One- and two-dimensional MEMS scanning mirrors for resonant or quasi-stationary beam deflection are primarily known as tiny micromirror devices with aperture sizes up to a few Millimeters and usually address low power applications in high volume markets, e.g. laser beam scanning pico-projectors or gesture recognition systems. In contrast, recently reported vacuum packaged MEMS scanners feature mirror diameters up to 20 mm and integrated high-reflectivity dielectric coatings. These mirrors enable MEMS based scanning for applications that require large apertures due to optical constraints like 3D sensing or microscopy as well as for high power laser applications like laser phosphor displays, automotive lighting and displays, 3D printing and general laser material processing. This work presents modelling, control design and experimental characterization of gimbal-less MEMS mirrors with large aperture size. As an example a resonant biaxial Quadpod scanner with 7 mm mirror diameter and four integrated PZT (lead zirconate titanate) actuators is analyzed. The finite element method (FEM) model developed and computed in COMSOL Multiphysics is used for calculating the eigenmodes of the mirror as well as for extracting a high order (n < 10000) state space representation of the mirror dynamics with actuation voltages as system inputs and scanner displacement as system output. By applying model order reduction techniques using MATLABR a compact state space system approximation of order n = 6 is computed. Based on this reduced order model feedforward control inputs for different, properly chosen scanner displacement trajectories are derived and tested using the original FEM model as well as the micromirror.
A higher achievable scan speed and the capability to integrate two scan axes in a very compact device are fundamental
advantages of MEMS scanning mirrors over conventional galvanometric scanners. There is a growing demand for
biaxial high speed scanning systems complementing the rapid progress of high power lasers for enabling the
development of new high throughput manufacturing processes. This paper presents concept, design, fabrication and test
of biaxial large aperture MEMS scanning mirrors (LAMM) with aperture sizes up to 20 mm for use in high-power laser
applications. To keep static and dynamic deformation of the mirror acceptably low all MEMS mirrors exhibit full
substrate thickness of 725 μm. The LAMM-scanners are being vacuum packaged on wafer-level based on a stack of 4
wafers. Scanners with aperture sizes up to 12 mm are designed as a 4-DOF-oscillator with amplitude magnification
applying electrostatic actuation for driving a motor-frame. As an example a 7-mm-scanner is presented that achieves an
optical scan angle of 32 degrees at 3.2 kHz. LAMM-scanners with apertures sizes of 20 mm are designed as passive
high-Q-resonators to be externally excited by low-cost electromagnetic or piezoelectric drives. Multi-layer dielectric
coatings with a reflectivity higher than 99.9 % have enabled to apply cw-laser power loads of more than 600 W without
damaging the MEMS mirror. Finally, a new excitation concept for resonant scanners is presented providing
advantageous shaping of intensity profiles of projected laser patterns without modulating the laser. This is of interest in
lighting applications such as automotive laser headlights.
The design and manufacturing of a piezoelectrically driven translatory MEMS actuator is presented, which features a 7
mm aperture and four thin-film PZT actuators achieving large displacements. The actuator performs piston mode
oscillation in resonance which can serve for Fourier Transform Infrared Spectroscopy (FTIR). Thereby vertical
displacements in piston mode of up to ± 800 μm at 163 Hz and 25 V driving sinusoidal voltage has been achieved under
ambient conditions. Due to the low frequencies and the low driving voltages only low power consumption is required.
The effect of residual gas friction and internal friction on the piezo-driven MEMS actuator is analyzed by measuring Qvalues
associated with the piston mode. Laser Doppler Vibrometry (LDV) was also used to detect and analyses the
parasitic effects especially tilting which superimposes the vertical movement of the mirror. The deviation from the pure
vertical piston mode was found to 1.3 μm along the x and 3 μm in the y-axis.
PZT driven resonant micromirrors offer advantages of large scan angles and decreasing power consumption due to the
benefits of resonant driving and high torque delivered by PZT actuators. Therefore they are entering into different
application fields recently, for example as laser projection or head-up displays. For many uses position sensing of the
micromirrors is necessary to set up closed loop controls. Thus, the development of integrated position sensors is aimed in
this work. Investigation and evaluation of different position sensing principles have been performed. In previous works
1D and 2D PZT driven resonant micromirrors have been presented, which feature various spring suspensions and thinfilm
PZT actuators as drivers. Due to the considerably different motion modes and resonant frequencies, which vary
from 100 Hz up to 64 kHz, various position detection methods have been investigated. This work presents primarily
fabrication and characterization results of the position sensors based on the direct piezoelectric effect, which will be
compared to the position sensors using metallic strain gauge realized by the same fabrication technology. Analyses of the
sensitivity, linearity and dynamic behavior of the sensors have been performed, by means of comparing the sensor
signals and the micromirror position signals measured by a Position-Sensitive-Device. Advantages and drawbacks of the
sensors are discussed and methods for eliminating the drawbacks are proposed.
