Dr. Wenjie Li
Advisory Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 23 March 2007 Paper
Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu
Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231
KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

Proceedings Article | 29 March 2006 Paper
Wu-Song Huang, William Heath, Ranee Kwong, Wenjie Li, Kaushal Patel, Pushkara Rao Varanasi
Proceedings Volume 6153, 61530S (2006) https://doi.org/10.1117/12.656641
KEYWORDS: Polymers, Reflectivity, Fluorine, Antireflective coatings, Semiconducting wafers, Critical dimension metrology, Destructive interference, Transmittance, Refractive index, 193nm lithography

Proceedings Article | 29 March 2006 Paper
Kaushal Patel, Victor Pham, Wenjie Li, Mahmoud Khojasteh, Pushkara Rao Varanasi
Proceedings Volume 6153, 61530Q (2006) https://doi.org/10.1117/12.656605
KEYWORDS: Etching, Polymers, Fluorine, Photoresist materials, Chemical species, Oxygen, Data modeling, Reactive ion etching, Photomasks, Photoresist developing

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601621
KEYWORDS: Polymers, Lithography, Immersion lithography, Materials processing, Semiconducting wafers, Particles, Photoresist materials, Image processing, Photoresist processing, Scanners

Proceedings Article | 4 May 2005 Paper
Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700
KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

Proceedings Article | 28 May 2004 Paper
Ronald DellaGuardia, Ranee Kwong, Wenjie Li, Peggy Lawson, Martin Burkhardt, Ioana Grauer, Qiang Wu, M. Angyal, H. Hichri, Ian Melville, K. Kumar, Y. Lin, Steven Holmes, R. Varanasi, T. Spooner, D. McHerron
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544238
KEYWORDS: Lithography, Etching, Photomasks, Semiconducting wafers, Metals, Critical dimension metrology, Silicon, Image processing, Back end of line, Finite element methods

Proceedings Article | 28 August 2003 Paper
Wu-Song Huang, Wei He, Wenjie Li, Wayne Moreau, Robert Lang, David Medeiros, Karen Petrillo, Arpan Mahorowala, Marie Angelopoulos, Christina Deverich, Chester Huang, Paul Rabidoux
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504049
KEYWORDS: Etching, Photomasks, Polymers, Silicon, Chromium, Semiconducting wafers, Mask making, Resistance, Lithography, Scanning electron microscopy

Proceedings Article | 12 June 2003 Paper
Arpan Mahorowala, Dario Goldfarb, Karen Temple, Karen Petrillo, Dirk Pfeiffer, Katherina Babich, Marie Angelopoulos, Gregg Gallatin, Stacy Rasgon, Herbert Sawin, Scott Allen, Robert Lang, Margaret Lawson, Ranee Kwong, Kuang-Jung Chen, Wenjie Li, Pushkara Varanasi, Martha Sanchez, Hiroshi Ito, Gregory Wallraff, Robert Allen
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485168
KEYWORDS: Etching, Oxides, Scanning electron microscopy, Line edge roughness, Atomic force microscopy, Polymers, Plasma, Plasma etching, Chemistry, Photoresist processing

Proceedings Article | 12 June 2003 Paper
Wenjie Li, Pushkara Varanasi, Margaret Lawson, Ranee Kwong, Kuang-Jung Chen, Hiroshi Ito, Hoa Truong, Robert Allen, Masafumi Yamamoto, Eiichi Kobayashi, Mark Slezak
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485100
KEYWORDS: Polymers, Etching, Lithography, Resistance, Fluorine, Surface roughness, Dry etching, Semiconducting wafers, 193nm lithography, Polymer thin films

Proceedings Article | 11 March 2002 Paper
David Medeiros, Karen Petrillo, James Bucchignano, Marie Angelopoulos, Wu-Song Huang, Wenjie Li, Wayne Moreau, Robert Lang, Ranee Kwong, Christopher Magg, Brian Ashe
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458334
KEYWORDS: Etching, Photomasks, Resistance, Mask making, Lithography, Polymers, Scanning electron microscopy, Packaging, Plasma, Electron beam lithography

Proceedings Article | 24 August 2001 Paper
Toru Kajita, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, A. Soyano, A. Kataoka, Mark Slezak, Makoto Shimizu, Pushkara Varanasi, G. Jordahamo, Margaret Lawson, R. Chen, William Brunsvold, Wenjie Li, Robert Allen, Hiroshi Ito, Hoa Truong, Thomas Wallow
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436833
KEYWORDS: Etching, Monochromatic aberrations, Chemistry, Polymers, Lithography, Polymerization, Resistance, Imaging systems, Surface roughness, Transparency

Proceedings Article | 24 August 2001 Paper
Wenjie Li, Pushkara Varanasi, Margaret Lawson, Timothy Hughes, George Jordhamo, Robert Allen, Hiroshi Ito
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436909
KEYWORDS: Polymers, Lithography, Etching, Resistance, Reactive ion etching, Polymerization, Silicon, Semiconducting wafers, Standards development, Transparency

Proceedings Article | 23 June 2000 Paper
Pushkara Varanasi, George Jordhamo, Margaret Lawson, K. Rex Chen, William Brunsvold, Timothy Hughes, Robin Keller, Mahmoud Khojasteh, W. Li, Robert Allen, Hiroshi Ito, Juliann Opitz, Hoa Truong, Thomas Wallow
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388280
KEYWORDS: Polymers, Etching, Lithography, Reactive ion etching, Surface roughness, Photomasks, 193nm lithography, Phase shifts, Deep ultraviolet, Photoresist materials

Proceedings Article | 8 October 1999 Paper
Andrew Tay, Francis Tay, Wenjie Li
Proceedings Volume 3893, (1999) https://doi.org/10.1117/12.368420
KEYWORDS: Silicon, Aluminum, Resistance, Microelectromechanical systems, Heat flux, Convection, Fluctuations and noise, Microfluidics, Cooling systems, Computer programming

Proceedings Article | 28 June 1999 Paper
X.-S. Miao, Tow Chong Chong, L. Shi, P. Tan, Wenjie Li
Proceedings Volume 3864, 38642J (1999) https://doi.org/10.1117/12.997655
KEYWORDS: Crystals, Germanium antimony tellurium, Reflectivity, Antimony, Sputter deposition, Optical discs, Dielectrics, Doping, Optical storage, X-ray diffraction

Showing 5 of 15 publications
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