Mr. Troy B. Morrison Profile

Troy B. Morrison

at Thermo Fisher Scientific Inc

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Author

Publications (8)

Proceedings Article | 28 June 2005 Paper

Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

Vicky Philipsen, Leonardus Leunissen, Rudi De Ruyter, Rik Jonckheere, Patrick Martin, Clare Wakefield, Stephen Johnson, Michael Cangemi, Alex Buxbaum, Troy Morrison

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617438

KEYWORDS: Etching, Photomasks, Quartz, Semiconducting wafers, Phase shifts, Chromium, Wet etching, Dry etching, Metrology, Chemistry

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Alternating aperture phase shift masks (AAPSM) continue to offer high contrast imaging for 65nm half-pitch using conventional 193nm illumination. The transition to high NA lithography systems including immersion lithography, and the ever-decreasing feature sizes have made the topography of the photomask a significant issue in the final resist image. Therefore, the influence of the alternating phase shift depth, the trench profile, and the critical dimension control through variable feature width must be considered and understood for optimized wafer imaging. This paper will examine the impact on imaging based on three photomasks, each employing different quartz etch chemistries. The three methods used to define the well structures include two all dry and a partial wet etch approach. As the photomask features continue to decrease, slight changes in the quartz etched trench profile and depth can severely affect the wafer prints, as the effective 180 degree phase shift for imaging is not achieved. In this work we correlate the imaging performance through pitch to a systematic evaluation of the photomask topography using complementary photomask metrology techniques. The actual depth and profile of the structures is obtained on a FEI Stylus nano-profilometer (SNP-XT) and from destructive cross sections. The CD linearity is measured on a top-down reticle CD SEM (KLA 8100XR). Based on photomask metrology data, rigorous electro-magnetic field (EMF) simulations of the various topographic profiles are performed. As a first printing performance estimate the photomasks are evaluated on a Zeiss AIMSfab193. Comparisons between the different evaluations will be made against wafer prints, obtained on an ASML PAS5500/1100 ArF scanner working with a 0.75NA projection lens. This study will lead to an understanding of the impact of possible limitations of the current quartz etching processes on the imaging performance of alternating phase-shift masks for 65nm half-pitch.

Proceedings Article | 6 December 2004 Paper

Phase standard based on profilometer metrology standard

Gregory Hughes, Cindy Goodman, Gunter Antesberger, Stefan Burges, Troy Morrison, Alex Buxbaum

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.581222

KEYWORDS: Calibration, Photomasks, Metrology, Quartz, Phase shifts, Laser metrology, Profilometers, Phase measurement, Laser optics, Etching

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Proceedings Article | 6 December 2004 Paper

3D metrology solution for the 65-nm node

Rick Kneedler, Sergey Borodyansky, Dimitri Klyachko, Leonid Vasilyev, Alex Buxbaum, Troy Morrison

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570122

KEYWORDS: Critical dimension metrology, Photomasks, Metrology, 3D metrology, Atomic force microscopy, Sensors, Scanners, Precision measurement, Edge roughness, Microscopy

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Proceedings Article | 20 August 2004 Paper

Nano-scale dimensional focused ion beam repair of quartz defects on 90 nm node alternating aperture phase shift masks

Tod Robinson, Anthony Graupera, Troy Morrison, Marcus Ramstein

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557737

KEYWORDS: Quartz, Chromium, Photomasks, Etching, Phase shifts, Ion beams, Process control, Imaging systems, Signal attenuation

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Proceedings Article | 17 December 2003 Paper

Advancements in focused ion beam repair of alternating phase-shift masks

Joshua Lessing, Tod Robinson, Troy Morrision, Theresa Holtermann

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518319

KEYWORDS: Quartz, Etching, Ion beams, Reticles, Photomasks, Phase shifts, Transmittance, Atomic force microscopy, Ions, Resolution enhancement technologies

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Proceedings Article | 28 August 2003 Paper

New advancements in focused ion beam repair of alternating phase-shift masks

Joshua Lessing, Tod Robinson, Rey Brannen, Troy Morrison, Theresa Holtermann

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504211

KEYWORDS: Quartz, Etching, Ion beams, Photomasks, Reticles, Phase shifts, Atomic force microscopy, Transmittance, Ions, Resolution enhancement technologies

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Proceedings Article | 22 January 2001 Paper

Chrome dry etch process characterization using surface nanoprofiling

Guenther Ruhl, Ralf Dietrich, Ralf Ludwig, Norbert Falk, Troy Morrison, Brigitte Stoehr

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410753

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Helium, Oxygen, Diffractive optical elements, Photoresist materials, Photoresist processing, Sensors, Profiling

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Proceedings Article | 2 June 2000 Paper

Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer

Bryan Kasprowicz, Benjamin Eynon, Troy Morrison, Chih-Yu Wang

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386490

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical testing, Electron microscopes, Optics manufacturing, Interfaces, Calibration, Optical metrology, Diffraction

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Showing 5 of 8 publications

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