Optical and photoluminescence 3D imaging of small fused silica laser-induced damage sites allows us to understand the damage growth mechanisms. The laser damage growth process is driven by local absorption centers and its location and depth are the key factors. To quantitatively extract the factors from the 3D multi-modal image data set, various metrics are obtained by image analysis techniques and evaluated. We believe that our measurement and analysis approach can allow rapid identification of growth-prone damage sites, providing a pathway to fast, non-destructive predictions of laser-induced damage growth and enable selective damage site mitigation. This work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344. LLNL-ABS-863515
This presentation summarizes recent work at the Laser Thermal Laboratory on the laser chemical processing of two-dimensional (2D) layered materials and the laser-aided atomic laser etching (ALEt) of semiconductors. Spatially selective laser doping of transition metal dichalcogenides (TMDCs), reversible writing of dopant patterns in graphene and fabrication of functional devices have been accomplished. Digital self-limited etching of semiconductors has been demonstrated.
This presentation summarizes recent work at the Laser Thermal Laboratory on the laser-aided processing and functionalization of two-dimensional (2D) layered materials and the laser chemical processing of semiconductors.
We present a temporally and spatially resolved photoluminescence (PL) measurement technique developed to rapidly characterize fused silica damage sites and determine their propensity to grow under subsequent laser irradiation. A diffusional model is used to describe the observed PL dynamics and correlation to the local damage morphologies. We believe that our measurement and analysis approach can allow rapid identification of growth-prone damage sites, providing a pathway to fast, non-destructive predictions of laser-induced damage growth and enable selective damage site mitigation which will greatly reduce the time required to recycle NIF’s optics.
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