The superlens with plasmonic material have important features such as evanescent wave enhancement and subwavelength imaging. However, the intrinsic loss of the material severely limits the resolution and imposes more stringent requirements on imaging conditions. In this work, we discuss the influence of different temporal features on imaging resolution. The exponential illumination corresponds to a definite imaging state, higher imaging resolution can be obtained with greater exponential decay rate of illumination pulse. This conclusion provides a reference for the selection of pulse time-domain waveforms. In addition, we use this method for periodic pattern imaging, validating its potential for practical applications.
In recent years, the super-oscillatory lens based on optical super-oscillatory phenomenon has been successfully applied to sub-diffraction focusing and imaging. However, most of the previously reported super-oscillatory lens only work in the visible and near-infrared wavelengths, and little research has been done in the ultraviolet. In this paper, a polarization-insensitive ultraviolet super-oscillatory metalens doublet is proposed. The simulation results show that sub-diffraction focusing and imaging with different incidence angles can be achieved at the ultraviolet operating wavelength of 365nm, and the full width at half maximum of the sub-diffraction foci is approximately 0.7 times of the diffraction limit. This metalens doublet has a numerical aperture of 0.4472, a focal length of 0.6896 mm, and a field of view of ±25°. The proposed polarization-insensitive ultraviolet super-oscillatory metalens doublet can be used in the fields of ultraviolet lithography and microscopic imaging.
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