Mr. Woo-Gun Jeong Profile

Woo-Gun Jeong

at Photronics Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 13 July 2017 Paper

Application of advanced structure to multi-tone mask for FPD process

Jin-Han Song, Jin-Woong Jeong, Kyu-Sik Kim, Woo-Gun Jeong, Sang-Pil Yun, Dong-Heok Lee, Sang-Soo Choi

Proceedings Volume 10454, 104540Z (2017) https://doi.org/10.1117/12.2278714

KEYWORDS: Chromium, Transmittance, Photomasks, Etching, Sputter deposition, Molybdenum, Phase shifts, Mask making, Integrated circuits, Critical dimension metrology

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Proceedings Article | 4 October 2016 Paper

Comparative study on PS material of EAPSM for flat panel display

Jin-Woong Jeong, Jin-Han Song, Ho-Jin Lee, Kyu-Sik Kim, Woo-Gun Jeong, Young-Jin Yoon, Sang-Pil Yun, Sung-Mo Jung

Proceedings Volume 9985, 998512 (2016) https://doi.org/10.1117/12.2241325

KEYWORDS: Photomasks, Chromium, Optical properties, Phase shifts, Transmittance, Etching, Reflectivity, Absorbance, Nanoimprint lithography, Electroactive polymers

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Proceedings Article | 26 September 2016 Paper

Development of advanced multi-tone mask by using two different transmittance modulation materials

Sei-Min Kim, Min-Ki Choi, Seong-Min Seo, Jong-Hwa Lee, Cheol Shin, Woo-Gun Jeong, Sung-Mo Jung, Kee-Soo Nam

Proceedings Volume 9985, 99850D (2016) https://doi.org/10.1117/12.2241336

KEYWORDS: Transmittance, Modulation, Photomasks, Manufacturing, Thin films, Etching, Reflectivity, Chromium, Lithography, Optical lithography

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Proceedings Article | 19 May 2008 Paper

Validation of ArF PSM quality using AIMS simulation method in repeated cleaning

Dong-Seok Lee, Hyun-Ju Jung, Jung-Kwan Lee, Woo-Gun Jung, Dong-Heok Lee, Cheol Shin, Sang-Soo Choi, Moon-Hwan Choi

Proceedings Volume 7028, 70282H (2008) https://doi.org/10.1117/12.793051

KEYWORDS: Critical dimension metrology, Transmittance, Photomasks, Air contamination, Semiconducting wafers, Scanning electron microscopy, Atomic force microscopy, Lithographic illumination, Lithography, Computer simulations

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Proceedings Article | 1 November 2007 Paper

Haze generation effect by pellicle and packing box on photomask

Jong-Min Kim, Manish Patil, Woo-Gun Jeong, Ik-Boum Hur, Cheol Shin, Sung-Mo Jung, Moon-Hwan Choi, Sang-Soo Choi

Proceedings Volume 6730, 67304O (2007) https://doi.org/10.1117/12.747121

KEYWORDS: Photomasks, Air contamination, Pellicles, Ions, Contamination, Adhesives, Fluorine, Raman spectroscopy, Glasses, Inspection

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Proceedings Article | 17 December 2003 Paper

Comparative evaluation of mask cleaning performance

Woo-Gun Jeong, Dong-il Park, Eui-Sang Park, Young-Woong Cho, Se-Jong Choi, Hyuk-Joo Kwon, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518030

KEYWORDS: Particles, Deep ultraviolet, Photomasks, Industrial chemicals, Ultraviolet radiation, Scanning probe microscopy, Transmittance, Reticles, Oxygen, Mask cleaning

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Proceedings Article | 28 August 2003 Paper

A study of post-exposure baking effect for CAR process in photomask fabrication

Dong-Il Park, Sun-Kyu Seo, Woo-Gun Jeong, Eui-Sang Park, Jong-Hwa Lee, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504187

KEYWORDS: Line edge roughness, Photomasks, Photoresist processing, Chemically amplified resists, Critical dimension metrology, Logic, Logic devices, Lithography, Temperature metrology, Arsenic

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Proceedings Article | 28 August 2003 Paper

Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Dong-Il Park, Eui-Sang Park, Jong-Hwa Lee, Woo-Gun Jeong, Sun-Kyu Seo, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504051

KEYWORDS: Critical dimension metrology, Cadmium, Error analysis, Etching, Photomasks, Convolution, Dry etching, Data modeling, Chromium, Chemically amplified resists

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Proceedings Article | 28 August 2003 Paper

Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Woo-Gun Jeong, Dong-Il Park, Eui-Sang Park, Sun-Kyu Seo, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504184

KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Platinum, Opacity, Vestigial sideband modulation, Chemically amplified resists, Inspection, Polymers, Control systems

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Proceedings Article | 27 December 2002 Paper

90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Dong-Il Park, Soon-Kyu Seo, Eu-Sang Park, Jong-Hwa Lee, Woo-Gun Jeong, Jin-Min Kim, Sang-Soo Choi, Soo-Hong Jeong

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467905

KEYWORDS: Chemically amplified resists, Photoresist processing, Photomasks, Chromium, Etching, Dry etching, Cadmium, Critical dimension metrology, Photoresist developing, Mask making

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Proceedings Article | 27 December 2002 Paper

Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing

Eu Sang Park, Jong Hwa Lee, Dong Il Park, Woo Gun Jeong, Soon Kyu Seo, Jin Min Kim, Sang-Soo Choi, Soo-Hong Jeong

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467899

KEYWORDS: Critical dimension metrology, Backscatter, Cadmium, Dry etching, Etching, Gases, Photomasks, Scanning electron microscopy, Chlorine, Sun

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Proceedings Article | 27 December 2002 Paper

Comparative evaluation of mask production CAR development processes with stepwise defect inspection

Woo-Gun Jeong, Jung-Kwan Lee, Dong-Il Park, Eu-Sang Park, Jong-Hwa Lee, Sun-Kyu Seo, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi, Soo-Hong Jeong

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467908

KEYWORDS: Inspection, Etching, Photomasks, Photoresist processing, Scanning electron microscopy, Binary data, Dry etching, Defect inspection, Fluctuations and noise, Defect detection

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Chemically amplified resist (CAR) provides superior lithographic performance compared to traditional e-beam resists in production maskmaking. Parameters benefiting the most are contrast, resolution, and sensitivity. In spite of CAR's advantages, defect control and tighter 50KeV e-beam CAR process restrictions are significantly more critical thanks to smaller geometries, tighter CD specifications, and optical proximity correction (OPC) for 90nm node mask technology. Among defect root causes, resist development is considered to be the one of the most important steps because post-development residue can generate printable defects on finished masks. We investigated the CAR development process across different resist development methods, such as binary and fan-type nozzle spin spray, and puddle development. Several high density binary and embedded-attenuated phase shift masks (EAPSMs) with 70% clear area in the main pattern field were evaluated in an effort to identify and contain post-develop defects in a typical mask production flow. Development step process residue was examined at the after-develop inspection (ADI) step and scanning electron microscopy (SEM) was used for individual defect review. The KLA-Tencor SLF77 TeraStar inspection tool was used to inspect patterns after the development, Cr/MoSiON layer dry etch, and clean steps. The effectiveness of the various CAR development methods has been also studied following development, dry etch, and cleaning inspection by using identical binary and EAPSM masks from production. The mechanism and defect source during the stepwise process and inspections were scrutinized and discussed. Experimental results showed that stepwise process inspection was effective in identifying defects and their sources to prevent defects, and in optimizing each process step. It was found that CAR development and dry etch processes are the most important process steps to control defects in CAR-based mask production. Suggested optimized develop process parameters for 90nm-node mask

Proceedings Article | 1 August 2002 Paper

Characteristics of residues and optical change of HT PSM during stepwise wet cleaning and optimization of HT PSM cleaning process

Woo-Gun Jeong, Dae-Woo Kim, Chang-Min Park, Ki-Won An, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi, Soo Hong Jeong

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476970

KEYWORDS: Etching, Inspection, Particles, Transmittance, Dry etching, Quartz, Neodymium, Scanning electron microscopy, Industrial chemicals, Defect inspection

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Proceedings Article | 11 March 2002 Paper

Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks

Woo-Gun Jeong, Si-Woo Lee, Dae-Hong Kim, Young Jin Yoon, Dong-Heok Lee, Boo Yeon Choi, Sang-Soo Choi, Sung-Mo Jung, Soo-Hong Jeong

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458260

KEYWORDS: Particles, Photomasks, Inspection, Reticles, Quartz, Transmittance, Binary data, Chemical elements, Optical properties, Natural surfaces

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Proceedings Article | 11 March 2002 Paper

Defects analysis of mask blanks

Dong-Heok Lee, Dae-Woo Kim, Jung-Kwan Lee, Woo-Gun Jeong, Sang-Soo Choi, Sung-Mo Jung, Soo-Hong Jeong

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458336

KEYWORDS: Photomasks, Inspection, Quartz, Semiconducting wafers, Scanning electron microscopy, Defect detection, Image transmission, Printing, Photography, Image processing

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Showing 5 of 15 publications

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