This paper presents designs and fabrication process of two single-axis PZT micromirrors with 1 mm diameter and 1.4 mm × 4 mm apertures, whose frequencies are 60 kHz and 17 kHz, respectively. These micromirrors achieve large optical scan angles of about 40° driven by 10 V rectangular pulses and show high Q-factors of more than 1000. The investigation on the long-term stability of a PZT driven micromirror has detected more than 100 Billion cycles. The combined results of experimental diagnostics and FEM analyses give rise to new designs iteratively leading to a larger deflection and appropriate frequencies, which are currently fabricated.
Typical applications for resonantly driven vacuum packaged MEMS scanners including laser projection displays
require a feedback signal for closed-loop operation as well as high accuracy angle synchronization for data processing.
A well known and widely used method is based on determining the angular velocity of the oscillating
micromirror by measuring the time derivative of a capacitance. In this work we analyze a capacitive sensing approach
that uses integrated vertical comb structures to synchronize the angular motion of a torsional micromirror
oscillating in resonance. The investigated measurement method is implemented in a laser display that generates
a video projection by scanning a RBG laser beam. As the 2D-micromirror performs sinusoidal oscillations on
both perpendicular axes a continuously moving Lissajous pattern is projected. By measuring the displacement
current due to an angular deflection of the movable comb structures an appropriate feedback signal for actuation
and data synchronization is computed. In order to estimate the angular deflection and velocity a mathematical
model of the capacitive sensing system is presented. In particular, the nonlinear characteristic of the capacitance
as a function of the angle that is calculated using FEM analysis is approximated using cubic splines. Combining
this nonlinear function with a dynamic model of the micromirror oscillation and the analog electronics a mathematical
model of the capacitive measurement system is derived. To evaluate the proposed model numerical
simulations are realized using MATLAB/Simulink and are compared to experimental measurements.
Low-cost automotive laser scanners for environmental perception are needed to enable the integration of advanced driver assistant systems into all automotive vehicle segments, which is a key to reduce the number of traffic accidents on roads. Within the scope of the European-funded project MiniFaros, partners from five different countries have been cooperating in developing a small-sized low-cost time-of-flight-based range sensor. An omnidirectional 360-deg laser scanning concept has been developed based on the combination of an omnidirectional lens and a biaxial large aperture MEMS mirror. The concept, design, fabrication, and first measurement results of a resonant biaxial 7-mm gimbal-less MEMS mirror that is electrostatically actuated by stacked vertical comb drives is described. Identical resonant frequencies of the two orthogonal axes are necessary to enable the required circle scanning capability. A tripod suspension was chosen, since it minimizes the frequency splitting of the two resonant axes. Low-mirror curvature is achieved by a thickness of the mirror of more than 500 μm. Hermetic wafer-level vacuum packaging of such large mirrors based on multiple wafer bonding has been developed to enable a large mechanical tilt angle of ±6.5 deg in each axis. Due to the large targeted tilt angle of ±15 deg and because of the MEMS mirror actuator having a diameter of 10 mm, a cavity depth of about 1.6 mm has been realized.
Low-cost automotive laser scanners for environment perception are needed to enable the integration of advanced driver assistant systems (ADAS) into all automotive vehicle segments, a key to reducing the number of traffic accidents on roads. An omnidirectional 360 degree laser scanning concept has been developed based on combination of an omnidirectional lens and a biaxial large aperture MEMS mirror. This omnidirectional scanning concept is the core of a small sized low-cost time-of-flight based range sensor development. This paper describes concept, design, fabrication and first measurement results of a resonant biaxial 7mm gimbal-less MEMS mirror that is electrostatically actuated by stacked vertical comb drives. Identical frequencies of the two resonant axes are necessary to enable the required circle scanning capability. A tripod suspension was chosen since it allows minimizing the frequency splitting of the two resonant axes. Low mirror curvature is achieved by a thickness of the mirror of more than 500 μm. Hermetic wafer level vacuum packaging of such large mirrors based on multiple wafer bonding has been developed to enable to achieve a large mechanical tilt angle of +/- 6.5 degrees in each axis. The 7mm-MEMS mirror demonstrates large angle circular scanning at 1.5kHz.
