Dr. Toru Suzuki Profile

Dr. Toru Suzuki

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 16 March 2009 Paper

Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 16 March 2009 Paper

Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 11 April 2008 Paper

Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 26 March 2007 Paper

Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 15 March 2006 Paper

Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

Paper

High-power injection lock laser platform for ArF dry/wet lithography

H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Ohta, M. Nakane, M. Moriya, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, T. Ito, H. Umeda, S. Tanaka, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, N. Matsui, T. Mimura, K. Kakizaki, M. Goto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

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Proceedings Article | 28 May 2004 Paper

Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 26 June 2003 Paper

Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 30 July 2002 Paper

Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, Takahito Kumazaki, Kazuaki Hotta, Masaki Yoshioka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 14 September 2001 Paper

Paper

Spectral measurement of ultra line-narrowed F2 laser

Osamu Wakabayashi, Jun Sakuma, Toru Suzuki, Hirokazu Kubo, Naoki Kitatochi, Takashi Suganuma, Takanori Nakaike, Takahito Kumazaki, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao, Tadashi Togashi, Yasuo Nabekawa, Shuntaro Watanabe

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435638

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Light sources, Laser development, Michelson interferometers, Calibration, Xenon, Spectral calibration, Excimer lasers, Sapphire lasers

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Proceedings Article | 14 September 2001 Paper

Paper

Br lamp for F2 laser wavelength calibration

Masaki Yoshioka, Tetsuya Kitagawa, Tomoyoshi Arimoto, Hiromitsu Matsuno, Tatsumi Hiramoto, Toru Suzuki, Kazuaki Hotta

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435659

KEYWORDS: Bromine, Lamps, Calibration, Chemical species, Argon, Doppler effect, Excimers, Electrodes, Vacuum ultraviolet, Glasses

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Proceedings Article | 14 September 2001 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Hirokazu Kubo, Takashi Suganuma, Toshio Yamashita, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435662

KEYWORDS: Spectroscopy, Excimer lasers, Diffraction gratings, Holography, Diffraction, Light sources, Collimators, Surface plasmons, Mirrors, Charge-coupled devices

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Proceedings Article | 6 November 2000 Paper

Paper

High-repetition-rate ArF excimer laser for microlithography

Osamu Wakabayashi, Tatsuo Enami, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Satoshi Andou, Takashi Matsunga, Hiroshi Umeda, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405749

KEYWORDS: Excimer lasers, Gas lasers, Xenon, Laser development, Laser stabilization, Pulsed laser operation, Light sources, Spectroscopy, Laser applications, Lithography

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Proceedings Article | 5 July 2000 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Takanori Nakaike, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388982

KEYWORDS: Spectroscopy, Excimer lasers, Light sources, Mirrors, Diffraction gratings, Deep ultraviolet, Charge-coupled devices, Sensors, CCD image sensors, Diffraction

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Proceedings Article | 5 July 2000 Paper

Paper

Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Tatsuo Enami, Osamu Wakabayashi, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388981

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Lithography, Deep ultraviolet, Performance modeling, Electrodes, Optical lithography, Light sources, Laser applications

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Proceedings Article | 26 July 1999 Paper

Paper

Billion-level durable ArF excimer laser with highly stable energy

Osamu Wakabayashi, Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Katsutomo Terashima, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354311

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Pulsed laser operation, Fabry–Perot interferometers, Xenon, Laser stabilization, Spectroscopy, Carbon dioxide lasers, Light sources

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Proceedings Article | 7 April 1999 Paper

Paper

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage

Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Fumika Sunaka, Katsutomo Terashima, Akira Sumitani, Youichi Kawasa, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344436

KEYWORDS: Excimer lasers, Luminescence, Laser stabilization, Crystals, Optical lithography, Laser development, Silica, Optical damage, Pulsed laser operation, Laser optics

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Showing 5 of 18 publications

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