Dr. Tsunehito Kohyama Profile

Dr. Tsunehito Kohyama

Supply Chain Engineer at intel corporation

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Publications (7)

Proceedings Article | 1 December 2022 Paper

Mask inspection technologies for expanding EUV lithography

Arosha Goonesekera, Hiroki Miyai, Tsunehito Kohyama, Toshiyuki Todoroki

Proceedings Volume 12293, 1229302 (2022) https://doi.org/10.1117/12.2643295

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Printing, EUV optics, Optical inspection

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Proceedings Article | 16 September 2022 Paper

Actinic patterned mask inspection for EUV lithography

Tsunehito Kohyama, Hiroki Miyai, Toshiyuki Todoroki

Proceedings Volume 12325, 123250H (2022) https://doi.org/10.1117/12.2642098

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Pellicles, Deep ultraviolet, Projection systems, Defect detection, Particles, Lithography

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Proceedings Article | 23 August 2021 Paper

Actinic patterned mask inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Toshiyuki Todoroki

Proceedings Volume 11908, 119080H (2021) https://doi.org/10.1117/12.2601872

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Semiconducting wafers, Printing, EUV optics, Projection systems, Particles

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Proceedings Article | 9 April 2020 Paper

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11323, 113231K (2020) https://doi.org/10.1117/12.2557858

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

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Proceedings Article | 25 November 2019 Open Access

Actinic patterned mask defect inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11148, 111480W (2019) https://doi.org/10.1117/12.2538001

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

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Proceedings Article | 28 March 2017 Paper

High throughput and dense sampling metrology for process control

Lei Sun, Tsunehito Kohyama, Kuniaki Takeda, Hiroto Nozawa, Yuji Asakawa, Taher Kagalwala, Granger Lobb, Frank Mont, Xintuo Dai, Shyam Pal, Wenhui Wang, Jongwook Kye, Francis Goodwin

Proceedings Volume 10145, 101452D (2017) https://doi.org/10.1117/12.2258623

KEYWORDS: Process control, Metrology, Optical metrology, Defect inspection, Inspection, Semiconducting wafers, Critical dimension metrology, Finite element methods, Wafer-level optics, Line edge roughness, Lithography, Optics manufacturing

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Proceedings Article | 28 July 2008 Paper

Far-Infrared Interferometeric Telescope Experiment (FITE): sensor optics

Tsunehito Kohyama, Hiroshi Shibai, Mitsunobu Kawada, Toyoki Watabe, Taro Matsuo, Atsushi Ohkubo, Eri Katoh, Tetsuo Kanoh, Miki Suzuki, Shun Mochizuki, Yuka Matsumoto, Hirono Morishita, Koudai Yamamoto, Ryoko Kanoh, Asami Nakashima, Mitsuhiro Tanabe, Yasuo Doi, Masanao Narita

Proceedings Volume 7013, 70133O (2008) https://doi.org/10.1117/12.788780

KEYWORDS: Sensors, Interferometers, Fringe analysis, CCD image sensors, Mirrors, Charge-coupled devices, Spatial resolution, Cameras, Telescopes, Far infrared

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Showing 5 of 7 publications

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