This paper presents design, fabrication and measurements for single-axis piezoelectric MEMS micromirrors with 1 mm2 apertures. These micromirrors, which feature thin-film PZT actuators and mechanical leverage amplification, are dedicated for laser projection and meet the requirements of high resonant frequency and large deflection angles. To identify the optimal micromirror geometries a parametric study by means of FEM simulations and analytic modeling has been performed. Characterization, related to the material qualities of PZT and the mechanical performance of the micromirrors, have verified the reliability of the process, the robustness and the performance of the fabricated prototypes. According to the measurements the fabricated micromirrors feature high Q-factor about 1570. The micromirror reaches the θopt·D product of 42.5 °·mm at 32 kHz driven by a low voltage of 7 V. Furthermore, new designs with larger apertures and deflections are currently being developed.
For many applications it is inevitable to protect MEMS devices against environmental impacts like humidity which can affect their performance. Moreover recent publications demonstrates that micro mirrors can achieve very large optical scan angles at moderate driving voltages even exceeding 100 degrees when hermetically sealed under vacuum. While discrete chips may be evacuated and sealed on single die level using small can packages like TO housings, it is obvious that for high volume production a much more economical solution for the realisation of transparent optical packages already on wafer level must be developed. However, since any laser beam crossing a transparent glass surface is partly reflected even when anti-reflective coatings are applied, the construction of a wafer level optical housing suitable for laser projection purpose requires more than the integration of simple plane glass cap. The use of inclined optical windows avoids the occurrence of intense reflections of the incident laser beam in the projected images. This paper describes a unique technology to fabricate glass packages with inclined optical windows for micro mirrors on 8 inch wafers. The new process uses a high temperature glass forming process based on subsequent wafer bonding. A borosilicate glass wafer is bonded together with two structured silicon wafers. By grinding both sides of the wafer stack, a pattern of isolated silicon structures is defined. This preprocessed glass wafer is bonded thereon on a third structured silicon wafer, wherein the silicon islands are inserted into the cavities. By setting a defined pressure level inside the cavities during the final wafer bonding, the silicon glass stack extruded and it is out of plane during a subsequent annealing process at temperatures above the softening point of the glass. Finally the silicon is selectively removed in a wet etching process. This technique allows the fabrication of 8 inch glass wafers with oblique optical surfaces with surface roughness <1 nm and an evenness of < 300 nm.
Small size, low power consumption and the capability to produce sharp images without need of an objective make
MEMS scanning laser based pico-projectors an attractive solution for embedded cell-phone projection displays. To fulfil
the high image resolution demands the MEMS scanning mirror has to show large scan angles, a large mirror aperture
size and a high scan frequency. An additional important requirement in pico-projector applications is to minimize power
consumption of the MEMS scanner to enable a long video projection time. Typically high losses in power are caused by
gas damping. For that reason Fraunhofer ISIT has established a fabrication process for 2D-MEMS mirrors that includes
vacuum encapsulation on 8-inch wafers. Quality factors as high as 145,000 require dedicated closed loop phase control
electronics to enable stable image projection even at rapidly changing laser intensities. A capacitive feedback signal is
the basis for controlling the 2D MEMS oscillation and for synchronising the laser sources. This paper reports on
fabrication of two-axis wafer level vacuum packaged scanning micromirrors and its use in a compact laser projection
display. The paper presents different approaches of overcoming the well-known reflex problem of packaged MEMS
scanning mirrors.
In this paper further developments [1,2] of a passive matrix projection/direct view display are presented. The device uses micromachined and electrostatic actuated Fabry-Perot filters. Applications are surface topology measurements (stereographic projection) in small cavities, laser beam writing and pattern projection e.g. in Head-Mount-displays, automotive or information panels. The display pixels with diameters in the order of 100 μm consist of a layer stack fabricated by LPCVD. The stack embeds an air gap which his created by a sacrificial etch process and a thin membrane which can be deflected electrostatically. The fabrication process has already been described elsewhere [2]. By membrane actuation the gap thickness is lowered and the interference spectrum generated by the layer stack is varied. The careful adjustment of the
layer parameters like thickness and refractive index determines the design wavelength of the switches. They are assembled in rows and columns, resulting in an n*m-display matrix, where n*m actually is 4800. In principle the display may either be fabricated for transmission or reflection mode, depending on the substrate material (quartz or silicon). This paper focuses on transmissive displays. For pattern generation, an electric potential scan is applied on the n line contacts, and a video potential, which carries the image information, is addressed on the m column contacts. After each scan cycle, the potential polarities are reversed in order to avoid charge effects and to lower cross-talk between adjacent pixels. The response time is 100 μs, which is at least an order of magnitude faster than for common LCD technology. Further advantages are high temperature stability, low power consumption and low production costs, since only five mask layers are used in the present process. In this paper especially the electrical characteristics are evaluated and an addressing scheme for future active matrix addressing is derived.
