Ms. Wendy Yeh Profile

Wendy Yeh

at Applied Materials Inc

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Author

Publications (3)

Proceedings Article | 25 March 2008 Paper

Wafer edge polishing process for defect reduction during immersion lithography

Motoya Okazaki, Raymond Maas, Sen-Hou Ko, Yufei Chen, Paul Miller, Mani Thothadri, Manjari Dutta, Chorng-Ping Chang, Abraham Anapolsky, Chris Lazik, Yuri Uritsky, Martin Seamons, Deenesh Padhi, Wendy Yeh, Stephan Sinkwitz, Chris Ngai

Proceedings Volume 6922, 69223A (2008) https://doi.org/10.1117/12.773113

KEYWORDS: Semiconducting wafers, Polishing, Immersion lithography, Particles, Lithography, Inspection, Surface finishing, Manufacturing, Etching, Chemistry

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Proceedings Article | 17 December 2003 Paper

Beyond k₁=0.25 lithography: 70-nm L/S patterning using KrF scanners

Takeaki Ebihara, Marc Levenson, Wei Liu, Jim He, Wendy Yeh, Sang Ahn, Toshihiro Oga, Meihua Shen, Hichem M'saad

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518104

KEYWORDS: Photomasks, Etching, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Reflectivity, Optical alignment, Scanners

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Proceedings Article | 26 June 2003 Paper

Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Wei Liu, David Mui, Thorston Lill, May Wang, Christopher Bencher, Michael Kwan, Wendy Yeh, Takeaki Ebihara, Toshihiro Oga

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485532

KEYWORDS: Etching, Carbon, Photoresist materials, Lithography, Photomasks, 193nm lithography, Critical dimension metrology, Reflectivity, Antireflective coatings, Optical lithography

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