Dr. Vasiliki Kosma Profile

Dr. Vasiliki Kosma

Chemist

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Author

Publications (9)

Proceedings Article | 22 February 2021 Presentation + Paper

EUV lithographic process enablement with novel litho track hardware

Andreia Santos, V. Kosma, J. Vandereyken, H. Marhfour, Y. Tanaka, M. Harumoto, M. Asai, H. Stokes, H. S. Suh, P. Foubert, D. De Simone

Proceedings Volume 11612, 116120M (2021) https://doi.org/10.1117/12.2584515

KEYWORDS: Lithography, Extreme ultraviolet, Photoresist developing, Thin film coatings, Line width roughness, Photoresist materials, Extreme ultraviolet lithography

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Proceedings Article | 25 March 2019 Paper

Radical sensitive zinc-based nanoparticle EUV photoresists

Kou Yang, Hong Xu, Kazunori Sakai, Vasiliki Kosma, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10960, 109601R (2019) https://doi.org/10.1117/12.2514982

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Lithography, Zinc, Optical lithography, Metals, Polymers

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SPIE Journal Paper | 8 December 2018

EUV photolithography: resist progress in metal–organic complex photoresists

Hong Xu, Vasiliki Kosma, Kazunori Sakai, Emmanuel P. Giannelis, Christopher K. Ober

JM3, Vol. 18, Issue 01, 011007, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011007

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Oxides, Optical lithography, Lithography, Hafnium, Etching, Metals, Zirconium

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Proceedings Article | 19 March 2018 Open Access

EUV photolithography: resist progress and challenges

Christopher Ober, Hong Xu, Vasiliki Kosma, Kazunori Sakai, Emmanuel Giannelis

Proceedings Volume 10583, 1058306 (2018) https://doi.org/10.1117/12.2302759

KEYWORDS: Nanoparticles, Photoresist materials, Oxides, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Metals, Hafnium, Zirconium

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Proceedings Article | 19 March 2018 Paper

Patterning mechanism of metal based hybrid EUV resists

Vasiliki Kosma, Kazuki Kasahara, Hong Xu, Kazunori Sakai, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 10583, 105831U (2018) https://doi.org/10.1117/12.2297383

KEYWORDS: Extreme ultraviolet lithography, Metals, Zirconium, Photoresist materials, Extreme ultraviolet, Photoresist developing, FT-IR spectroscopy, Optical lithography, Chemical species, Hafnium

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Proceedings Article | 19 March 2018 Paper

EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning

Hong Xu, Kou Yang, Kazunori Sakai, Vasiliki Kosma, Kazuki Kasahara, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10583, 105831P (2018) https://doi.org/10.1117/12.2297266

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Lithography, Metals, Oxides, Zirconium

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SPIE Journal Paper | 27 September 2017

^{Elucidating the patterning mechanism of zirconium-based hybrid photoresists}

Vasiliki Kosma, Kazuki Kasahara, Hong Xu, Jérémy Odent, Christopher Ober, Emmanuel Giannelis

JM3, Vol. 16, Issue 04, 041007, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041007

KEYWORDS: Photoresist materials, Zirconium, Optical lithography, FT-IR spectroscopy, Metals, Extreme ultraviolet lithography, Photoresist developing, Oxides, Deep ultraviolet, Electron beam lithography

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Proceedings Article | 24 March 2017 Presentation + Paper

Nanoparticle photoresist studies for EUV lithography

Kazuki Kasahara, Hong Xu, Vasiliki Kosma, Jeremy Odent, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10143, 1014308 (2017) https://doi.org/10.1117/12.2258187

KEYWORDS: Nanoparticles, Extreme ultraviolet lithography, Metals, Photoresist materials, Oxides, Extreme ultraviolet, Lithography, Zirconium, Line width roughness, Photoresist developing, Electron beam lithography

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Proceedings Article | 18 March 2016 Paper

Recent progress in nanoparticle photoresists development for EUV lithography

Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu, Mufei Yu, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 9776, 977604 (2016) https://doi.org/10.1117/12.2218704

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist developing, Electron beam lithography

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Showing 5 of 9 publications

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