Tristate antiferroelectric and v-shaped liquid crystal materials have recently offered the promise of both the fast switching of ferroelectric materials and the analogue switching of nematic materials at drive voltages compatible with those available from standard CMOS technology thereby making them, at least in principle, suitable for consideration in microdisplay and other photonic applications. AFLC development is in its early stages and the materials are not yet mature enough for widespread commercial use. The object of the ESPRIT funded MINDIS project has been to evaluate AF-LCoS technology. The electro-optical characteristics of a number of experimental materials have been experimentally measured in test cells that emulate the situation of a silicon backplane (e.g., aluminum reflective back electrode etc). Some candidate materials been shown to exhibit high contrast, uniformity and repeatability. A CMOS active matrix backplane with 1000 line resolution has been designed and fabricated. The backplane is capable of operating in digital or analogue modes for FLC and AFLC respectively. Planarization techniques have been applied to the CMOS wafers but planarization has been shown to be more problematic than with previous backplanes. The reasons for this are discussed. The technology has been theoretically evaluated for use in microdisplays for both projection and near-to-eye applications.
Optimal performance of a Liquid Crystal on Silicon (LCoS) device requires an integrated approach incorporating both optical and electrical design elements. In particular, during the design of both the IC back plane and the voltage waveforms used to drive fast switching Ferroelectric LC (FLC) the electro-optical properties of the LC must be considered to ensure that the best use is made of the FLC. Although, SPICE equivalent circuits for FLC materials have been developed and can be used for this purpose their accuracy relies upon the measurement of a number of parameters. Unfortunately, the accuracy of measuring key parameters is often poor, resulting in a relatively large margin of error in the final model. However, this need not be the case. In this paper we present a methodology which uses standard IC parameter extraction software to simulate and optimize the FLC SPICE model parameters such that the model closely matches the measured response of the sample. By using this approach we identify a set of parameters which when combined provide a SPICE equivalent circuit which models the FLC repsonse to a given input waveform.
This paper describes how costings analysis can be incorporated into a framework for process development. It describes how Cost of Ownership can be calculated from the information stored within existing process development tools through the use of CASTT (Cost Analysis in Total TCAD). It provides a method by which manufacturing costs can be forecast and alternative processing options can be compared. The existing elements of Total TCAD framework are described, an outline of the CASTT software is then given and examples are used to illustrate its potential.
This paper describes the integration of TCAD and factory simulation software tools to help facilitate their adoption as an integral part of a DFM (Design for Manufacturability) strategy. Automated exchange of data enables the impact on manufacturing operations to be more readily considered at an earlier stage during the process design procedure. The paper describes the design and operation of the FASTT (Factory Simulation in Total TCAD) software which integrates two commercially available simulation tools--TWB and ManSim/X. Two examples are used to illustrate its application within a DFM strategy.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.