The assembly positioning state of the imaging detector has an important influence on the performance of the photoelectric reconnaissance system. The axial positioning accuracy of the imaging detector will affect the imaging clarity and resolution, and the radial positioning accuracy will affect the optical axis consistency of the optical path system. The tilt, translation, rotation and position of the detector will bring multi-dimensional errors during the installation of the imaging detector, resulting in image plane misalignment, image blur and optical axis offset. In this paper, an optical measurement system is designed and built, which can automatically distinguish the installation error of the imaging detector and assist the installation of the imaging detector. The translation installation error is less than 0.015mm, and the rotation deflection error is less than 0.015 ', and the installation qualification can be given according to the clarity of the observation system image.
Micro Pitch-tunable Grating based on microeletromechanical systems(MEMS) technology can modulate the
grating period dynamically by controlling the drive voltage. The device is so complex that it is impossible to model and
sumulation by FEA method or only analysis macromodel. In this paper, a new hybrid system-level modeling method was
presented. Firstly the grating was decomposed into function components such as grating beam, supporting beam,
electrostatic comb-driver. Block Arnoldi algorithm was used to obtain the numerical macromodel of the grating beams
and supporting beams, the analytical macromodels called multi-port-elements(MPEs) of the comb-driver and other parts
were also established, and the elements were connected together to form hybrid network for representing the systemlevel
models of the grating in MEME Garden, which is a MEMS CAD tool developed by Micro and Nano
Electromechanical Systems Laboratory, Northwestern Polytechnical University. Both frequency and time domain
simulation were implemented. The grating was fabricated using silicon-on-glass(SOG) process. The measured working
displacement is 16.5μm at a driving voltage of 40V. The simulation result is 17.6μm which shows an acceptable
agreement with the measurement result within the error tolerance of 6.7%. The method proposed in this paper can solve
the voltage-displacement simulation problem of this kind of complex grating. It can also be adapted to similar
MEMS/MOEMS devices simulations.
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