Mr. Yasunori Goto Profile

Yasunori Goto

at Hitachi High-Tech Corp

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Author

Publications (5)

Proceedings Article | 10 April 2024 Poster + Paper

A method for dynamic placement of overlay measurement area cursors using segmentation technique

Shinya Kyogoku, Minoru Harada, Mayuka Osaki, Takahiro Nishihata, Yasunori Goto

Proceedings Volume 12955, 1295521 (2024) https://doi.org/10.1117/12.3008535

KEYWORDS: Overlay metrology, Image segmentation, Edge detection, Scanning electron microscopy, Image processing, Deep learning, Target recognition, Semiconductors

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Proceedings Article | 22 February 2021 Presentation + Paper

Evaluation of deep learning model for 3D profiling of HAR features using high-voltage CD-SEM

Wei Sun, Yasunori Goto, Takuma Yamamoto, Keiichiro Hitomi

Proceedings Volume 11611, 116110X (2021) https://doi.org/10.1117/12.2592052

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SPIE Journal Paper | 12 May 2020 Open Access

High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features

Wei Sun, Hiroya Ohta, Taku Ninomiya, Yasunori Goto

JM3, Vol. 19, Issue 02, 024002, (May 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.2.024002

KEYWORDS: 3D metrology, 3D applications, Monte Carlo methods, Cadmium, Solids, Scanning electron microscopy, Critical dimension metrology, Signal detection, Semiconducting wafers, Metrology

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Proceedings Article | 20 March 2020 Presentation + Paper

Accuracy improvement of 3D-profiling for HAR features using deep learning

Wei Sun, Pushe Zhao, Yasunori Goto, Takuma Yamamoto, Taku Ninomiya

Proceedings Volume 11325, 113250N (2020) https://doi.org/10.1117/12.2551458

KEYWORDS: 3D modeling, Electron beams, Data modeling, Neural networks, Scanning electron microscopy, Inverse problems, Convolution, 3D metrology

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Proceedings Article | 26 March 2019 Presentation + Paper

High voltage CD-SEM based metrology for 3D-profile measurement using depth-correlated BSE signal

Wei Sun, Yasunari Sohda, Hiroya Ohta, Taku Ninomiya, Yasunori Goto

Proceedings Volume 10959, 1095915 (2019) https://doi.org/10.1117/12.2511272

KEYWORDS: Monte Carlo methods, 3D metrology, Critical dimension metrology, Metrology, Scanning electron microscopy, Etching, Scattering, Electron beams

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