Mr. Weiling Kang Profile

Weiling Kang

at Peking Univ Shenzhen Graduate School

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Author

Publications (8)

Proceedings Article | 31 March 2014 Paper

Understanding the critical challenges of self-aligned octuple patterning

Ji Yu, Wei Xiao, Weiling Kang, Yijian Chen

Proceedings Volume 9052, 90521P (2014) https://doi.org/10.1117/12.2046094

KEYWORDS: Optical lithography, Etching, Algorithm development, Photomasks, Magnesium, Critical dimension metrology, Back end of line, Feature extraction, Statistical analysis, Carbon

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Proceedings Article | 12 April 2013 Paper

A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling

Yijian Chen, Weiling Kang, Pan Zhang

Proceedings Volume 8683, 86830Z (2013) https://doi.org/10.1117/12.2010582

KEYWORDS: Optical lithography, Etching, Photomasks, Scanners, Carbon, Phase only filters, Lithography, Process modeling, Failure analysis, Logic

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Proceedings Article | 29 March 2013 Paper

Compact modeling of fin-width roughness induced FinFET device variability using the perturbation method

Qi Cheng, Weiling Kang, Yijian Chen

Proceedings Volume 8684, 86840I (2013) https://doi.org/10.1117/12.2011551

KEYWORDS: TCAD, Oxides, Instrument modeling, Line width roughness, Performance modeling, Lithography, Doping, Interfaces, Differential equations

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Proceedings Article | 29 March 2013 Paper

Process characteristics and layout decomposition of self-aligned sextuple patterning

Weiling Kang, Yijian Chen

Proceedings Volume 8684, 86840F (2013) https://doi.org/10.1117/12.2011370

KEYWORDS: Magnesium, Optical lithography, Photomasks, Algorithm development, Detection and tracking algorithms, Feature extraction, Logic, Electronics engineering, Computer engineering, Semiconductors

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Proceedings Article | 29 March 2013 Paper

Mask strategy and layout decomposition for self-aligned quadruple patterning

Weiling Kang, Chen Feng, Yijian Chen

Proceedings Volume 8684, 86840E (2013) https://doi.org/10.1117/12.2011261

KEYWORDS: Magnesium, Photomasks, Optical lithography, Feature extraction, Critical dimension metrology, Algorithm development, Electronic design automation, Logic, Detection and tracking algorithms, Directed self assembly

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Proceedings Article | 17 March 2012 Paper

Mandrel and spacer engineering based self-aligned triple patterning

Yijian Chen, Qi Cheng, Weiling Kang

Proceedings Volume 8328, 83280O (2012) https://doi.org/10.1117/12.899888

KEYWORDS: Etching, Optical lithography, Photomasks, Oxides, Line width roughness, Lithography, Silicon, Wet etching, Dry etching, Carbon

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Proceedings Article | 15 March 2012 Paper

Overlay, decomposition and synthesis methodology for hybrid self-aligned triple and negative-tone double patterning

Weiling Kang, Yijian Chen

Proceedings Volume 8327, 83270N (2012) https://doi.org/10.1117/12.916495

KEYWORDS: Photomasks, Optical lithography, Double patterning technology, Silicon, Image processing, Oxides, Etching, Algorithm development, Optical proximity correction, Lithography

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Proceedings Article | 13 March 2012 Paper

Technological merits, process complexity, and cost analysis of self-aligned multiple patterning

Yijian Chen, Qi Cheng, Weiling Kang

Proceedings Volume 8326, 832620 (2012) https://doi.org/10.1117/12.916490

KEYWORDS: Etching, Optical lithography, Photomasks, Carbon, Lithography, Oxides, Scanners, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Showing 5 of 8 publications

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