Dr. Udo Dinger Profile

Dr. Udo Dinger

Principal Scientist at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Proceedings Article | 13 June 2006 Paper

Manufacturing of Wolter-I mirror segments with slumped glass

Peter Friedrich, Bernd Aschenbach, Christoph Braig, Heinrich Bräuninger, Bernd Budau, Wolfgang Burkert, Michael Freyberg, Gisela Hartner, Günther Hasinger, Peter Predehl, Monika Vongehr, Stefano Basso, Oberto Citterio, Mauro Ghigo, Francesco Mazzoleni, Giovanni Pareschi, Udo Dinger, Wilhelm Egle, Ralf Lenke, Georg Luichtel, Herbert Schwarz

Proceedings Volume 6266, 62661G (2006) https://doi.org/10.1117/12.671802

KEYWORDS: Glasses, Mirrors, Image segmentation, X-rays, Spatial resolution, Manufacturing, Metrology, Error analysis, Point spread functions, Profilometers

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Proceedings Article | 8 September 2005 Paper

Recent results on manufacturing of segmented x-ray mirrors with slumped glass

Peter Friedrich, Bernd Aschenbach, Heinrich Bräuninger, Guenther Hasinger, Oberto Citterio, Mauro Ghigo, Francesco Mazzoleni, Giovanni Pareschi, Udo Dinger, Wilhelm Egle, Axel Matthes

Proceedings Volume 5900, 59000W (2005) https://doi.org/10.1117/12.617216

KEYWORDS: Glasses, Mirrors, X-rays, Manufacturing, Ion beam finishing, Polishing, Ceramics, Spatial resolution, Ion beams, Metrology

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Proceedings Article | 18 October 2004 Paper

EUV microlithography: a challenge for optical metrology

Gunther Seitz, Stefan Schulte, Udo Dinger, Oliver Hocky, Bernhard Fellner, Markus Rupp

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.556317

KEYWORDS: Interferometers, Aspheric lenses, Wavefronts, Mirrors, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Imaging systems, Diffraction, Calibration

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Proceedings Article | 11 October 2004 Paper

DUO: the Dark Universe Observatory

Richard Griffiths, Robert Petre, Guenther Hasinger, Peter Predehl, Nicholas White, Bernd Aschenbach, Xavier Barcons, Hans Bohringer, Ulrich Briel, Lynn Cominsky, Michael Corcoran, Udo Dinger, Wilhelm Egle, Peter Friedrich, Zoltan Haiman, Robert Hartmann, J. Patrick Henry, Horst Hippmann, Jim Ingersoll, Keith Jahoda, Del Jenstrom, Steven Jordan, Eckhard Kendziorra, Günther Kettenring, Walter Kink, Norbert Meidinger, Takamitsu Miyaji, Joseph Mohr, Siegfried Mueller, Richard Mushotzky, Elmar Pfeffermann, Peter Schuecker, Axel Schwope, Mark Shannon, Lothar Strueder, Steven Varlese

Proceedings Volume 5488, (2004) https://doi.org/10.1117/12.552171

KEYWORDS: X-rays, Galaxy groups and clusters, Observatories, Microwave radiation, Solids, X-ray imaging, Calibration, Spatial resolution, Astrophysics, X-ray telescopes

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Proceedings Article | 20 May 2004 Paper

EUV imaging: an aerial image study

Martin Lowisch, Udo Dinger, Uwe Mickan, Tilmann Heil

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537338

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Electroluminescence, Reticles, Nanoimprint lithography, Lithography, Diffraction, Critical dimension metrology, Photomasks, Imaging systems

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Proceedings Article | 13 January 2004 Paper

Fabrication and metrology of diffraction-limited soft x-ray optics for the EUV microlithography

Udo Dinger, Guenther Seitz, Stefan Schulte, Frank Eisert, Christian Muenster, Stefan Burkart, Siegfried Stacklies, Christian Bustaus, Hubert Hoefer, Maximilian Mayer, Bernhard Fellner, Oliver Hocky, Markus Rupp, Klaus Riedelsheimer, Peter Kuerz

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.511489

KEYWORDS: Mirrors, Metrology, Extreme ultraviolet lithography, Aspheric lenses, Imaging systems, Wavefronts, Scattering, Off axis mirrors, Reflectivity, Interferometers

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Proceedings Article | 20 August 2001 Paper

Progress of the EUVL alpha tool

Hans Meiling, Jos Benschop, Udo Dinger, Peter Kuerz

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436675

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Fiber optic illuminators, Reticles, Extreme ultraviolet, Metrology, Wafer-level optics, Projection systems, Sensors, Semiconducting wafers

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Proceedings Article | 8 November 2000 Paper

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Udo Dinger, Frank Eisert, Holger Lasser, Maximilian Mayer, A. Seifert, Guenther Seitz, Siegfried Stacklies, Franz-Josef Stickel, Martin Weiser

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406674

KEYWORDS: Mirrors, Aspheric lenses, Metrology, Extreme ultraviolet lithography, Interferometers, Imaging systems, Reflectivity, Calibration, Optical spheres, Wavefronts

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Proceedings Article | 21 July 2000 Paper

EUCLIDES: first phase completed!

Jos Benschop, Udo Dinger, David Ockwell

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390073

KEYWORDS: Mirrors, Synchrotrons, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Plasma, Fiber optic illuminators, Reflectivity, Projection systems, Semiconducting wafers

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Proceedings Article | 30 September 1994 Paper

Wolter-Schwarzschild solar telescope coronal diagnostic spectrometer (CDS) flight model: manufacturing and assembly

Michael Schmidt, Udo Dinger, T. Petasch, Friedrich Trebstein

Proceedings Volume 2210, (1994) https://doi.org/10.1117/12.188098

KEYWORDS: Mirrors, Cadmium sulfide, Polishing, Ray tracing, Optical alignment, Metrology, Surface finishing, Manufacturing, Spectroscopy, Tolerancing

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Proceedings Article | 25 February 1993 Paper

Substrate material aspects of optics manufacturing for high-intensity synchrotron beamlines

Kurt Becker, Udo Dinger

Proceedings Volume 1739, (1993) https://doi.org/10.1117/12.140490

KEYWORDS: Silicon carbide, Optics manufacturing, Mirrors, Silicon, Surface finishing, Coating, Polishing, Metals, Crystals, Manufacturing

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Proceedings Article | 21 January 1993 Paper

Manufacturing, metrology, and assembly of the mirror system for the CDS-EM

Udo Dinger, T. Petasch, C. Kuebler, A. Ebert, Klaus-Friedrich Beckstette

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140585

KEYWORDS: Mirrors, Polishing, Telescopes, Manufacturing, Optical fabrication, Cadmium sulfide, Metrology, Surface finishing, Spectroscopy, Optics manufacturing

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Showing 5 of 12 publications

SPIE Conference Volume | 18 October 2004

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II

SPIE Conference Volume | 13 January 2004

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications

Conference Committee Involvement (4)

Optical Manufacturing and Testing VI

31 July 2005 | San Diego, California, United States

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II

5 August 2004 | Denver, Colorado, United States

Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications

7 August 2003 | San Diego, California, United States

Optical Manufacturing and Testing V

3 August 2003 | San Diego, California, United States

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