In this paper a new approach for the realisation of a passive matrix image projection display consisting of electrostatic actuated Fabry-Perot filters for digital wavelength switching is presented. The switches either may be working by illumination with polychromatic or with monochromatic light, e.g. by a laser. In the first case the output light has to be filtered at the desired wavelength. In order to define the interferometric properties of the dielectric layers and thus the switching wavelength optical parameters like thickness and refractive index have to be adjusted carefully. The display switches can be adapted either to reflection or transmission mode, depending on whether silicon or quartz is used as substrate material. Especially hexagonal shaped pixel membranes for working either in reflection at a wavelength of 536 nm or in transmission for 500 nm are described. The assembly is arranged matrix-like in rows and columns, where at each intersection point a pixel is located. The switching of a pixel into the 'on'-state is achieved by applying a voltage on the corresponding row and column contact lines of the display. The resulting intersection potential deflects the addressed pixel membrane whereas adjacent pixels are nearly not affected. Actual measurements allow high switching frequencies of about 2 kHz at voltages in the range of 2 - 60 V, depending on the pixel design. The switching contrast maximum is aobut 80%, the contrast beteeen addressed and non-addressed adjacent pixels is 75%.
As displacement and electrode gap coincide in parallel plate electrode configurations, electrostatic actuators struggle with elevated actuation voltages for reasonable displacements or restoring forces in MEMS. A curved-cantilever-beam-type actuator overcoming this dependence was presented by several workgroups for microvalves, microrelays or micro-mirrors. Stress gradients achieved during fabrication result in out-of-plane curvature of the beam electrode. The tip deflection can be scaled by the beam length, while the minimum electrode gap is kept small aiming at actuation voltages common to microelectronics. This actuator appeals to switching applications requiring low-power drive, high deflections and short cycle times. Our approach employs microelectroplating of nickel and thermal postprocessing instead of multi-layer stacks achieved from semiconductor-based fabrication technologies. As stress gradients needed for the beam curvature distribute on wafer level and may alter during packaging or even in operation, advanced methods for controlling the actuator’s bending geometry are needed. A bending predefinition can be obtained during electroplating. The final beam curvature is achieved by tempering on wafer level for stabilisation and succeeding fine-tuning with local LASER-treatment near the suspension. Advanced actuator prototypes for microvalves or microrelays will be presented. Also, the suitability of the actuator for rf-switches will be indicated.
This paper presents a micro reactor, which consists of a permeable membrane fabricated by silicon micro machining technology. The fabrication process is a combination of anisotropic silicon etching (wet etching and dry etching) and porous silicon technology. To avoid a reaction chamber with a high dead volume, we have realised a permeable membrane in conjunction with porous silicon to achieve a high surface to volume ratio, impregnated with palladium or platinum. For the activation of the heterogeneous reaction on the surface of the catalytic material a heating element around the permeable membrane, which is thermally decoupled with a porous silicon well of the surrounding bulk material is realised. The gas flows through the membrane and reacts during the passing time. The reaction time for gases depends on the membrane thickness and the active surface of the porous silicon. The application is the integration into a gas analysing system combined with a gas sensor array, a gas chromatographic system, microvalves, and calibration units mounted all on a pneumatic motherboard.
Porous silicon fabricated by partial electrochemical dissolution of bulk silicon, shows outstanding material properties. The nanostructure of the remaining Si-skeleton is used for specific optical devices, such as emitters and filters. The high internal surface of the material opens new opportunities for different types of microsensors and -actuators and microsystem concepts. The porous layers can be used as sacrificial layers due to the high reactivity of the material which leads to a new class of micromachined MEMS devices. A brief overview on the historic evolution of the material is given. The base technologies for the fabrication of porous silicon layers are described. An overview on specific applications is given to demonstrate the potential of the material and the technology behind.
