Mr. Tomoyuki Okada Profile

Tomoyuki Okada

at Fujitsu Semiconductor Ltd

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Author

Publications (10)

Proceedings Article | 28 July 2014 Paper

Study of hotspot repair using cellular automata method

Norimasa Nagase, Kanji Takeuchi, Mitsuo Sakurai, Takahisa Itoh, Tomoyuki Okada

Proceedings Volume 9256, 92560V (2014) https://doi.org/10.1117/12.2067112

KEYWORDS: Optical proximity correction, Optical filters, Lithography, Image filtering, Binary data, Complex systems, Light, Semiconductor manufacturing, Model-based design, Image enhancement

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Proceedings Article | 28 June 2013 Paper

A study of applications scribe frame data verifications using design rule check

Shoko Saito, Masaru Miyazaki, Mitsuo Sakurai, Takahisa Itoh, Kazumasa Doi, Norioko Sakurai, Tomoyuki Okada

Proceedings Volume 8701, 87010P (2013) https://doi.org/10.1117/12.2028330

KEYWORDS: Inspection, Optical alignment, Phase modulation, Commercial off the shelf technology, Scanners, Semiconductor manufacturing, Wafer inspection, Yield improvement, Optical inspection

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Proceedings Article | 19 May 2011 Paper

Mask data processing technique using GPU for reducing computer cost

Ryo Tsujimura, Kozo Ogino, Hiromi Hoshino, Shigeo Satoh, Kazumasa Morishita, Satoshi Yoshikawa, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Satoshi Yamauchi, Tomoyuki Okada, Naoyuki Ishiwata, Motoshu Miyajima

Proceedings Volume 8081, 80810I (2011) https://doi.org/10.1117/12.899496

KEYWORDS: Optical proximity correction, Data processing, Photomasks, Computing systems, Distributed computing, Manufacturing, Graphics processing units, Fourier transforms, Semiconductors, Digital image processing

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Proceedings Article | 11 May 2009 Paper

Study of the pattern categorization method in verification of OPC pattern

Mitsufumi Naoe, Toru Miyauchi, Seiji Makino, Koichi Suzuki, Masakazu Oseki, Tomoyuki Okada

Proceedings Volume 7379, 737933 (2009) https://doi.org/10.1117/12.824353

KEYWORDS: Optical proximity correction, Error analysis, Photomasks, Reliability, Databases, Mirrors, Tolerancing, Visualization, Very large scale integration, Microelectronics

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Proceedings Article | 17 October 2008 Paper

Study of influence to transistor properties on the change of OPC pattern

Kazuya Sugawa, Norimasa Nagase, Takahisa Itoh, Mitsuo Sakurai, Tomoyuki Okada

Proceedings Volume 7122, 71223T (2008) https://doi.org/10.1117/12.801547

KEYWORDS: Transistors, Optical proximity correction, Data modeling, Diffusion, Data processing, Device simulation, Connectors, Picosecond phenomena, Microelectronics, Resolution enhancement technologies

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Proceedings Article | 14 May 2007 Paper

Study of hot spot detection using neural networks judgment

Norimasa Nagase, Kouichi Suzuki, Kazuhiko Takahashi, Masahiko Minemura, Satoshi Yamauchi, Tomoyuki Okada

Proceedings Volume 6607, 66071B (2007) https://doi.org/10.1117/12.728959

KEYWORDS: Neural networks, Optical proximity correction, Lithography, Image classification, Optics manufacturing, Optical lithography, Machine learning, Feature extraction, Raster graphics

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Proceedings Article | 28 June 2005 Paper

Effectiveness of mask data process using OASIS format

Katsuji Tabara, Mitsuo Sakurai, Seiji Makino, Takahisa Itoh, Tomoyuki Okada

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617148

KEYWORDS: Data conversion, Data processing, Optical proximity correction, Data storage, Data modeling, Photomasks, Logic devices, Binary data, Data compression, Instrument modeling

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Proceedings Article | 28 August 2003 Paper

Reticle inspection using an image filter method

Tomoyuki Okada, Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Satoshi Akutagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504203

KEYWORDS: Image filtering, Reticles, Scanning electron microscopy, Critical dimension metrology, Optical simulations, Photography, Optical filters, Inspection, Image processing, Optics manufacturing

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Proceedings Article | 19 July 2000 Paper

Mask pattern correction for an advanced device

Yoshimasa Watanabe, Masahiko Minemura, Kazuhiko Takahashi, Tomoyuki Okada, Kojiro Suzuki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392082

KEYWORDS: Photomasks, Lithography, Data conversion, Laser systems engineering, X-ray technology, Data processing, Optical proximity correction, Logic devices, Critical dimension metrology, Logic

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Proceedings Article | 19 January 1993 Paper

Streak tube having ultrahigh deflection sensitivity

Motohiro Suyama, Katsuyuki Kinoshita, Tomoyuki Okada, Masuo Ito

Proceedings Volume 1757, (1993) https://doi.org/10.1117/12.139137

KEYWORDS: Temporal resolution, Photonics, Head, High speed photography, Resistors, Electrodes, Wave plates, Computer simulations, CCD cameras, Pulse generators

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Showing 5 of 10 publications

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