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Wei Cheng
at Shanghai Institute of Optics and Fine Mechanics
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Publications (1)
SPIE Journal Paper | 3 December 2018
Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy
JM3, Vol. 17, Issue 04, 043505, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043505
KEYWORDS: Photomasks, Optimization (mathematics), Extreme ultraviolet lithography, Computer programming, Computer simulations, Evolutionary algorithms, Lithography, Manufacturing, Lithium, High volume manufacturing
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