Surface micromachining is an established micro technology. The process is only limited by sacrificial layer thickness and sometimes a disturbing surface topology. This paper describes an innovative surface micromachining technology. Standard surface micromachining allows layer thickness of a few micrometer. Using porous silicon as sacrificial layer, it is possible to create any layer thickness up to 100 micrometers . Thick porous silicon sacrificial layers are used to combine the advantages of standard surface micromachining with the advantages of bulk micromachining. The problems resulting form surface topology are eliminated by using ion implanted masks. Based on different porous silicon formation mechanism for - and p-type silicon, it is possible to use n- implanted layers as masking material during the anodization of p-type silicon, resulting in a planar surface. For this masking technology, no additional masking layers are required. For free standing membrane generation it is possible to deposit e.g. a PECVD-layer on top of the porous silicon layer. If required, e.g. to protect free standing structures during following process steps from mechanical failures, it is possible to remove sacrificial layers with diluted alkaline solution in a final process step after dicing. A complete process flow has been developed for thick porous silicon layers up to 100 micrometers . The use of this sacrificial layer technology for thermally isolate gas sensor membrane fabrication and the detailed process parameters will be presented.
Presently two porous silicon formation technologies are published: the anodization into an electro chemical cell and stain etch without external current into a hydrofluoric acid/nitride acid solution. For anodization an external current is necessary in order to achieve porous silicon thicknesses up to 100 micrometers . Stain etch is an electroless process, and the porous layer thickness sis limited to a few micrometers. A novel porous silicon formation technique that combines the advantages of thick layer anodization and electroless stain etch will be shown. A current generated by a galvanic element of silicon and a precision metal on the backside of a silicon wafer in a hydrofluoric acid (HF)/hydrogen peroxide (H2O2)/ethanol electrolyte is utilized in order to generate porous silicon. In this case the silicon operates as anode and the metal as cathode for current generation. This current is similar to the external current needed for anodization. Beside the standard porous silicon etch solution HF and ethanol to oxidizing agent H2O2 is used to support the etch process and to generate a higher etch rate. Etch rate control is given by concentration of etching solution and metalization. Different kinds of metalizations and etching solutions were investigated. This novel technology enables to generate stable porous silicon layers of e.g. 80 micrometers within 10 minutes without an external current. This can be the first efficient way for porous silicon batch processing. Detailed process parameters and characterization will be presented.
This paper reports on a new integration concept for MEMS based on an Additive Electroplating Technology (AET). This technology allows the integration of fixed and movable electroplated microstructure on top of a standard ASIC by a low temperature back-end process. The basic fabrication sequence of the AET including aspects of a first level packaging will be presented. Various examples of novel MEMS for automotive and medical applications will show the capability and the limitations of this integration concept.
A low temperature back-end process for micromachined electroplated vibrating structures has been developed. It is supposed to be processed on top of available ASIC's, independent on fabrication technology of ASIC's. Structures can be fabricate without a cap as well as encapsulated. Undesired underetching of the plating base could be overcome by an oxidation process step. Thus, the minimum width of fixed structures could be significantly reduced. To evaluate mechanical properties of electroplated moveable nickel structures, single-mass resonators have been laid out and fabricated. Moreover, the single-mass structure is representative for excitation mode of a gyroscope, which is composed of two masses, one for excitation and detection mode each. The sensor system is mechanically decoupled as the in-plane vibration modes of excitation and detection mode are perpendicular to each other. To accomplish large deflection, lateral vibration spring-mass systems are used. The resonators are electrostatically excited using comb drives. Deflections of 19 micrometers are obtained and nickel resonators show Q-factor of up to 1500. Deposition of nickel structures has been accomplished using a commercially available nickel sulfamate-based solution. Initial fatigue testing of nickel microresonators has been carried out. There is no measurable fatigue after an operating time of 250 hours.
Bonding of silicon wafers is a method that is widely used in microsystem technology. To quantify the quality of the bond only IR interference techniques which are restricted to vertical sizes of voids <EQ 250 nm have been applied up to now. The new idea is to use acoustic microscopy for the examination of these bonds. In order to be able to evaluate the possibilities and limitations of such a method we worked out a preparation technique to investigate bonded silicon wafers with defined etched structures. Etched wafers were bonded to nonetched wafers, chips of 10 X 15 mm2 size were sawed out of the wafer pair followed by grinding and polishing these structures under small angles of 34 feet to 3 degrees. With working frequencies of 200 MHz and 400 MHz we obtained good results with structures that have a height of 50 nm and a horizontal size of some micrometers. It was possible to show structures that were covered with a silicon layer that is 70 micrometers thick. Additionally wafer pairs with metallic interlayers were investigated. The results are compared with images taken with an IR transmission optical microscope.
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