, Tomoyuki Ando, Toshikazu Takayama, Keita Ishizuka, Masaki Yoshida, Yoshiyuki Utsumi, Kotaro Endo, Takeshi Iwai

Proceedings Volume 6153, 61531X (2006) https://doi.org/10.1117/12.656360

KEYWORDS: Polymers, Immersion lithography, Semiconducting wafers, Photoresist processing, Lithography, Silicon, Scanners, Coating, Manufacturing, 193nm lithography

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Proceedings Article | 11 April 2006 Paper

Defect studies of resist process for 193nm immersion lithography

Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori, Toshikazu Takayama, Keita Ishizuka, Masaaki Yoshida, Tomoyuki Hirano, Jiro Yokoya, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa

Proceedings Volume 6153, 615309 (2006) https://doi.org/10.1117/12.656164

KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Resonance energy transfer, Lithography, Materials processing, Bridges, 193nm lithography, Molecular bridges, Lens design

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Proceedings Article | 29 March 2006 Paper

Studies of the mechanism for immersion specific defects

Takeo Ishibashi, Tetsuro Hanawa, Toshifumi Suganaga, Koichiro Narimatsu, Kazuyuki Suko, Mamoru Terai, Teruhiko Kumada, Tomoyuki Ando

Proceedings Volume 6153, 61533I (2006) https://doi.org/10.1117/12.654756

KEYWORDS: Ions, Semiconducting wafers, Chemical analysis, Statistical analysis, Immersion lithography, Technetium, Contamination, Photoresist processing, Adsorption, Neodymium

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Proceedings Article | 29 March 2006 Paper

The reaction mechanism of poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]

Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, Hiroji Komano

Proceedings Volume 6153, 61533O (2006) https://doi.org/10.1117/12.656262

KEYWORDS: Polymers, Absorption, Electron beams, Ionization, Chemically amplified resists, Ionizing radiation, Picosecond phenomena, Silver, X-rays, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2006 Paper

Verification of optical proximity effect in immersion lithography

Toshifumi Suganaga, Shinroku Maejima, Tetsuro Hanawa, Takeo Ishibashi, Shuji Nakao, Seiichiro Shirai, Koichiro Narimatsu, Kazuyuki Suko, Kenichi Shiraishi, Yuki Ishii, Tomoyuki Ando, Katsumi Ohmori

Proceedings Volume 6154, 61544K (2006) https://doi.org/10.1117/12.655526

KEYWORDS: Immersion lithography, Technetium, Lithography, Resonance energy transfer, Polymers, Manufacturing, Scanners, Scanning electron microscopy, Optics manufacturing, Optical coatings

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Proceedings Article | 20 May 2004 Paper

Resist outgassing in electron projection lithography

Tasuku Matsumiya, Tomoyuki Ando, Masaaki Yoshida, Kiyoshi Ishikawa, Sumito Shimizu

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536168

KEYWORDS: Polymers, Electron beam lithography, Protactinium, Lithography, Electroluminescence, Projection lithography, Optical lithography, Semiconducting wafers, Neodymium, Electron beams

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Showing 5 of 12 publications

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