Dr. Weijie Shi Profile

Dr. Weijie Shi

at Harbin Institute of Technology

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 28 November 2007 Paper

Research of light reflex surface defects detection technology

Jiajun Tian, Yong Yao, Yunxu Sun, Weijie Shi, Xinhui Zhao, Xuelian Yu

Proceedings Volume 6834, 683418 (2007) https://doi.org/10.1117/12.757136

KEYWORDS: Defect detection, Mirrors, Semiconductors, Semiconducting wafers, Digital image processing, Image fusion, Surface finishing, Polishing, Manufacturing, Light sources

Read Abstract +

The surface defects (indentations, humps, scores) of semiconductor wafers are the major factor to affect the performance of the semiconductor devices. Moreover, these defects make the manufacturing process difficult or yield of the semiconductor devices decrease. Consequently, it is necessary to do an on-line wafers detection in the benefit of the performance and yield of the devices. Thus, developing a way suited for practical detection is the urgent affair faced to people. The optical methods are the most suited ways for surface defects detection because of their non-contact operation. We discuss a relatively unknown method of the light reflex surface defects detection technology (Makyoh (or magic-mirror) topography (MT)). The optical system that we designed achieves the detection mode of the parallel light vertical incidence for the first time. It corrects the deviation between the tradition light path and arithmetic, promotes the detection precision. A lot of experiments based on this optical system are taken to get the difference between the detection modes of vertical incidence and the oblique incidence. The experiments prove that the vertical incidence mode excels the oblique incidence mode. The MT images are also analyzed and disposed. The quantitative measurement can be realized by digital image processing technology.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years