Dr. Wolfgang Emer Profile

Dr. Wolfgang Emer

at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 26 May 2022 Presentation + Paper

On-scanner high-spatial-frequency overlay control using a distortion manipulator

Friso Klinkhamer, Bart Smeets, Theo Thijssen, Francis Fahrni, Wim de Boeij, Mohamed El Kodadi, Thilo Pollak, Wolfgang Emer

Proceedings Volume 12051, 120510K (2022) https://doi.org/10.1117/12.2614031

KEYWORDS: Distortion, Scanners, Overlay metrology, Metrology, Lithography, Interfaces, Spatial frequencies, Semiconducting wafers, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2020 Presentation + Paper

A novel projection lens manipulator for high frequent overlay tuning

Thilo Pollak, Wolfgang Emer, Bernd Thüring, Francis Fahrni, Friso Klinkhamer, Wim de Boeij, Wim Bouman

Proceedings Volume 11327, 113270T (2020) https://doi.org/10.1117/12.2552063

KEYWORDS: Distortion, Spatial frequencies, Semiconducting wafers, Overlay metrology, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Immersion lithography, Lithography

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Proceedings Article | 16 March 2009 Paper

Extending single-exposure patterning towards 38-nm half-pitch using 1.35 NA immersion

Igor Bouchoms, Andre Engelen, Jan Mulkens, Herman Boom, Richard Moerman, Paul Liebregts, Roelof de Graaf, Marieke van Veen, Patrick Thomassen, Wolfgang Emer, Frank Sperling

Proceedings Volume 7274, 72741K (2009) https://doi.org/10.1117/12.813649

KEYWORDS: Semiconducting wafers, Imaging systems, Polarization, Optical lithography, Control systems, Critical dimension metrology, Printing, Thin film coatings, Immersion lithography, Lithography

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Proceedings Article | 30 July 2002 Paper

System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

Koen van Ingen Schenau, Hans Bakker, Mark Zellenrath, Richard Moerman, Jeroen Linders, Thomas Rohe, Wolfgang Emer

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474612

KEYWORDS: Lithography, Monochromatic aberrations, Imaging systems, Photomasks, Scanning electron microscopy, Critical dimension metrology, Binary data, Manufacturing, Semiconducting wafers, Image sensors

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Proceedings Article | 17 August 1999 Paper

Apochromatic reflection optics used in UV interferometry

Andreas Pfoertner, Wolfgang Emer, Johannes Schwider

Proceedings Volume 3745, (1999) https://doi.org/10.1117/12.357805

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Proceedings Article | 30 June 1998 Paper

Interferometry with VUV wavelengths

Wolfgang Emer, Johannes Schwider

Proceedings Volume 3478, (1998) https://doi.org/10.1117/12.312937

KEYWORDS: Interferometry, Vacuum ultraviolet, Objectives, Light sources, Interferometers, Mirrors, Excimer lasers, Sensors, Beam splitters, Imaging systems

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Showing 5 of 6 publications

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