Dr. Vaishali Vohra Profile

Dr. Vaishali Vohra

Strategic Account Manager at DuPont Electronics & Industrial

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Publications (7)

Proceedings Article | 16 April 2011 Paper

Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Guillaume Landie, Yongan Xu, Sean Burns, Kenji Yoshimoto, Martin Burkhardt, Larry Zhuang, Karen Petrillo, Jason Meiring, Dario Goldfarb, Martin Glodde, Anthony Scaduto, Matthew Colburn, Jason Desisto, Young Bae, Michael Reilly, Cecily Andes, Vaishali Vohra

Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843

KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

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Proceedings Article | 26 March 2010 Paper

Evolution of thermal cure resist for double patterning applications

Michael Reilly, Young Bae, Vaishali Vohra, Chiew-Seng Koay, Matthew Colburn

Proceedings Volume 7639, 76392W (2010) https://doi.org/10.1117/12.846748

KEYWORDS: Double patterning technology, Lithography, Photoresist processing, Semiconducting wafers, Electroluminescence, Astatine, Semiconductors, Image processing, Etching, Polymers

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Proceedings Article | 31 March 2008 Paper

Non-topcoat resist design for immersion process at 32-nm node

Steven Wu, Aroma Tseng, Bill Lin, Chun Chi Yu, Bo-Jou Lu, Wen-Shiang Liao, Deyan Wang, Vaishali Vohra, Cheng Bai Xu, Stefan Caporale, George Barclay

Proceedings Volume 6923, 692307 (2008) https://doi.org/10.1117/12.775542

KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

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Proceedings Article | 29 March 2006 Paper

A novel switchable BARC (SBARC) and process to improve pattern collapse and defect control

Ching Yu Chang, D. C. Yu, J. H. Chen, John C. H. Lin, Burn Lin, James Thackeray, Vaishali Vohra, Gerald Wayton, Tomoki Kurihara

Proceedings Volume 6153, 61530M (2006) https://doi.org/10.1117/12.658416

KEYWORDS: Satellites, Water, Etching, Adhesives, Capillaries, Polymers, Digital watermarking, Photoresist processing, Lithography, Switches

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Proceedings Article | 28 May 2004 Paper

Advances in vortex via fabrication

Marc Levenson, Takeaki Ebihara, Michael Reilly, George Barclay, Vaishali Vorha, Carolyne Stafford, Martin Mastovich, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535652

KEYWORDS: Photomasks, Cadmium sulfide, Semiconducting wafers, Spiral phase plates, Critical dimension metrology, Optical vortices, Distortion, Optical lithography, Phase shifts, Scanning electron microscopy

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Proceedings Article | 12 June 2003 Paper

Fluoropolymer resists for 157-nm lithography

Vaishali Vohra, Xiang-Qian Liu, Katsuji Douki, Christopher Ober, Will Conley, Paul Zimmerman, Daniel Miller

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485097

KEYWORDS: Polymers, Silicon, Fluorine, Lithography, Transparency, Polymerization, Absorbance, Photoresist materials, Resistance, Scanning electron microscopy

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Proceedings Article | 24 July 2002 Paper

Highly transparent resist platforms for 157-nm microlithography: an update

Vaishali Vohra, Katsuji Douki, Young-Je Kwark, Xiang-Qian Liu, Christopher Ober, Young Bae, Will Conley, Daniel Miller, Paul Zimmerman

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474169

KEYWORDS: Polymers, Fluorine, Transparency, Polymerization, Etching, Lithography, Resistance, Absorbance, Scanning electron microscopy, Photoresist materials

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Showing 5 of 7 publications

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